JPS5541739A - Micro-projection type mask alignment device - Google Patents

Micro-projection type mask alignment device

Info

Publication number
JPS5541739A
JPS5541739A JP11464278A JP11464278A JPS5541739A JP S5541739 A JPS5541739 A JP S5541739A JP 11464278 A JP11464278 A JP 11464278A JP 11464278 A JP11464278 A JP 11464278A JP S5541739 A JPS5541739 A JP S5541739A
Authority
JP
Japan
Prior art keywords
mask
light
micro
wafer
alignment device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11464278A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6227536B2 (enrdf_load_stackoverflow
Inventor
Mitsuyoshi Koizumi
Nobuyuki Akiyama
Yoshimasa Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11464278A priority Critical patent/JPS5541739A/ja
Publication of JPS5541739A publication Critical patent/JPS5541739A/ja
Publication of JPS6227536B2 publication Critical patent/JPS6227536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP11464278A 1978-09-20 1978-09-20 Micro-projection type mask alignment device Granted JPS5541739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11464278A JPS5541739A (en) 1978-09-20 1978-09-20 Micro-projection type mask alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11464278A JPS5541739A (en) 1978-09-20 1978-09-20 Micro-projection type mask alignment device

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP59157541A Division JPS60196944A (ja) 1984-07-30 1984-07-30 アライメント方法
JP61104659A Division JPS62122129A (ja) 1986-05-09 1986-05-09 ウエハ上パタ−ン位置検出装置

Publications (2)

Publication Number Publication Date
JPS5541739A true JPS5541739A (en) 1980-03-24
JPS6227536B2 JPS6227536B2 (enrdf_load_stackoverflow) 1987-06-15

Family

ID=14642904

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11464278A Granted JPS5541739A (en) 1978-09-20 1978-09-20 Micro-projection type mask alignment device

Country Status (1)

Country Link
JP (1) JPS5541739A (enrdf_load_stackoverflow)

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56102823A (en) * 1980-01-19 1981-08-17 Nippon Kogaku Kk <Nikon> Positioning device
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
JPS5828748A (ja) * 1981-08-13 1983-02-19 Nippon Kogaku Kk <Nikon> 転写装置の位置合わせ装置
JPS5856330A (ja) * 1981-09-30 1983-04-04 Hitachi Ltd 縮小露光装置
JPS58165326A (ja) * 1982-03-09 1983-09-30 ウロマスク 集積回路製造機の整合装置
JPS5927525A (ja) * 1982-08-03 1984-02-14 Canon Inc アライメント方法
JPS5994825A (ja) * 1982-11-24 1984-05-31 Nec Corp 半導体ウエ−ハのアライメント方法
JPS59101829A (ja) * 1982-12-01 1984-06-12 Canon Inc アライメントマ−クの配置方法
JPS6054437A (ja) * 1983-09-05 1985-03-28 Hitachi Ltd ウエ−ハとレチクルの位置合せ方法
JPS60102739A (ja) * 1983-11-10 1985-06-06 Canon Inc ステップアンドリピート露光装置
JPS60256002A (ja) * 1984-06-01 1985-12-17 Nippon Kogaku Kk <Nikon> 位置検出装置
JPS60262423A (ja) * 1984-06-11 1985-12-25 Nippon Kogaku Kk <Nikon> 投影露光方法
JPS61123139A (ja) * 1985-10-11 1986-06-11 Canon Inc アライメント装置
JPS62169329A (ja) * 1986-12-09 1987-07-25 Canon Inc アライメント方法
JPS62247529A (ja) * 1986-12-09 1987-10-28 Canon Inc アライメント方法
JPS62291133A (ja) * 1986-06-11 1987-12-17 Nikon Corp 位置合わせ方法
JPS6313329A (ja) * 1986-07-04 1988-01-20 Canon Inc 露光方法
JPS63250120A (ja) * 1987-04-07 1988-10-18 Mitsubishi Electric Corp アライメント補正装置
US4906852A (en) * 1988-03-10 1990-03-06 Hitachi, Ltd. Projection alignment method and apparatus
JPH0620921A (ja) * 1992-09-18 1994-01-28 Hitachi Ltd 投影露光方法
JPH06151277A (ja) * 1992-10-30 1994-05-31 Canon Inc 露光装置
JPH0774095A (ja) * 1994-06-20 1995-03-17 Nikon Corp 露光装置
JPH08241859A (ja) * 1996-01-29 1996-09-17 Hitachi Ltd 投影露光方法
JPH08330394A (ja) * 1996-06-13 1996-12-13 Nikon Corp 位置合わせ方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
JPS5352072A (en) * 1976-10-22 1978-05-12 Hitachi Ltd Pattern for alignment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
JPS5352072A (en) * 1976-10-22 1978-05-12 Hitachi Ltd Pattern for alignment

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56102823A (en) * 1980-01-19 1981-08-17 Nippon Kogaku Kk <Nikon> Positioning device
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
JPS5828748A (ja) * 1981-08-13 1983-02-19 Nippon Kogaku Kk <Nikon> 転写装置の位置合わせ装置
JPS5856330A (ja) * 1981-09-30 1983-04-04 Hitachi Ltd 縮小露光装置
JPS58165326A (ja) * 1982-03-09 1983-09-30 ウロマスク 集積回路製造機の整合装置
JPS5927525A (ja) * 1982-08-03 1984-02-14 Canon Inc アライメント方法
JPS5994825A (ja) * 1982-11-24 1984-05-31 Nec Corp 半導体ウエ−ハのアライメント方法
JPS59101829A (ja) * 1982-12-01 1984-06-12 Canon Inc アライメントマ−クの配置方法
JPS6054437A (ja) * 1983-09-05 1985-03-28 Hitachi Ltd ウエ−ハとレチクルの位置合せ方法
JPS60102739A (ja) * 1983-11-10 1985-06-06 Canon Inc ステップアンドリピート露光装置
JPS60256002A (ja) * 1984-06-01 1985-12-17 Nippon Kogaku Kk <Nikon> 位置検出装置
JPS60262423A (ja) * 1984-06-11 1985-12-25 Nippon Kogaku Kk <Nikon> 投影露光方法
JPS61123139A (ja) * 1985-10-11 1986-06-11 Canon Inc アライメント装置
JPS62291133A (ja) * 1986-06-11 1987-12-17 Nikon Corp 位置合わせ方法
JPS6313329A (ja) * 1986-07-04 1988-01-20 Canon Inc 露光方法
JPS62169329A (ja) * 1986-12-09 1987-07-25 Canon Inc アライメント方法
JPS62247529A (ja) * 1986-12-09 1987-10-28 Canon Inc アライメント方法
JPS63250120A (ja) * 1987-04-07 1988-10-18 Mitsubishi Electric Corp アライメント補正装置
US4906852A (en) * 1988-03-10 1990-03-06 Hitachi, Ltd. Projection alignment method and apparatus
JPH0620921A (ja) * 1992-09-18 1994-01-28 Hitachi Ltd 投影露光方法
JPH06151277A (ja) * 1992-10-30 1994-05-31 Canon Inc 露光装置
JPH0774095A (ja) * 1994-06-20 1995-03-17 Nikon Corp 露光装置
JPH08241859A (ja) * 1996-01-29 1996-09-17 Hitachi Ltd 投影露光方法
JPH08330394A (ja) * 1996-06-13 1996-12-13 Nikon Corp 位置合わせ方法

Also Published As

Publication number Publication date
JPS6227536B2 (enrdf_load_stackoverflow) 1987-06-15

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