JPS5527624A - Semiconductor wafer selector - Google Patents

Semiconductor wafer selector

Info

Publication number
JPS5527624A
JPS5527624A JP10057378A JP10057378A JPS5527624A JP S5527624 A JPS5527624 A JP S5527624A JP 10057378 A JP10057378 A JP 10057378A JP 10057378 A JP10057378 A JP 10057378A JP S5527624 A JPS5527624 A JP S5527624A
Authority
JP
Japan
Prior art keywords
wafer
light
light flux
reflected
normal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10057378A
Other languages
Japanese (ja)
Inventor
Sunao Nishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10057378A priority Critical patent/JPS5527624A/en
Publication of JPS5527624A publication Critical patent/JPS5527624A/en
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To discriminate and select the quality of semiconductor wafer surfaces automatically and quantitatively, by measuring the amount of reflected light in the direction of normal to the surface of a semiconductor wafer, when light is incident on the wafer surface diagonally.
CONSTITUTION: Light flux projector 2 projects light flux 21 diagonally on the surface of wafer 100 to be tested. This light flux 21 is directed toward the center of wafer 100. It consists of parallel rays. It has the maximum cross section within the limits of wafer 100. If there is no dust or foreign object 100a attached to the wafer surface, since the wafer surface forms a mirror surface, no reflected light 31 occurs in the direction of normal as all of light flux 21 is reflected by the surface of wafer 100. But, when there are dust or a foreign object attached to the wafer surface, a part of light flux 21 is disturbed and there appears some light flux 21 is disturbed and there appears some light reflected in the direction of normal. By measuring the amount of light reflected in the direction of normal, the quality of a wafer is determined.
COPYRIGHT: (C)1980,JPO&Japio
JP10057378A 1978-08-17 1978-08-17 Semiconductor wafer selector Pending JPS5527624A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10057378A JPS5527624A (en) 1978-08-17 1978-08-17 Semiconductor wafer selector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10057378A JPS5527624A (en) 1978-08-17 1978-08-17 Semiconductor wafer selector

Publications (1)

Publication Number Publication Date
JPS5527624A true JPS5527624A (en) 1980-02-27

Family

ID=14277634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10057378A Pending JPS5527624A (en) 1978-08-17 1978-08-17 Semiconductor wafer selector

Country Status (1)

Country Link
JP (1) JPS5527624A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6345364A (en) * 1986-08-13 1988-02-26 Seiko Instr & Electronics Ltd Vacuum deposition device for frequency regulation of crystal resonator
WO2006104121A1 (en) * 2005-03-29 2006-10-05 Hitachi Kokusai Electric Inc. Semiconductor production apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6345364A (en) * 1986-08-13 1988-02-26 Seiko Instr & Electronics Ltd Vacuum deposition device for frequency regulation of crystal resonator
WO2006104121A1 (en) * 2005-03-29 2006-10-05 Hitachi Kokusai Electric Inc. Semiconductor production apparatus

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