JPS5740926A - Device for projection and exposure - Google Patents
Device for projection and exposureInfo
- Publication number
- JPS5740926A JPS5740926A JP55117392A JP11739280A JPS5740926A JP S5740926 A JPS5740926 A JP S5740926A JP 55117392 A JP55117392 A JP 55117392A JP 11739280 A JP11739280 A JP 11739280A JP S5740926 A JPS5740926 A JP S5740926A
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- dust
- inspection process
- reference pattern
- reduced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To simplify the inspection process for the subject device by a method wherein, when the image drawn on a glass plate is transferred using a reduced exposing device, the dust adhereon on the glass is comparatively inspected with the reference pattern and it is detected and removed. CONSTITUTION:The first pattern 101 is provided on a reticle 102 to be actually used. Now, let it be supposed that dust 103 is adhered on the reticle 102. Another dustless reticle 104 is provided as the second reference pattern. The reticle 102 is set on a reduced projecting and exposing device, and the superposed image of these two patterns 101 and 105 are observed. As the dust 103 can be found as dust 107, the reticle is cleaned by stopping the transferring exposure. Through these procedures, the reticle inspection process can be simplified and also the misjudgement wherein all wafers are considered to be defective can be prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55117392A JPS5740926A (en) | 1980-08-26 | 1980-08-26 | Device for projection and exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55117392A JPS5740926A (en) | 1980-08-26 | 1980-08-26 | Device for projection and exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5740926A true JPS5740926A (en) | 1982-03-06 |
Family
ID=14710512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55117392A Pending JPS5740926A (en) | 1980-08-26 | 1980-08-26 | Device for projection and exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5740926A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS597954A (en) * | 1982-07-06 | 1984-01-17 | Nec Corp | Reduced projection type exposing device |
JPS62292914A (en) * | 1986-06-09 | 1987-12-19 | Kobe Steel Ltd | Method of forming weld-type crank shaft by welding |
CN117170181A (en) * | 2023-11-01 | 2023-12-05 | 合肥晶合集成电路股份有限公司 | Mask cleaning method, device and computer readable storage medium |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4980976A (en) * | 1972-12-11 | 1974-08-05 | ||
JPS5143958A (en) * | 1974-10-12 | 1976-04-15 | Nippon Jido Seigyo Kk | Pataanno ketsukankensahoho |
JPS5324780A (en) * | 1976-08-20 | 1978-03-07 | Hitachi Ltd | Lead frame |
JPS5333029A (en) * | 1976-09-09 | 1978-03-28 | Nec Corp | Cut-off frequency variable filter |
-
1980
- 1980-08-26 JP JP55117392A patent/JPS5740926A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4980976A (en) * | 1972-12-11 | 1974-08-05 | ||
JPS5143958A (en) * | 1974-10-12 | 1976-04-15 | Nippon Jido Seigyo Kk | Pataanno ketsukankensahoho |
JPS5324780A (en) * | 1976-08-20 | 1978-03-07 | Hitachi Ltd | Lead frame |
JPS5333029A (en) * | 1976-09-09 | 1978-03-28 | Nec Corp | Cut-off frequency variable filter |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS597954A (en) * | 1982-07-06 | 1984-01-17 | Nec Corp | Reduced projection type exposing device |
JPS62292914A (en) * | 1986-06-09 | 1987-12-19 | Kobe Steel Ltd | Method of forming weld-type crank shaft by welding |
CN117170181A (en) * | 2023-11-01 | 2023-12-05 | 合肥晶合集成电路股份有限公司 | Mask cleaning method, device and computer readable storage medium |
CN117170181B (en) * | 2023-11-01 | 2024-01-26 | 合肥晶合集成电路股份有限公司 | Mask cleaning method, device and computer readable storage medium |
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