JPS5740926A - Device for projection and exposure - Google Patents

Device for projection and exposure

Info

Publication number
JPS5740926A
JPS5740926A JP55117392A JP11739280A JPS5740926A JP S5740926 A JPS5740926 A JP S5740926A JP 55117392 A JP55117392 A JP 55117392A JP 11739280 A JP11739280 A JP 11739280A JP S5740926 A JPS5740926 A JP S5740926A
Authority
JP
Japan
Prior art keywords
reticle
dust
inspection process
reference pattern
reduced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55117392A
Other languages
Japanese (ja)
Inventor
Yoji Yamanaka
Hirohiko Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55117392A priority Critical patent/JPS5740926A/en
Publication of JPS5740926A publication Critical patent/JPS5740926A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To simplify the inspection process for the subject device by a method wherein, when the image drawn on a glass plate is transferred using a reduced exposing device, the dust adhereon on the glass is comparatively inspected with the reference pattern and it is detected and removed. CONSTITUTION:The first pattern 101 is provided on a reticle 102 to be actually used. Now, let it be supposed that dust 103 is adhered on the reticle 102. Another dustless reticle 104 is provided as the second reference pattern. The reticle 102 is set on a reduced projecting and exposing device, and the superposed image of these two patterns 101 and 105 are observed. As the dust 103 can be found as dust 107, the reticle is cleaned by stopping the transferring exposure. Through these procedures, the reticle inspection process can be simplified and also the misjudgement wherein all wafers are considered to be defective can be prevented.
JP55117392A 1980-08-26 1980-08-26 Device for projection and exposure Pending JPS5740926A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55117392A JPS5740926A (en) 1980-08-26 1980-08-26 Device for projection and exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55117392A JPS5740926A (en) 1980-08-26 1980-08-26 Device for projection and exposure

Publications (1)

Publication Number Publication Date
JPS5740926A true JPS5740926A (en) 1982-03-06

Family

ID=14710512

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55117392A Pending JPS5740926A (en) 1980-08-26 1980-08-26 Device for projection and exposure

Country Status (1)

Country Link
JP (1) JPS5740926A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS597954A (en) * 1982-07-06 1984-01-17 Nec Corp Reduced projection type exposing device
JPS62292914A (en) * 1986-06-09 1987-12-19 Kobe Steel Ltd Method of forming weld-type crank shaft by welding
CN117170181A (en) * 2023-11-01 2023-12-05 合肥晶合集成电路股份有限公司 Mask cleaning method, device and computer readable storage medium

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4980976A (en) * 1972-12-11 1974-08-05
JPS5143958A (en) * 1974-10-12 1976-04-15 Nippon Jido Seigyo Kk Pataanno ketsukankensahoho
JPS5324780A (en) * 1976-08-20 1978-03-07 Hitachi Ltd Lead frame
JPS5333029A (en) * 1976-09-09 1978-03-28 Nec Corp Cut-off frequency variable filter

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4980976A (en) * 1972-12-11 1974-08-05
JPS5143958A (en) * 1974-10-12 1976-04-15 Nippon Jido Seigyo Kk Pataanno ketsukankensahoho
JPS5324780A (en) * 1976-08-20 1978-03-07 Hitachi Ltd Lead frame
JPS5333029A (en) * 1976-09-09 1978-03-28 Nec Corp Cut-off frequency variable filter

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS597954A (en) * 1982-07-06 1984-01-17 Nec Corp Reduced projection type exposing device
JPS62292914A (en) * 1986-06-09 1987-12-19 Kobe Steel Ltd Method of forming weld-type crank shaft by welding
CN117170181A (en) * 2023-11-01 2023-12-05 合肥晶合集成电路股份有限公司 Mask cleaning method, device and computer readable storage medium
CN117170181B (en) * 2023-11-01 2024-01-26 合肥晶合集成电路股份有限公司 Mask cleaning method, device and computer readable storage medium

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