JPS542071A - Inspection method of pattern defect for photo mask - Google Patents

Inspection method of pattern defect for photo mask

Info

Publication number
JPS542071A
JPS542071A JP6760177A JP6760177A JPS542071A JP S542071 A JPS542071 A JP S542071A JP 6760177 A JP6760177 A JP 6760177A JP 6760177 A JP6760177 A JP 6760177A JP S542071 A JPS542071 A JP S542071A
Authority
JP
Japan
Prior art keywords
inspection method
photo mask
pattern defect
idependently
comparing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6760177A
Other languages
Japanese (ja)
Inventor
Satoru Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6760177A priority Critical patent/JPS542071A/en
Publication of JPS542071A publication Critical patent/JPS542071A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE: To detect common defects, by using negative plates two or more formed idependently each other and by comparing the mask patterns produced each negative plate.
COPYRIGHT: (C)1979,JPO&Japio
JP6760177A 1977-06-07 1977-06-07 Inspection method of pattern defect for photo mask Pending JPS542071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6760177A JPS542071A (en) 1977-06-07 1977-06-07 Inspection method of pattern defect for photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6760177A JPS542071A (en) 1977-06-07 1977-06-07 Inspection method of pattern defect for photo mask

Publications (1)

Publication Number Publication Date
JPS542071A true JPS542071A (en) 1979-01-09

Family

ID=13349593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6760177A Pending JPS542071A (en) 1977-06-07 1977-06-07 Inspection method of pattern defect for photo mask

Country Status (1)

Country Link
JP (1) JPS542071A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5648631A (en) * 1979-09-28 1981-05-01 Hitachi Ltd Photomask inspecting apparatus
JPS6397957A (en) * 1986-10-14 1988-04-28 Ricoh Co Ltd Photomask for reduction stepper
JPS6477139A (en) * 1987-09-18 1989-03-23 Sony Corp Inspection of pattern

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5648631A (en) * 1979-09-28 1981-05-01 Hitachi Ltd Photomask inspecting apparatus
JPS6397957A (en) * 1986-10-14 1988-04-28 Ricoh Co Ltd Photomask for reduction stepper
JPS6477139A (en) * 1987-09-18 1989-03-23 Sony Corp Inspection of pattern

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