JPS542071A - Inspection method of pattern defect for photo mask - Google Patents
Inspection method of pattern defect for photo maskInfo
- Publication number
- JPS542071A JPS542071A JP6760177A JP6760177A JPS542071A JP S542071 A JPS542071 A JP S542071A JP 6760177 A JP6760177 A JP 6760177A JP 6760177 A JP6760177 A JP 6760177A JP S542071 A JPS542071 A JP S542071A
- Authority
- JP
- Japan
- Prior art keywords
- inspection method
- photo mask
- pattern defect
- idependently
- comparing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
PURPOSE: To detect common defects, by using negative plates two or more formed idependently each other and by comparing the mask patterns produced each negative plate.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6760177A JPS542071A (en) | 1977-06-07 | 1977-06-07 | Inspection method of pattern defect for photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6760177A JPS542071A (en) | 1977-06-07 | 1977-06-07 | Inspection method of pattern defect for photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS542071A true JPS542071A (en) | 1979-01-09 |
Family
ID=13349593
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6760177A Pending JPS542071A (en) | 1977-06-07 | 1977-06-07 | Inspection method of pattern defect for photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS542071A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5648631A (en) * | 1979-09-28 | 1981-05-01 | Hitachi Ltd | Photomask inspecting apparatus |
JPS6397957A (en) * | 1986-10-14 | 1988-04-28 | Ricoh Co Ltd | Photomask for reduction stepper |
JPS6477139A (en) * | 1987-09-18 | 1989-03-23 | Sony Corp | Inspection of pattern |
-
1977
- 1977-06-07 JP JP6760177A patent/JPS542071A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5648631A (en) * | 1979-09-28 | 1981-05-01 | Hitachi Ltd | Photomask inspecting apparatus |
JPS6397957A (en) * | 1986-10-14 | 1988-04-28 | Ricoh Co Ltd | Photomask for reduction stepper |
JPS6477139A (en) * | 1987-09-18 | 1989-03-23 | Sony Corp | Inspection of pattern |
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