JPS6477139A - Inspection of pattern - Google Patents
Inspection of patternInfo
- Publication number
- JPS6477139A JPS6477139A JP23446087A JP23446087A JPS6477139A JP S6477139 A JPS6477139 A JP S6477139A JP 23446087 A JP23446087 A JP 23446087A JP 23446087 A JP23446087 A JP 23446087A JP S6477139 A JPS6477139 A JP S6477139A
- Authority
- JP
- Japan
- Prior art keywords
- patterns
- pattern
- compared
- inspection
- reticle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
PURPOSE:To make possible an inspection of patterns using a simple inspecting device by a method wherein the same fellow patterns transferred on a body to be transferred using masks different from each other are compared with each other. CONSTITUTION:A reticle 22 having a single pattern 21 only reduces and transfers a plurality of the patterns 21 on a semiconductor wafer 13 using a reduction projection and exposure device. Then, a reticle 24 having the same pattern 23 as the pattern 21 similarly reduces and transfers a plurality of the patterns 23 on the wafer 13. A plurality of groups of the fellow patterns 21 and 23 are compared with each other. If the compared results are equal to each other, it can be discriminated that no defect exists on both of the patterns 21 and 23 and if the results are not equal, it can be discriminated that a defect exists on at least one of the patterns 21 and 23.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23446087A JP2720437B2 (en) | 1987-09-18 | 1987-09-18 | Pattern transfer method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23446087A JP2720437B2 (en) | 1987-09-18 | 1987-09-18 | Pattern transfer method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6477139A true JPS6477139A (en) | 1989-03-23 |
| JP2720437B2 JP2720437B2 (en) | 1998-03-04 |
Family
ID=16971349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23446087A Expired - Fee Related JP2720437B2 (en) | 1987-09-18 | 1987-09-18 | Pattern transfer method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2720437B2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS542071A (en) * | 1977-06-07 | 1979-01-09 | Mitsubishi Electric Corp | Inspection method of pattern defect for photo mask |
| JPS56110923A (en) * | 1980-02-04 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Reduction, projection and exposure device |
| JPS5758151A (en) * | 1980-09-25 | 1982-04-07 | Nec Corp | Manufacturing and inspecting method for photomask |
-
1987
- 1987-09-18 JP JP23446087A patent/JP2720437B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS542071A (en) * | 1977-06-07 | 1979-01-09 | Mitsubishi Electric Corp | Inspection method of pattern defect for photo mask |
| JPS56110923A (en) * | 1980-02-04 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Reduction, projection and exposure device |
| JPS5758151A (en) * | 1980-09-25 | 1982-04-07 | Nec Corp | Manufacturing and inspecting method for photomask |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2720437B2 (en) | 1998-03-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |