JPS5232676A - Pattern check system - Google Patents
Pattern check systemInfo
- Publication number
- JPS5232676A JPS5232676A JP50109138A JP10913875A JPS5232676A JP S5232676 A JPS5232676 A JP S5232676A JP 50109138 A JP50109138 A JP 50109138A JP 10913875 A JP10913875 A JP 10913875A JP S5232676 A JPS5232676 A JP S5232676A
- Authority
- JP
- Japan
- Prior art keywords
- check system
- pattern check
- mask
- rays
- check
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Abstract
PURPOSE: The corresponding positions between reference mask and to-be-checked mask are simultaneously scanned in parallel by two rays of electronic beam to check the difference signal. In this way, the defect diagram of the mask can be displayed.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50109138A JPS5232676A (en) | 1975-09-08 | 1975-09-08 | Pattern check system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50109138A JPS5232676A (en) | 1975-09-08 | 1975-09-08 | Pattern check system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5232676A true JPS5232676A (en) | 1977-03-12 |
Family
ID=14502547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50109138A Pending JPS5232676A (en) | 1975-09-08 | 1975-09-08 | Pattern check system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5232676A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53121456A (en) * | 1977-03-31 | 1978-10-23 | Hitachi Ltd | Scanning type electromicroscope having a plural number of mirror cylinders |
JPS597954A (en) * | 1982-07-06 | 1984-01-17 | Nec Corp | Reduced projection type exposing device |
JPS5963725A (en) * | 1982-10-05 | 1984-04-11 | Toshiba Corp | Pattern inspector |
-
1975
- 1975-09-08 JP JP50109138A patent/JPS5232676A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53121456A (en) * | 1977-03-31 | 1978-10-23 | Hitachi Ltd | Scanning type electromicroscope having a plural number of mirror cylinders |
JPS597954A (en) * | 1982-07-06 | 1984-01-17 | Nec Corp | Reduced projection type exposing device |
JPS5963725A (en) * | 1982-10-05 | 1984-04-11 | Toshiba Corp | Pattern inspector |
JPS633450B2 (en) * | 1982-10-05 | 1988-01-23 | Tokyo Shibaura Electric Co |
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