JPS6442655A - Structure of reticle - Google Patents
Structure of reticleInfo
- Publication number
- JPS6442655A JPS6442655A JP19910987A JP19910987A JPS6442655A JP S6442655 A JPS6442655 A JP S6442655A JP 19910987 A JP19910987 A JP 19910987A JP 19910987 A JP19910987 A JP 19910987A JP S6442655 A JPS6442655 A JP S6442655A
- Authority
- JP
- Japan
- Prior art keywords
- region
- wafer
- regions
- image
- device pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To increase a number of chips per wafer by forming the region of a device pattern and the region of a wafer alignment mark for directly drawing an image by charged beams separately from each other and surrounding the regions with a light shaded region. CONSTITUTION:The 2 regions of the device pattern region 102 in which a device pattern and a chip alignment mark 104 for directly drawing an image by charged beams and the wafer alignment mark region 103 for directly drawing an image by charged beams are formed on a reticle 101 separately from each other, and these regions are surrounded by the light shaded region 105, thus permitting either of both regions to be blinded at the time of reduction projection exposure and only the other to be used for exposing on the wafer, accordingly, the unnecessary mark 103 not to be used for exposure, and the number of the chips to be formed on the wafer to be increased by the area corresponding to the mark 103.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19910987A JPS6442655A (en) | 1987-08-11 | 1987-08-11 | Structure of reticle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19910987A JPS6442655A (en) | 1987-08-11 | 1987-08-11 | Structure of reticle |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6442655A true JPS6442655A (en) | 1989-02-14 |
Family
ID=16402275
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19910987A Pending JPS6442655A (en) | 1987-08-11 | 1987-08-11 | Structure of reticle |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6442655A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013178535A (en) * | 2006-02-16 | 2013-09-09 | Nikon Corp | Mask and mask manufacturing method |
-
1987
- 1987-08-11 JP JP19910987A patent/JPS6442655A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013178535A (en) * | 2006-02-16 | 2013-09-09 | Nikon Corp | Mask and mask manufacturing method |
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