GB9310013D0 - Method and apparatus for fabricating microlenses - Google Patents

Method and apparatus for fabricating microlenses

Info

Publication number
GB9310013D0
GB9310013D0 GB939310013A GB9310013A GB9310013D0 GB 9310013 D0 GB9310013 D0 GB 9310013D0 GB 939310013 A GB939310013 A GB 939310013A GB 9310013 A GB9310013 A GB 9310013A GB 9310013 D0 GB9310013 D0 GB 9310013D0
Authority
GB
United Kingdom
Prior art keywords
microlenses
mask
exposure
array
fabricating microlenses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB939310013A
Other versions
GB2277998A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BAE Systems Electronics Ltd
Original Assignee
GEC Marconi Ltd
Marconi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GEC Marconi Ltd, Marconi Co Ltd filed Critical GEC Marconi Ltd
Priority to GB9310013A priority Critical patent/GB2277998A/en
Publication of GB9310013D0 publication Critical patent/GB9310013D0/en
Priority to PCT/GB1994/000974 priority patent/WO1994027187A1/en
Priority to AU66831/94A priority patent/AU6683194A/en
Publication of GB2277998A publication Critical patent/GB2277998A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/08—Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A mask for producing microlenses comprising an opaque layer which has a plurality of openings of different sizes and at different locations which conform to the microlenses to be produced, the mask preferably being formed of an array of subpixels 55 of various grey scale elements 57 (see also Fig 12), the array preferably being 40 x 40. This mask 51 is used to produce microlenses in a single exposure via shutter and lens a silicon chip which is coated with a photoresist which is developed after exposure. The exposure can be repeated by moving the XY stage in either the X or Y directions. <IMAGE>
GB9310013A 1993-05-13 1993-05-13 Mask and apparatus for producing microlenses Withdrawn GB2277998A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB9310013A GB2277998A (en) 1993-05-13 1993-05-13 Mask and apparatus for producing microlenses
PCT/GB1994/000974 WO1994027187A1 (en) 1993-05-13 1994-05-05 Fabrication of microcomponents
AU66831/94A AU6683194A (en) 1993-05-13 1994-05-05 Fabrication of microcomponents

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9310013A GB2277998A (en) 1993-05-13 1993-05-13 Mask and apparatus for producing microlenses

Publications (2)

Publication Number Publication Date
GB9310013D0 true GB9310013D0 (en) 1993-06-30
GB2277998A GB2277998A (en) 1994-11-16

Family

ID=10735520

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9310013A Withdrawn GB2277998A (en) 1993-05-13 1993-05-13 Mask and apparatus for producing microlenses

Country Status (3)

Country Link
AU (1) AU6683194A (en)
GB (1) GB2277998A (en)
WO (1) WO1994027187A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100209752B1 (en) * 1996-05-16 1999-07-15 구본준 Patterning mask for micro-lens
GB2344899B (en) 1999-05-29 2000-11-22 Bookham Technology Ltd Production of an integrated optical device
DE10120703A1 (en) * 2001-04-27 2002-10-31 Osram Opto Semiconductors Gmbh Semiconductor chip for optoelectronics
DE10146619C2 (en) * 2001-09-21 2003-11-20 Max Planck Gesellschaft Process for the generation of a two-dimensional photomask

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT371947B (en) * 1979-12-27 1983-08-10 Rudolf Sacher Ges M B H SUPPORTING MASK, METHOD FOR PRODUCING THE SAME AND METHOD FOR MASKING SUBSTRATES
US4343877A (en) * 1981-01-02 1982-08-10 Amdahl Corporation System for design and production of integrated circuit photomasks and integrated circuit devices
US4613981A (en) * 1984-01-24 1986-09-23 Varian Associates, Inc. Method and apparatus for lithographic rotate and repeat processing
FR2590376A1 (en) * 1985-11-21 1987-05-22 Dumant Jean Marc MASKING METHOD AND MASK USED
GB2190215B (en) * 1986-05-01 1989-12-13 Smiths Industries Plc Integrated circuit substrates and masks
DE3623637A1 (en) * 1986-07-12 1988-01-21 Kernforschungsz Karlsruhe METHOD FOR PRODUCING MICROSTRUCTURES OF DIFFERENT STRUCTURAL HEIGHT BY MEANS OF X-RAY DEPTH LITHOGRAPHY
JPH0746681B2 (en) * 1986-10-28 1995-05-17 富士通株式会社 Method of manufacturing mask for X-ray stepper
US5004673A (en) * 1987-04-20 1991-04-02 Environmental Research Institute Of Michigan Method of manufacturing surface relief patterns of variable cross-sectional geometry
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
US5604081A (en) * 1992-08-14 1997-02-18 Siemens Aktiengesellschaft Method for producing a surface structure with reliefs

Also Published As

Publication number Publication date
AU6683194A (en) 1994-12-12
GB2277998A (en) 1994-11-16
WO1994027187A1 (en) 1994-11-24

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)