JPS5322370A - Inspecting method of semiconductor device - Google Patents

Inspecting method of semiconductor device

Info

Publication number
JPS5322370A
JPS5322370A JP9727076A JP9727076A JPS5322370A JP S5322370 A JPS5322370 A JP S5322370A JP 9727076 A JP9727076 A JP 9727076A JP 9727076 A JP9727076 A JP 9727076A JP S5322370 A JPS5322370 A JP S5322370A
Authority
JP
Japan
Prior art keywords
semiconductor device
inspecting method
pattern
inspected
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9727076A
Other languages
Japanese (ja)
Inventor
Kiyoshi Ozawa
Toru Funayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9727076A priority Critical patent/JPS5322370A/en
Publication of JPS5322370A publication Critical patent/JPS5322370A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)

Abstract

PURPOSE: To inspect the position deviations of the pattern to be inspected by superposing the pattern to be inspected and their original pattern on an inspecting medium then developing the patterns and measuring the relative deviations of both patterns.
COPYRIGHT: (C)1978,JPO&Japio
JP9727076A 1976-08-13 1976-08-13 Inspecting method of semiconductor device Pending JPS5322370A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9727076A JPS5322370A (en) 1976-08-13 1976-08-13 Inspecting method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9727076A JPS5322370A (en) 1976-08-13 1976-08-13 Inspecting method of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5322370A true JPS5322370A (en) 1978-03-01

Family

ID=14187829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9727076A Pending JPS5322370A (en) 1976-08-13 1976-08-13 Inspecting method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5322370A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5679430A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor integrated circuit device
JPS57108970A (en) * 1980-12-25 1982-07-07 Fujitsu Ltd Pattern checking method
EP0443366A1 (en) * 1990-02-16 1991-08-28 Montres Rado S.A. Watch case comprising two shells placed edge to edge
US5771209A (en) * 1992-03-26 1998-06-23 Createc Patent Holding, S.A. Wrist watch

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5679430A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor integrated circuit device
JPS57108970A (en) * 1980-12-25 1982-07-07 Fujitsu Ltd Pattern checking method
JPH0214749B2 (en) * 1980-12-25 1990-04-09 Fujitsu Ltd
EP0443366A1 (en) * 1990-02-16 1991-08-28 Montres Rado S.A. Watch case comprising two shells placed edge to edge
US5065375A (en) * 1990-02-16 1991-11-12 Montres Rado S.A. Watch case including two abuting shells
US5771209A (en) * 1992-03-26 1998-06-23 Createc Patent Holding, S.A. Wrist watch

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