JPS5679430A - Manufacture of semiconductor integrated circuit device - Google Patents

Manufacture of semiconductor integrated circuit device

Info

Publication number
JPS5679430A
JPS5679430A JP15661979A JP15661979A JPS5679430A JP S5679430 A JPS5679430 A JP S5679430A JP 15661979 A JP15661979 A JP 15661979A JP 15661979 A JP15661979 A JP 15661979A JP S5679430 A JPS5679430 A JP S5679430A
Authority
JP
Japan
Prior art keywords
pattern
substrate
photo
transfer
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15661979A
Other languages
Japanese (ja)
Other versions
JPS641928B2 (en
Inventor
Yoji Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP15661979A priority Critical patent/JPS5679430A/en
Publication of JPS5679430A publication Critical patent/JPS5679430A/en
Publication of JPS641928B2 publication Critical patent/JPS641928B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To facilitate the checking of a defect pattern caused by dusts by a method wherein a photo-sensitive organic film is formed on a semiconductor substrate and a desired pattern is transfer-copied on the film and thereby a double-exposure image having a periodical lapse is formed at the circumferential part of the substrate seperate from the original pattern. CONSTITUTION:When a desired pattern is transfer-copied on a photo-sensitive organic film coated on the semiconductor substrate, unworked part is selected at a flat circumferential part of the same substrate and a separate positive photo-resist layer of a photo-sensitive organic film is coated on the unworked part. Then, a clean reticle is applied to transfer-copy the pattern 102 and exposed for about half a nomal exposure time and thereafter developed. A plurality of substrate are prepared and after the elapse of several hours or several days, it is overlapped on one pattern 102, the second exposure under a half of the normal exposure time is applied to get the pattern 103, but if there is any part 104 having poor exposure lower than that of a normal pattern, it is judged that some dusts exist on the reticle as compared with the remaining substrate.
JP15661979A 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device Granted JPS5679430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15661979A JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15661979A JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Publications (2)

Publication Number Publication Date
JPS5679430A true JPS5679430A (en) 1981-06-30
JPS641928B2 JPS641928B2 (en) 1989-01-13

Family

ID=15631670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15661979A Granted JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS5679430A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113334754A (en) * 2021-07-01 2021-09-03 唐汉聪 Surface film coating process for ink printing paper

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH077927U (en) * 1993-07-20 1995-02-03 大英産業株式会社 Awning sheet
JPH0719701U (en) * 1993-09-13 1995-04-07 東京メガネ製造株式会社 Anti-fog seal

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS505105A (en) * 1973-05-15 1975-01-20
JPS5322370A (en) * 1976-08-13 1978-03-01 Fujitsu Ltd Inspecting method of semiconductor device
JPS5431282A (en) * 1977-08-12 1979-03-08 Mitsubishi Electric Corp Pattern formation method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS505105A (en) * 1973-05-15 1975-01-20
JPS5322370A (en) * 1976-08-13 1978-03-01 Fujitsu Ltd Inspecting method of semiconductor device
JPS5431282A (en) * 1977-08-12 1979-03-08 Mitsubishi Electric Corp Pattern formation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113334754A (en) * 2021-07-01 2021-09-03 唐汉聪 Surface film coating process for ink printing paper

Also Published As

Publication number Publication date
JPS641928B2 (en) 1989-01-13

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