JPS5648631A - Photomask inspecting apparatus - Google Patents

Photomask inspecting apparatus

Info

Publication number
JPS5648631A
JPS5648631A JP12410579A JP12410579A JPS5648631A JP S5648631 A JPS5648631 A JP S5648631A JP 12410579 A JP12410579 A JP 12410579A JP 12410579 A JP12410579 A JP 12410579A JP S5648631 A JPS5648631 A JP S5648631A
Authority
JP
Japan
Prior art keywords
mask
array
images
inspected
green
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12410579A
Other languages
Japanese (ja)
Inventor
Masahiro Dan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12410579A priority Critical patent/JPS5648631A/en
Publication of JPS5648631A publication Critical patent/JPS5648631A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To make possible accurate and rapid inspection of the entire pellet shape defects of photomasks by photodetecting the superposed images of a reference mask and the mask to be inspected with a photodiode array and making decision based on the photodetection signal. CONSTITUTION:Parallel luminous fluxes from the same light source 3 via irradiat- ing optical systems 4, 5 irradiate a standard mask 1 and the mask 2 to be inspected by way of color filters 8, 9 of red, green, etc. The images of the masks 1, 2 formed by this are combined by an image combining part 10 etc. to superposed images which are then photodetected with a photodiode array 11. The photodetection signal of the array 11 causes a decision circuit 12 to make signal processing based on the photosensitivity differences and coordinate positions of the portions where monochromatic light of red or green is received and the portions where combined light was received as well as the array 11, whereby the defects and periodicity of the mask are easily decided. Hence, the inspection of whether the pellet shapes of the entire part of the photomask are good or not may be performed accurately and rapidly.
JP12410579A 1979-09-28 1979-09-28 Photomask inspecting apparatus Pending JPS5648631A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12410579A JPS5648631A (en) 1979-09-28 1979-09-28 Photomask inspecting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12410579A JPS5648631A (en) 1979-09-28 1979-09-28 Photomask inspecting apparatus

Publications (1)

Publication Number Publication Date
JPS5648631A true JPS5648631A (en) 1981-05-01

Family

ID=14877037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12410579A Pending JPS5648631A (en) 1979-09-28 1979-09-28 Photomask inspecting apparatus

Country Status (1)

Country Link
JP (1) JPS5648631A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4980976A (en) * 1972-12-11 1974-08-05
JPS5225575A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Inspection method of the state of object
JPS542071A (en) * 1977-06-07 1979-01-09 Mitsubishi Electric Corp Inspection method of pattern defect for photo mask

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4980976A (en) * 1972-12-11 1974-08-05
JPS5225575A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Inspection method of the state of object
JPS542071A (en) * 1977-06-07 1979-01-09 Mitsubishi Electric Corp Inspection method of pattern defect for photo mask

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