JPS545750A - Pattern inspecting method - Google Patents

Pattern inspecting method

Info

Publication number
JPS545750A
JPS545750A JP7085777A JP7085777A JPS545750A JP S545750 A JPS545750 A JP S545750A JP 7085777 A JP7085777 A JP 7085777A JP 7085777 A JP7085777 A JP 7085777A JP S545750 A JPS545750 A JP S545750A
Authority
JP
Japan
Prior art keywords
patterns
examined
inspecting method
pattern inspecting
arrayed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7085777A
Other languages
Japanese (ja)
Inventor
Masahito Nakajima
Katsumi Fujiwara
Yoshiaki Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7085777A priority Critical patent/JPS545750A/en
Publication of JPS545750A publication Critical patent/JPS545750A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Examining Or Testing Airtightness (AREA)

Abstract

PURPOSE: To detect minute defects and transparent flaws existing together with the patterns being examined irrespective of the sizes of the patterns being examined by detecting the characteristics of the diffracted light from the patterns being examined by the use of the photo detectors which are arrayed at different space frequencies with respect to the optical axis.
COPYRIGHT: (C)1979,JPO&Japio
JP7085777A 1977-06-15 1977-06-15 Pattern inspecting method Pending JPS545750A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7085777A JPS545750A (en) 1977-06-15 1977-06-15 Pattern inspecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7085777A JPS545750A (en) 1977-06-15 1977-06-15 Pattern inspecting method

Publications (1)

Publication Number Publication Date
JPS545750A true JPS545750A (en) 1979-01-17

Family

ID=13443645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7085777A Pending JPS545750A (en) 1977-06-15 1977-06-15 Pattern inspecting method

Country Status (1)

Country Link
JP (1) JPS545750A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58153917A (en) * 1982-03-10 1983-09-13 Dainippon Printing Co Ltd Correcting device of pattern defect detection signal
JPS59934A (en) * 1983-06-06 1984-01-06 Hitachi Ltd Device for inspection of defect
JPH02112135U (en) * 1989-02-27 1990-09-07
JP2005514670A (en) * 2001-12-28 2005-05-19 ケーエルエー−テンカー・コーポレーション A differential detector using defocus for improved phase defect sensitivity

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4889638A (en) * 1972-02-24 1973-11-22
JPS50110779A (en) * 1974-02-06 1975-09-01

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4889638A (en) * 1972-02-24 1973-11-22
JPS50110779A (en) * 1974-02-06 1975-09-01

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58153917A (en) * 1982-03-10 1983-09-13 Dainippon Printing Co Ltd Correcting device of pattern defect detection signal
JPS59934A (en) * 1983-06-06 1984-01-06 Hitachi Ltd Device for inspection of defect
JPS6358369B2 (en) * 1983-06-06 1988-11-15 Hitachi Ltd
JPH02112135U (en) * 1989-02-27 1990-09-07
JP2005514670A (en) * 2001-12-28 2005-05-19 ケーエルエー−テンカー・コーポレーション A differential detector using defocus for improved phase defect sensitivity
JP4666919B2 (en) * 2001-12-28 2011-04-06 ケーエルエー−テンカー・コーポレーション A differential detector using defocus for improved phase defect sensitivity

Similar Documents

Publication Publication Date Title
JPS52479A (en) Optical scanning instrument
JPS5328375A (en) Inspecting method
JPS56103304A (en) Electro optical inspecting device
JPS55125439A (en) Defect inspection device
JPS53117978A (en) Automatic mask appearance inspection apparatus
JPS56124003A (en) Measuring device for pattern
JPS545750A (en) Pattern inspecting method
JPS548583A (en) Apparatus for detecting defect presence on substance surface reflecting at least of part of illuminating light
JPS5365777A (en) Surface defect detector
JPS53100895A (en) Inspecting method and apparatus for bank notes
JPS545789A (en) Inspecting apparatus of oxygen concentration detectors
JPS5667739A (en) Defect inspecting apparatus
JPS5421790A (en) Sealing defect detector of canned products
JPS5224554A (en) Surface inspection device
JPS51126887A (en) Automatic detection method of surface flaw and the apparatus
JPS55158505A (en) Knifed mark inspector
JPS5324233A (en) Pattern examination system
JPS5382492A (en) Surface inspecting method
JPS5249083A (en) Device for detecting surface defects of one dimensionally continuous o bjects to be examined
JPS54141661A (en) Assignment system of inspection area
JPS543587A (en) Inspecting apparatus
JPS5381151A (en) Surface film thickness detector
JPS55124008A (en) Defect inspecting apparatus
JPS53131848A (en) Surface defect detector of photoreceptor
JPS5387783A (en) Minute temperature detecting system