JPS53117978A - Automatic mask appearance inspection apparatus - Google Patents

Automatic mask appearance inspection apparatus

Info

Publication number
JPS53117978A
JPS53117978A JP3220177A JP3220177A JPS53117978A JP S53117978 A JPS53117978 A JP S53117978A JP 3220177 A JP3220177 A JP 3220177A JP 3220177 A JP3220177 A JP 3220177A JP S53117978 A JPS53117978 A JP S53117978A
Authority
JP
Japan
Prior art keywords
inspection apparatus
appearance inspection
automatic mask
mask appearance
automatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3220177A
Other languages
Japanese (ja)
Inventor
Kiyoshi Nakagawa
Hiroyuki Ibe
Shigeaki Nakajima
Yasuhiko Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3220177A priority Critical patent/JPS53117978A/en
Publication of JPS53117978A publication Critical patent/JPS53117978A/en
Pending legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE: To enlarge the detection region on XY stage and rapidly perform the defect detection of mask patterns by substantially linearly arraying a multiplicity of image sensing elements within the field of view of optical system.
COPYRIGHT: (C)1978,JPO&Japio
JP3220177A 1977-03-25 1977-03-25 Automatic mask appearance inspection apparatus Pending JPS53117978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3220177A JPS53117978A (en) 1977-03-25 1977-03-25 Automatic mask appearance inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3220177A JPS53117978A (en) 1977-03-25 1977-03-25 Automatic mask appearance inspection apparatus

Publications (1)

Publication Number Publication Date
JPS53117978A true JPS53117978A (en) 1978-10-14

Family

ID=12352284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3220177A Pending JPS53117978A (en) 1977-03-25 1977-03-25 Automatic mask appearance inspection apparatus

Country Status (1)

Country Link
JP (1) JPS53117978A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150222A (en) * 1979-05-11 1980-11-22 Fujitsu Ltd Method of processing signal for photomask pattern inspection
JPS55157232A (en) * 1979-05-28 1980-12-06 Fujitsu Ltd Method of inspecting pattern
JPS57196530A (en) * 1981-05-28 1982-12-02 Fujitsu Ltd Inspection of pattern
JPS57207335A (en) * 1981-06-15 1982-12-20 Fujitsu Ltd Pattern checking system
JPS57210627A (en) * 1981-06-19 1982-12-24 Hitachi Ltd Detecting method for defect of pattern
JPS5827323A (en) * 1981-08-12 1983-02-18 Hitachi Ltd Method and apparatus for testing mask
JPS5833835A (en) * 1981-08-24 1983-02-28 Hitachi Ltd Pattern inspection
JPS59173736A (en) * 1983-03-11 1984-10-01 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン Defect detector
JPS6076606A (en) * 1983-10-03 1985-05-01 Nippon Kogaku Kk <Nikon> Defect checking method of mask
JPS60126828A (en) * 1983-12-14 1985-07-06 Nippon Jido Seigyo Kk Data processing method by defect inspecting device for pattern
JPS60220934A (en) * 1984-04-17 1985-11-05 Fujitsu Ltd Inspection for mask
JPS6182107A (en) * 1984-06-28 1986-04-25 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン Optical defect inspection device
JPS61104242A (en) * 1984-10-29 1986-05-22 Hitachi Ltd Apparatus for inspecting foreign matter
JPS63228163A (en) * 1987-03-17 1988-09-22 Toppan Printing Co Ltd Plate inspection device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137039A (en) * 1974-04-17 1975-10-30

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137039A (en) * 1974-04-17 1975-10-30

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150222A (en) * 1979-05-11 1980-11-22 Fujitsu Ltd Method of processing signal for photomask pattern inspection
JPS635895B2 (en) * 1979-05-11 1988-02-05 Fujitsu Ltd
JPS55157232A (en) * 1979-05-28 1980-12-06 Fujitsu Ltd Method of inspecting pattern
JPS6311771B2 (en) * 1979-05-28 1988-03-16 Fujitsu Ltd
JPS57196530A (en) * 1981-05-28 1982-12-02 Fujitsu Ltd Inspection of pattern
JPS6239811B2 (en) * 1981-05-28 1987-08-25 Fujitsu Ltd
JPS6239812B2 (en) * 1981-06-15 1987-08-25 Fujitsu Ltd
JPS57207335A (en) * 1981-06-15 1982-12-20 Fujitsu Ltd Pattern checking system
JPS57210627A (en) * 1981-06-19 1982-12-24 Hitachi Ltd Detecting method for defect of pattern
JPS6239813B2 (en) * 1981-06-19 1987-08-25 Hitachi Ltd
JPS5827323A (en) * 1981-08-12 1983-02-18 Hitachi Ltd Method and apparatus for testing mask
JPS5833835A (en) * 1981-08-24 1983-02-28 Hitachi Ltd Pattern inspection
JPS59173736A (en) * 1983-03-11 1984-10-01 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン Defect detector
JPS6076606A (en) * 1983-10-03 1985-05-01 Nippon Kogaku Kk <Nikon> Defect checking method of mask
JPS60126828A (en) * 1983-12-14 1985-07-06 Nippon Jido Seigyo Kk Data processing method by defect inspecting device for pattern
JPS60220934A (en) * 1984-04-17 1985-11-05 Fujitsu Ltd Inspection for mask
JPH0458623B2 (en) * 1984-04-17 1992-09-18 Fujitsu Ltd
JPS6182107A (en) * 1984-06-28 1986-04-25 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン Optical defect inspection device
JPS61104242A (en) * 1984-10-29 1986-05-22 Hitachi Ltd Apparatus for inspecting foreign matter
JPS63228163A (en) * 1987-03-17 1988-09-22 Toppan Printing Co Ltd Plate inspection device

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