JPS57196530A - Inspection of pattern - Google Patents

Inspection of pattern

Info

Publication number
JPS57196530A
JPS57196530A JP8160481A JP8160481A JPS57196530A JP S57196530 A JPS57196530 A JP S57196530A JP 8160481 A JP8160481 A JP 8160481A JP 8160481 A JP8160481 A JP 8160481A JP S57196530 A JPS57196530 A JP S57196530A
Authority
JP
Japan
Prior art keywords
pattern
inspection
unit
memory
repetition pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8160481A
Other languages
Japanese (ja)
Other versions
JPS6239811B2 (en
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8160481A priority Critical patent/JPS57196530A/en
Publication of JPS57196530A publication Critical patent/JPS57196530A/en
Publication of JPS6239811B2 publication Critical patent/JPS6239811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To improve the efficiency of inspection by memorizing one unit in a repetition pattern and by using this unit as a standard for comparison with a scanning signal obtained by scanning a repetition pattern to be inspected. CONSTITUTION:One unit in a repetition pattern is scanned by an image sensor 9, and a scanning signal thus obtained is converted into a digital signal by an A/D converter 10 and stored in a memory 11. Thereafter, the repetition pattern of a pattern to be inspected is scanned sequentially and compared by a comparator 14 with a reference pattern stored in the memory 11 for inspecting an abnormality of the pattern. By this constitution, the efficiency of inspection is improved, since it becomes unnecessary to prepare reference pattern data on a magnetic tape or the like prior to the inspection, and the memory 11 can be made small in capacity, since only memorization of one unit in the repetition pattern is needed.
JP8160481A 1981-05-28 1981-05-28 Inspection of pattern Granted JPS57196530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8160481A JPS57196530A (en) 1981-05-28 1981-05-28 Inspection of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8160481A JPS57196530A (en) 1981-05-28 1981-05-28 Inspection of pattern

Publications (2)

Publication Number Publication Date
JPS57196530A true JPS57196530A (en) 1982-12-02
JPS6239811B2 JPS6239811B2 (en) 1987-08-25

Family

ID=13750917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8160481A Granted JPS57196530A (en) 1981-05-28 1981-05-28 Inspection of pattern

Country Status (1)

Country Link
JP (1) JPS57196530A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138924A (en) * 1983-12-27 1985-07-23 Fujitsu Ltd Test of pattern and device thereof
JPS63266754A (en) * 1987-04-24 1988-11-02 Hitachi Ltd Pattern detecting device using scan transparent electron microscope
JPS6425430A (en) * 1987-07-21 1989-01-27 Tokyo Electron Ltd Probe device
JPH09304040A (en) * 1996-05-13 1997-11-28 Hitachi Ltd Pattern inspection method and apparatus by elector beam
US7260256B2 (en) 1996-09-17 2007-08-21 Renesas Technology Corporation Method and system for inspecting a pattern

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013112212B4 (en) 2013-11-06 2022-03-10 Carl Zeiss Smt Gmbh Optical zoom device, optical imaging device, optical zoom method and imaging method for microscopy

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131469A (en) * 1974-04-03 1975-10-17
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method
JPS5654038A (en) * 1979-10-08 1981-05-13 Toshiba Corp Checking device for shape of photomask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131469A (en) * 1974-04-03 1975-10-17
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method
JPS5654038A (en) * 1979-10-08 1981-05-13 Toshiba Corp Checking device for shape of photomask

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138924A (en) * 1983-12-27 1985-07-23 Fujitsu Ltd Test of pattern and device thereof
JPS63266754A (en) * 1987-04-24 1988-11-02 Hitachi Ltd Pattern detecting device using scan transparent electron microscope
JPS6425430A (en) * 1987-07-21 1989-01-27 Tokyo Electron Ltd Probe device
JPH09304040A (en) * 1996-05-13 1997-11-28 Hitachi Ltd Pattern inspection method and apparatus by elector beam
US7260256B2 (en) 1996-09-17 2007-08-21 Renesas Technology Corporation Method and system for inspecting a pattern

Also Published As

Publication number Publication date
JPS6239811B2 (en) 1987-08-25

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