JPS5568629A - Device for checking minute pattern of integrated circuit or the like - Google Patents
Device for checking minute pattern of integrated circuit or the likeInfo
- Publication number
- JPS5568629A JPS5568629A JP14174078A JP14174078A JPS5568629A JP S5568629 A JPS5568629 A JP S5568629A JP 14174078 A JP14174078 A JP 14174078A JP 14174078 A JP14174078 A JP 14174078A JP S5568629 A JPS5568629 A JP S5568629A
- Authority
- JP
- Japan
- Prior art keywords
- signal
- defect
- pattern
- devider
- sent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE: To perform an extremely high-accurate detection of defect in a very minute pattern by obtaining the difference between or the ratio of a basic pattern signal and a minute pattern obtained by an electron beam scanning on a sample.
CONSTITUTION: A sample 5 is placed in the scanning microscope barrel and its surface is scanned by electron beam. Then, the detector 8 provides a video signal having an information on the sample surface and this signal is sent to the devider 10. In synchronizing with the scanning, the video signal of a defect-free basic pattern in read out of the memory 12 and sent to the devider 10. Both of the signals are devided in the devider 10, and as a result, the pattern corresponding to the basic pattern is eliminated to allow the defect only to be signalled. This defect signal is sent through the switch S to CRT13 to obtain only the defect image. Meanwhile, the output from the devider 10 is sent to the adder 11 and added to the signal from the detector 8 with a proper gain. When the switch S is uded to select the signal from the adder 11, the CRT displays both the pattern image and defect image.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14174078A JPS5568629A (en) | 1978-11-17 | 1978-11-17 | Device for checking minute pattern of integrated circuit or the like |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14174078A JPS5568629A (en) | 1978-11-17 | 1978-11-17 | Device for checking minute pattern of integrated circuit or the like |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5568629A true JPS5568629A (en) | 1980-05-23 |
Family
ID=15299092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14174078A Pending JPS5568629A (en) | 1978-11-17 | 1978-11-17 | Device for checking minute pattern of integrated circuit or the like |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5568629A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57100728A (en) * | 1980-12-16 | 1982-06-23 | Matsushita Electric Ind Co Ltd | Inspecting device for photomask |
| JPS59231811A (en) * | 1983-06-15 | 1984-12-26 | Hitachi Electronics Eng Co Ltd | Defects inspection apparatus |
| JPH09181139A (en) * | 1997-01-20 | 1997-07-11 | Hitachi Ltd | Defect inspection method |
| JPH09219428A (en) * | 1997-01-20 | 1997-08-19 | Hitachi Ltd | Electron beam inspection device |
| JPH09219427A (en) * | 1997-01-20 | 1997-08-19 | Hitachi Ltd | Electron beam inspection device |
-
1978
- 1978-11-17 JP JP14174078A patent/JPS5568629A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57100728A (en) * | 1980-12-16 | 1982-06-23 | Matsushita Electric Ind Co Ltd | Inspecting device for photomask |
| JPS59231811A (en) * | 1983-06-15 | 1984-12-26 | Hitachi Electronics Eng Co Ltd | Defects inspection apparatus |
| JPH09181139A (en) * | 1997-01-20 | 1997-07-11 | Hitachi Ltd | Defect inspection method |
| JPH09219428A (en) * | 1997-01-20 | 1997-08-19 | Hitachi Ltd | Electron beam inspection device |
| JPH09219427A (en) * | 1997-01-20 | 1997-08-19 | Hitachi Ltd | Electron beam inspection device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO1995010036A3 (en) | Cytological screening method | |
| JPS5766345A (en) | Inspection device for defect | |
| DE3266906D1 (en) | Method and apparatus for the reproduction of an image with a coarser resolution than during picture scanning | |
| GB1314313A (en) | Method of and device for the automatic focusing of microscopes | |
| JPS56114269A (en) | Scanning type electronic microscope | |
| EP0353504A3 (en) | Automatic structure analyzing/processing apparatus | |
| EP0046058A3 (en) | Web monitoring apparatus | |
| JPS54114264A (en) | Screw inspection method | |
| JPS5568629A (en) | Device for checking minute pattern of integrated circuit or the like | |
| JPS6449196A (en) | Method and apparatus for reading electronic signal pattern stored in movable image recording plane | |
| GB1519704A (en) | Method and means for measuring substance volumes in light-trasnmitting samples | |
| JPS56150303A (en) | Surface form measuring device using scan-type electronic microscope | |
| JPS54143168A (en) | Appearance tester | |
| JPS56120264A (en) | Picture read-in device | |
| JPS57196530A (en) | Inspection of pattern | |
| JPS5541668A (en) | Detecting method of character position | |
| JPS5472076A (en) | Method and apparatus for pattern inspection | |
| JPS5289459A (en) | Stereo scan electron microscope | |
| JPS5593365A (en) | Judging method for video quality | |
| JPS54100669A (en) | Electron-beam unit | |
| JPS5294768A (en) | Electronic microscope | |
| JPS54138467A (en) | Scanning type electron microscope or resembling apparatus | |
| JPS55138976A (en) | Linearity correction method of itv camera | |
| JPS5492774A (en) | Method and apparatus for detecting objects | |
| JPS54158161A (en) | Scan-type electron microscope |