JPS57210627A - Detecting method for defect of pattern - Google Patents

Detecting method for defect of pattern

Info

Publication number
JPS57210627A
JPS57210627A JP9384381A JP9384381A JPS57210627A JP S57210627 A JPS57210627 A JP S57210627A JP 9384381 A JP9384381 A JP 9384381A JP 9384381 A JP9384381 A JP 9384381A JP S57210627 A JPS57210627 A JP S57210627A
Authority
JP
Japan
Prior art keywords
patterns
pattern
defect
corner sections
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9384381A
Other languages
Japanese (ja)
Other versions
JPS6239813B2 (en
Inventor
Yasuhiko Hara
Keiichi Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9384381A priority Critical patent/JPS57210627A/en
Publication of JPS57210627A publication Critical patent/JPS57210627A/en
Publication of JPS6239813B2 publication Critical patent/JPS6239813B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To detect the defect of the circuit patterns of a photo-mask, etc. with high accuracy by detecting the form of the partial pattern first and confirming the presence in another pattern to be compared of the pattern with the same form. CONSTITUTION:The patterns 1, 2 are detected by means of pattern pickup appliances 4, 4' through lenses 3, 3', and video signals 5, 5' obtained through the detection are changed into binary by means of binary coding circuits 6, 6', and each inputted to memories 7, 7'. The partial patterns such as the form of corner sections 11 are detected by means of specified pattern detecting circuits 8 from a picture memorized, the corner sections of the patterns are compared by means of a comparison circuit 9, and the patterns are decided as normalcy when there are the corner sections in both patterns and as the defect of the patterns when there is one only in one side.
JP9384381A 1981-06-19 1981-06-19 Detecting method for defect of pattern Granted JPS57210627A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9384381A JPS57210627A (en) 1981-06-19 1981-06-19 Detecting method for defect of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9384381A JPS57210627A (en) 1981-06-19 1981-06-19 Detecting method for defect of pattern

Publications (2)

Publication Number Publication Date
JPS57210627A true JPS57210627A (en) 1982-12-24
JPS6239813B2 JPS6239813B2 (en) 1987-08-25

Family

ID=14093675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9384381A Granted JPS57210627A (en) 1981-06-19 1981-06-19 Detecting method for defect of pattern

Country Status (1)

Country Link
JP (1) JPS57210627A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131469A (en) * 1974-04-03 1975-10-17
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131469A (en) * 1974-04-03 1975-10-17
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus

Also Published As

Publication number Publication date
JPS6239813B2 (en) 1987-08-25

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