JPS57188823A - Inspecting device for pattern - Google Patents

Inspecting device for pattern

Info

Publication number
JPS57188823A
JPS57188823A JP7308381A JP7308381A JPS57188823A JP S57188823 A JPS57188823 A JP S57188823A JP 7308381 A JP7308381 A JP 7308381A JP 7308381 A JP7308381 A JP 7308381A JP S57188823 A JPS57188823 A JP S57188823A
Authority
JP
Japan
Prior art keywords
pattern
binary signals
feature
picture
design
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7308381A
Other languages
Japanese (ja)
Other versions
JPH02853B2 (en
Inventor
Junji Hazama
Atsushi Kawahara
Norio Fujii
Kazunari Hata
Toru Azuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP7308381A priority Critical patent/JPS57188823A/en
Publication of JPS57188823A publication Critical patent/JPS57188823A/en
Publication of JPH02853B2 publication Critical patent/JPH02853B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To inspect the pattern prepared on the basis of design data by changing the original picture of the pattern and the design data into binary signals and comparing the features of the signals. CONSTITUTION:The original picture of the pattern on a material to be inspected, such as a reticle, a mask, etc. is scanned and turned into picture binary signals converted into a picture element while design binary signals are calculated from the design data. The feature within a predetermined range is detected from the design binary signals, and memorized. A switch is changed over and the feature is detected about the picture binary signals, the feature of the design binary signals and the feature of the picture binary signals are compared, and the pattern is inspected. Since detecting informations by the two signals are compared as mentioned above, relationship included need not be calculated by a programme and feature informations be generated as seen in conventional devices even when there are two stacked rectangular patterns, and the pattern can be inspected at high speed.
JP7308381A 1981-05-15 1981-05-15 Inspecting device for pattern Granted JPS57188823A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7308381A JPS57188823A (en) 1981-05-15 1981-05-15 Inspecting device for pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7308381A JPS57188823A (en) 1981-05-15 1981-05-15 Inspecting device for pattern

Publications (2)

Publication Number Publication Date
JPS57188823A true JPS57188823A (en) 1982-11-19
JPH02853B2 JPH02853B2 (en) 1990-01-09

Family

ID=13508077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7308381A Granted JPS57188823A (en) 1981-05-15 1981-05-15 Inspecting device for pattern

Country Status (1)

Country Link
JP (1) JPS57188823A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427370A (en) * 1977-08-02 1979-03-01 Olympus Optical Co Ltd Edge processing method in pattern test
JPS5472077A (en) * 1977-11-19 1979-06-09 Fuji Electric Co Ltd Pattern inspection apparatus
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method
JPS54102837A (en) * 1978-01-28 1979-08-13 Nippon Telegr & Teleph Corp <Ntt> Pattern check system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427370A (en) * 1977-08-02 1979-03-01 Olympus Optical Co Ltd Edge processing method in pattern test
JPS5472077A (en) * 1977-11-19 1979-06-09 Fuji Electric Co Ltd Pattern inspection apparatus
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method
JPS54102837A (en) * 1978-01-28 1979-08-13 Nippon Telegr & Teleph Corp <Ntt> Pattern check system

Also Published As

Publication number Publication date
JPH02853B2 (en) 1990-01-09

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