JPS5696204A - Inspection system for defect of continuous pattern - Google Patents
Inspection system for defect of continuous patternInfo
- Publication number
- JPS5696204A JPS5696204A JP17188779A JP17188779A JPS5696204A JP S5696204 A JPS5696204 A JP S5696204A JP 17188779 A JP17188779 A JP 17188779A JP 17188779 A JP17188779 A JP 17188779A JP S5696204 A JPS5696204 A JP S5696204A
- Authority
- JP
- Japan
- Prior art keywords
- signal
- overlap
- pattern
- checked
- processing circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Image Processing (AREA)
- Image Analysis (AREA)
Abstract
PURPOSE: To inspect a pattern accurately and automatically by comparing pattern signals before and after a repetitive object pattern picked up with a line sensor and an object pattern signal for overlap.
CONSTITUTION: An object pattern picked up with a line sensor 4 of CCD and a binary signal of three patterns ensuing thereto are stored in shift registers 11W14 in sequence. The output comes into a signal processing circuit 20 to compare an object signal BS1 and signals BS2WBS4 for overlap, and the overlapped signal is extracted as a picture signal BSOA. On the other hand, the signal BS1 is checked for overlap with a checked picture signal BSO1 line precedent through a signal processing circuit 30, and thus a signal BSOB is extracted. Both the output signals are checked for through a logical circuit 40, the output signal BSOC is again checked for overlap with BSO through a signal processing circuit 50, and when a pattern free from overlap is found, it is decided as defective. Inspection is thus carried out accurately and automatically.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17188779A JPS5696204A (en) | 1979-12-28 | 1979-12-28 | Inspection system for defect of continuous pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17188779A JPS5696204A (en) | 1979-12-28 | 1979-12-28 | Inspection system for defect of continuous pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5696204A true JPS5696204A (en) | 1981-08-04 |
Family
ID=15931631
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17188779A Pending JPS5696204A (en) | 1979-12-28 | 1979-12-28 | Inspection system for defect of continuous pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5696204A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59123983A (en) * | 1982-12-29 | 1984-07-17 | Fujitsu Ltd | Pattern checking device |
JPS59188782A (en) * | 1983-04-11 | 1984-10-26 | Sony Corp | Method for checking pattern |
USRE37740E1 (en) | 1988-02-19 | 2002-06-11 | Kla-Tencor Corporation | Method and apparatus for optical inspection of substrates |
-
1979
- 1979-12-28 JP JP17188779A patent/JPS5696204A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59123983A (en) * | 1982-12-29 | 1984-07-17 | Fujitsu Ltd | Pattern checking device |
JPS59188782A (en) * | 1983-04-11 | 1984-10-26 | Sony Corp | Method for checking pattern |
USRE37740E1 (en) | 1988-02-19 | 2002-06-11 | Kla-Tencor Corporation | Method and apparatus for optical inspection of substrates |
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