JPS5238887A - Apparatus for inspection of pattern defects - Google Patents

Apparatus for inspection of pattern defects

Info

Publication number
JPS5238887A
JPS5238887A JP50114276A JP11427675A JPS5238887A JP S5238887 A JPS5238887 A JP S5238887A JP 50114276 A JP50114276 A JP 50114276A JP 11427675 A JP11427675 A JP 11427675A JP S5238887 A JPS5238887 A JP S5238887A
Authority
JP
Japan
Prior art keywords
inspection
pattern defects
patterns
flaw
superimposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50114276A
Other languages
Japanese (ja)
Other versions
JPS5324780B2 (en
Inventor
Takayasu Ito
Koji Sato
Hideo Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP50114276A priority Critical patent/JPS5238887A/en
Publication of JPS5238887A publication Critical patent/JPS5238887A/en
Publication of JPS5324780B2 publication Critical patent/JPS5324780B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Processing Or Creating Images (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)

Abstract

PURPOSE:To detect any flaw or defect of patterns by extracting a specific color region from the composite color image wherein two adjacent patterns of the same shape are superimposed.
JP50114276A 1975-09-23 1975-09-23 Apparatus for inspection of pattern defects Granted JPS5238887A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50114276A JPS5238887A (en) 1975-09-23 1975-09-23 Apparatus for inspection of pattern defects

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50114276A JPS5238887A (en) 1975-09-23 1975-09-23 Apparatus for inspection of pattern defects

Publications (2)

Publication Number Publication Date
JPS5238887A true JPS5238887A (en) 1977-03-25
JPS5324780B2 JPS5324780B2 (en) 1978-07-22

Family

ID=14633762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50114276A Granted JPS5238887A (en) 1975-09-23 1975-09-23 Apparatus for inspection of pattern defects

Country Status (1)

Country Link
JP (1) JPS5238887A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55159138A (en) * 1979-05-30 1980-12-11 Toppan Printing Co Ltd Method and apparatus for inspection of film negative
JPS5668730U (en) * 1979-10-31 1981-06-08
JPS56129845A (en) * 1980-03-14 1981-10-12 Matsushita Electronics Corp Inspecting method for color filter
JPS56129844A (en) * 1980-03-14 1981-10-12 Matsushita Electronics Corp Method and apparatus for inspecting color filter
JPS57208153A (en) * 1981-06-17 1982-12-21 Hitachi Ltd Inspecting method for defective aluminum pattern of semiconductor or the like
JPS597954A (en) * 1982-07-06 1984-01-17 Nec Corp Reduced projection type exposing device
JPS62134160U (en) * 1987-01-22 1987-08-24

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55159138A (en) * 1979-05-30 1980-12-11 Toppan Printing Co Ltd Method and apparatus for inspection of film negative
JPS5668730U (en) * 1979-10-31 1981-06-08
JPS56129845A (en) * 1980-03-14 1981-10-12 Matsushita Electronics Corp Inspecting method for color filter
JPS56129844A (en) * 1980-03-14 1981-10-12 Matsushita Electronics Corp Method and apparatus for inspecting color filter
JPS57208153A (en) * 1981-06-17 1982-12-21 Hitachi Ltd Inspecting method for defective aluminum pattern of semiconductor or the like
JPS6150383B2 (en) * 1981-06-17 1986-11-04 Hitachi Ltd
JPS597954A (en) * 1982-07-06 1984-01-17 Nec Corp Reduced projection type exposing device
JPS62134160U (en) * 1987-01-22 1987-08-24
JPS6315960Y2 (en) * 1987-01-22 1988-05-06

Also Published As

Publication number Publication date
JPS5324780B2 (en) 1978-07-22

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