JPS5242790A - Method of inspecting appearance of objects - Google Patents

Method of inspecting appearance of objects

Info

Publication number
JPS5242790A
JPS5242790A JP11770775A JP11770775A JPS5242790A JP S5242790 A JPS5242790 A JP S5242790A JP 11770775 A JP11770775 A JP 11770775A JP 11770775 A JP11770775 A JP 11770775A JP S5242790 A JPS5242790 A JP S5242790A
Authority
JP
Japan
Prior art keywords
objects
inspecting appearance
appearance
inspection
inspecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11770775A
Other languages
Japanese (ja)
Inventor
Kiyoshi Nakagawa
Joichiro Kageyama
Kazuhiko Eguchi
Shigeaki Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11770775A priority Critical patent/JPS5242790A/en
Publication of JPS5242790A publication Critical patent/JPS5242790A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:Appearance of an object, such as photomask, is inspected with the pattern information which is the basis for preparation of master patterns as a refere reference, whereby the degree of reliability of the inspection is enhanced and the speed of inspection is increased.
JP11770775A 1975-10-01 1975-10-01 Method of inspecting appearance of objects Pending JPS5242790A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11770775A JPS5242790A (en) 1975-10-01 1975-10-01 Method of inspecting appearance of objects

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11770775A JPS5242790A (en) 1975-10-01 1975-10-01 Method of inspecting appearance of objects

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP60103739A Division JPS6122237A (en) 1985-05-17 1985-05-17 Apparatus for inspecting appearance of object

Publications (1)

Publication Number Publication Date
JPS5242790A true JPS5242790A (en) 1977-04-02

Family

ID=14718306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11770775A Pending JPS5242790A (en) 1975-10-01 1975-10-01 Method of inspecting appearance of objects

Country Status (1)

Country Link
JP (1) JPS5242790A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57124206A (en) * 1981-01-26 1982-08-03 Mitsubishi Electric Corp Pattern defective detector
JPS57141548A (en) * 1981-02-25 1982-09-01 Tokyo Keiki Co Ltd Ultrasonic flaw detecting method
JPS5821111A (en) * 1981-07-29 1983-02-07 Nippon Kogaku Kk <Nikon> Positioning device for pattern detection
JPS5848838A (en) * 1981-09-18 1983-03-22 Fujitsu Ltd Inspecting method for reticle and photomask
JPS5852510A (en) * 1981-09-24 1983-03-28 Toshiba Corp Pattern defect inspecting device
JPS58158921A (en) * 1982-03-16 1983-09-21 Dainippon Printing Co Ltd Defect inspection apparatus of regular pattern
JPS59102106A (en) * 1982-12-03 1984-06-13 Hitachi Denshi Syst Service Kk Inspecting system
US4623256A (en) * 1983-11-24 1986-11-18 Kabushiki Kaisha Toshiba Apparatus for inspecting mask used for manufacturing integrated circuits
JPS61273088A (en) * 1985-05-29 1986-12-03 Hitachi Ltd Inspection method for surface pattern
US4798654A (en) * 1987-05-06 1989-01-17 Mitsui Toatsu Chemicals, Inc. Process for preparing bisphenol A
JPH01146839A (en) * 1987-12-04 1989-06-08 Mitsui Toatsu Chem Inc Production of high-purity 2,2-bis(4-hydroxyphenyl)propane

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57124206A (en) * 1981-01-26 1982-08-03 Mitsubishi Electric Corp Pattern defective detector
JPS57141548A (en) * 1981-02-25 1982-09-01 Tokyo Keiki Co Ltd Ultrasonic flaw detecting method
JPS5821111A (en) * 1981-07-29 1983-02-07 Nippon Kogaku Kk <Nikon> Positioning device for pattern detection
JPS5848838A (en) * 1981-09-18 1983-03-22 Fujitsu Ltd Inspecting method for reticle and photomask
JPS5852510A (en) * 1981-09-24 1983-03-28 Toshiba Corp Pattern defect inspecting device
JPS58158921A (en) * 1982-03-16 1983-09-21 Dainippon Printing Co Ltd Defect inspection apparatus of regular pattern
JPS59102106A (en) * 1982-12-03 1984-06-13 Hitachi Denshi Syst Service Kk Inspecting system
US4623256A (en) * 1983-11-24 1986-11-18 Kabushiki Kaisha Toshiba Apparatus for inspecting mask used for manufacturing integrated circuits
JPS61273088A (en) * 1985-05-29 1986-12-03 Hitachi Ltd Inspection method for surface pattern
US4798654A (en) * 1987-05-06 1989-01-17 Mitsui Toatsu Chemicals, Inc. Process for preparing bisphenol A
JPH01146839A (en) * 1987-12-04 1989-06-08 Mitsui Toatsu Chem Inc Production of high-purity 2,2-bis(4-hydroxyphenyl)propane
US4942265A (en) * 1987-12-04 1990-07-17 Mitsui Toatsu Chemicals, Inc. Process for preparing 2,2-bis(4-hydroxyphenyl)propane of high purity

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