JPS5254483A - Method of inspecting photo mask patterns, etc. - Google Patents

Method of inspecting photo mask patterns, etc.

Info

Publication number
JPS5254483A
JPS5254483A JP12920575A JP12920575A JPS5254483A JP S5254483 A JPS5254483 A JP S5254483A JP 12920575 A JP12920575 A JP 12920575A JP 12920575 A JP12920575 A JP 12920575A JP S5254483 A JPS5254483 A JP S5254483A
Authority
JP
Japan
Prior art keywords
mask patterns
photo mask
inspecting
inspecting photo
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12920575A
Other languages
Japanese (ja)
Other versions
JPS5850414B2 (en
Inventor
Kiyoshi Nakagawa
Hiroyuki Ibe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50129205A priority Critical patent/JPS5850414B2/en
Publication of JPS5254483A publication Critical patent/JPS5254483A/en
Publication of JPS5850414B2 publication Critical patent/JPS5850414B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:Presence or absence of any defect in patterns is automatically inspected, criteria for asessment of defects is made uniform and inspection time is considerably shortened.
JP50129205A 1975-10-29 1975-10-29 Pattern inspection method Expired JPS5850414B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50129205A JPS5850414B2 (en) 1975-10-29 1975-10-29 Pattern inspection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50129205A JPS5850414B2 (en) 1975-10-29 1975-10-29 Pattern inspection method

Publications (2)

Publication Number Publication Date
JPS5254483A true JPS5254483A (en) 1977-05-02
JPS5850414B2 JPS5850414B2 (en) 1983-11-10

Family

ID=15003723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50129205A Expired JPS5850414B2 (en) 1975-10-29 1975-10-29 Pattern inspection method

Country Status (1)

Country Link
JP (1) JPS5850414B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54122980A (en) * 1978-03-16 1979-09-22 Nec Corp Surface inspection unit for semiconductor pellet
JPS5635419A (en) * 1979-08-30 1981-04-08 Fujitsu Ltd Pattern inspection device
JPS58199528A (en) * 1982-05-18 1983-11-19 Nippon Kogaku Kk <Nikon> Defect inspecting device for pattern
JPS60231325A (en) * 1984-04-28 1985-11-16 Fujitsu Ltd Inspection of mask

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0455735A (en) * 1990-06-25 1992-02-24 Sharp Corp Inspecting apparatus for light-transmitting type display panel

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54122980A (en) * 1978-03-16 1979-09-22 Nec Corp Surface inspection unit for semiconductor pellet
JPS5635419A (en) * 1979-08-30 1981-04-08 Fujitsu Ltd Pattern inspection device
JPS6156865B2 (en) * 1979-08-30 1986-12-04 Fujitsu Ltd
JPS58199528A (en) * 1982-05-18 1983-11-19 Nippon Kogaku Kk <Nikon> Defect inspecting device for pattern
JPS60231325A (en) * 1984-04-28 1985-11-16 Fujitsu Ltd Inspection of mask

Also Published As

Publication number Publication date
JPS5850414B2 (en) 1983-11-10

Similar Documents

Publication Publication Date Title
JPS6471122A (en) Method of inspecting quality of reticle mask pattern and the like, its object for monitor and method of inspecting object
JPS5276088A (en) System for inspecting defects of pattern having directivity
JPS5254483A (en) Method of inspecting photo mask patterns, etc.
NO153986C (en) PROCEDURE AND APPARATUS FOR DETERMINING THE CONCENTRATION OF AN ABSORBABLE COMPONENT IN A GAS FLOW.
JPS5242790A (en) Method of inspecting appearance of objects
JPS5225575A (en) Inspection method of the state of object
JPS52148183A (en) Method of projecting and receiving light for hue inspecting apparatus
JPS5757245A (en) Inspecting method and device for appearance of semiconductor wafer
SE437303B (en) PROCEDURE FOR ON-LINE Saturation of the concentration of an analyte in a container, as well as apparatus for performing the procedure
JPS5223985A (en) Method of detecting flaws of springs
JPS5322370A (en) Inspecting method of semiconductor device
JPS5326185A (en) Defect inspecting apparatus
JPS5249880A (en) Defect inspecting apparatus
JPS5238382A (en) Apparatus for inspecting eggs
JPS5317383A (en) Non-contactive detecting method and apparatus for defect in shape of strip type inspected body
JPS5214477A (en) Method to detect a defect in a transparent test object
JPS51147378A (en) Flaw detecting method of steel pieces
JPS5329790A (en) Nonndestructive inspecting apparatus
JPS5754322A (en) Inspecting method for photomask
JPS51122379A (en) Treatment for defect of photo-mask
JPS5222479A (en) Method of inspecting masks
IL50339A0 (en) Method and dry developer composition for dye penetrant inspection
JPS5340584A (en) Bottle inspector by elliptically focusing system
JPS5249879A (en) Inspection device for photoelectric defect inspection apparatus
JPS539186A (en) Discrimination level setter of defect inspecting apparatus