JPS5754322A - Inspecting method for photomask - Google Patents

Inspecting method for photomask

Info

Publication number
JPS5754322A
JPS5754322A JP13092280A JP13092280A JPS5754322A JP S5754322 A JPS5754322 A JP S5754322A JP 13092280 A JP13092280 A JP 13092280A JP 13092280 A JP13092280 A JP 13092280A JP S5754322 A JPS5754322 A JP S5754322A
Authority
JP
Japan
Prior art keywords
photomask
pattern
inspection
mask
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13092280A
Other languages
Japanese (ja)
Inventor
Hiroshi Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13092280A priority Critical patent/JPS5754322A/en
Publication of JPS5754322A publication Critical patent/JPS5754322A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To conduct the inspection of defects of the photomask accurately and swiftly by a method wherein a sample for inspection whereon the pattern of the first photomask to be inspected is transferred is compared with the second photomask having the same pattern with that of the first mask by projecting a light thereon. CONSTITUTION:The pattern 21 of the first photomask 15 is transferred by ultraviolet rays onto a substrate 14 prepared by coating a transparent glass plate 11 with an opaque film 12 and a resist 13. Next, a resist pattern 17 obtained through developing treatment of the pattern 21 thus transferred being used as a mask, an Al film 12 is etched to form a pattern 18 and thereby a substrate 14' for comparison is obtained. And, the second photomask 19 having the same pattern with that of the first mask 15 and the substrate 14' for comparison are applied to a comparator and the two are compared by means of laser beams 20, whereby the defects of the pattern is detected. By this constitution, the inspection of defects of the photomask can be performed swiftly and surely without visual inspection being applied.
JP13092280A 1980-09-19 1980-09-19 Inspecting method for photomask Pending JPS5754322A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13092280A JPS5754322A (en) 1980-09-19 1980-09-19 Inspecting method for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13092280A JPS5754322A (en) 1980-09-19 1980-09-19 Inspecting method for photomask

Publications (1)

Publication Number Publication Date
JPS5754322A true JPS5754322A (en) 1982-03-31

Family

ID=15045865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13092280A Pending JPS5754322A (en) 1980-09-19 1980-09-19 Inspecting method for photomask

Country Status (1)

Country Link
JP (1) JPS5754322A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6071304A (en) * 1984-09-03 1985-04-23 Toyobo Co Ltd Large sized bias tire
JPH04127515A (en) * 1990-09-19 1992-04-28 Fujitsu Ltd X-ray mask inspecting method
CN113334754A (en) * 2021-07-01 2021-09-03 唐汉聪 Surface film coating process for ink printing paper

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6071304A (en) * 1984-09-03 1985-04-23 Toyobo Co Ltd Large sized bias tire
JPH04127515A (en) * 1990-09-19 1992-04-28 Fujitsu Ltd X-ray mask inspecting method
CN113334754A (en) * 2021-07-01 2021-09-03 唐汉聪 Surface film coating process for ink printing paper

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