JPH0338851A - Inspection of glass mask - Google Patents

Abstract

PURPOSE:To shorten the formation time of a glass wafer by a method wherein an opaque photosensitizer is used and only the photosensitizer is used as a nontransmissive property of a metal film. CONSTITUTION:A glass mask or a reticle to be inspected is exposed, by using an aligner, on a glass wafer coated with an opaque photosensitizer; a development treatment is executed. This glass wafer is inspected by using a transmission microscope. Alternately, it is inspected by using an automatic mask inspection apparatus of a transmitted light type; a defect, a dust particle or the like on the glass mask is detected; it is removed in order to prevent a defective product. Thereby, the mask inspection time and a mask inspection process can be reduced sharply.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for inspecting a glass mask used in a processing process using photolithography, such as a semiconductor device manufacturing process or a liquid crystal panel manufacturing process.

[Summary of the invention]

In this invention, defects in a glass mask are printed onto an opaque photosensitizer on a glass wafer, the glass wafer is inspected using i3 ultraviolet light, and the imaged defects are detected using the difference in brightness depending on the presence or absence of the photosensitizer. The presence or absence of defects is determined and the presence or absence of defects in the glass mask is investigated.

[Conventional technology]

Conventionally, a metal film such as chromium or aluminum is coated on a glass wafer, a photosensitizer is applied on top of the coating, a glass mask pattern is baked and developed, and the metal film is ethoched, and the unnecessary photosensitizer is removed. It was removed and inspected using transmitted light and the brightness and darkness of the metal film pattern formed.

[Problem to be solved by the invention]

However, the conventional method using a metal film has the disadvantage that it takes a long time to prepare the glass wafer. Another disadvantage is that the same pattern as that printed on the photosensitive material must be accurately ethoched on the metal film, making the processing extremely difficult.

Therefore, in order to solve these conventional drawbacks, the present invention aims at an inspection method using a glass wafer without using a metal film.

[Means to solve the problem]

In order to solve the second problem, this invention mixes dye etc. into the photosensitizer to make it opaque, or uses an opaque photosensitizer, so that the impermeability of the metal film is replaced by only the photosensitizer. I made it.

〔Example〕

The present invention will be explained in detail below. A glass mask or reticle to be inspected is printed onto a glass wafer coated with an opaque photosensitive agent using an exposure device, and then developed. This glass wafer is inspected using a transmission microscope. Alternatively, an inspection is performed using a transmitted light type automatic mask inspection device to discover defects such as dust on the glass mask and remove them to prevent product defects.

[Effects of the Invention] As explained above, the present invention can significantly reduce the mask inspection time with the simple change of using an opaque photosensitive agent.

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Claims (1)

[Claims] A method for detecting defects, dust, etc. on the patterned surface of a glass mask, its back surface, or a protective cover (pellicle), which comprises: coating a glass wafer with an opaque photosensitive agent; Burning a mask pattern onto the photosensitizer,
A method characterized in that a pattern formed by development is inspected at once for the presence or absence of defects, dust, etc. on the pattern surface, back surface, and pellicle surface using transmitted light.