JPS56120127A - Check method for mask pattern defect - Google Patents

Check method for mask pattern defect

Info

Publication number
JPS56120127A
JPS56120127A JP2433180A JP2433180A JPS56120127A JP S56120127 A JPS56120127 A JP S56120127A JP 2433180 A JP2433180 A JP 2433180A JP 2433180 A JP2433180 A JP 2433180A JP S56120127 A JPS56120127 A JP S56120127A
Authority
JP
Japan
Prior art keywords
mask
image
pattern
film
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2433180A
Other languages
Japanese (ja)
Inventor
Nobufumi Komori
Yoji Masuko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP2433180A priority Critical patent/JPS56120127A/en
Publication of JPS56120127A publication Critical patent/JPS56120127A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Abstract

PURPOSE:To discover a defect visually in a short time without fail by transferring a positive image and a negative image on a transparent substrate and leaving only a defective pattern part transparent the regard to a check on a photomask used for the manufacture of a semiconductor device. CONSTITUTION:A mask to be checked 20 is tightly attached on a positive-type photoregist film 101, and a light is irradiated in ''L'' direction. Then through development process, a positive image 101a corresponding to a pattern 22 on the mask 20 is obtained. Thus the formation of a missing or a defect part is confirmed. Next, a negative-type photoregist film 102 is applied and formed on a positive image 101a, and on the said film, a standard mask 10 is tightly attached. Following this procedure, a light is irrediated in ''L'' direction and through development process, a negative image 102a corresponding to an inverted image of a pattern 12 of the mask 10 is obtained on the positive image 101a. This photoregist film generates a missing or a defective part 103 only on a part corresponding to a defect 23 in a pattern 22 of the mask 20. Only said missing or defective part remains transparent.
JP2433180A 1980-02-27 1980-02-27 Check method for mask pattern defect Pending JPS56120127A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2433180A JPS56120127A (en) 1980-02-27 1980-02-27 Check method for mask pattern defect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2433180A JPS56120127A (en) 1980-02-27 1980-02-27 Check method for mask pattern defect

Publications (1)

Publication Number Publication Date
JPS56120127A true JPS56120127A (en) 1981-09-21

Family

ID=12135189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2433180A Pending JPS56120127A (en) 1980-02-27 1980-02-27 Check method for mask pattern defect

Country Status (1)

Country Link
JP (1) JPS56120127A (en)

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