JPS5635419A - Pattern inspection device - Google Patents

Pattern inspection device

Info

Publication number
JPS5635419A
JPS5635419A JP11072279A JP11072279A JPS5635419A JP S5635419 A JPS5635419 A JP S5635419A JP 11072279 A JP11072279 A JP 11072279A JP 11072279 A JP11072279 A JP 11072279A JP S5635419 A JPS5635419 A JP S5635419A
Authority
JP
Japan
Prior art keywords
light
mask
signals
laser light
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11072279A
Other languages
Japanese (ja)
Other versions
JPS6156865B2 (en
Inventor
Katsumi Fujiwara
Masahito Nakajima
Taku Yoshida
Masayuki Oyama
Kikuo Mita
Tadao Nakakuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11072279A priority Critical patent/JPS5635419A/en
Publication of JPS5635419A publication Critical patent/JPS5635419A/en
Publication of JPS6156865B2 publication Critical patent/JPS6156865B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To eliminate the overlooking of inspection and ensure the inspection of a pattern, by checking the pattern of a mask with a light scanner while irradiating laser light upon the mask located on an X-Y stage and by simultaneously determining a light spot address through a position clock plate and synthesizing signals. CONSTITUTION:A mask 32 is placed on an X-Y stage 30 which is operated by motors 32, 34. Laser light from a laser light source 36 is irradiated upon the mask through lenses 38, 40. At the same time, a light scanner 42 made of a rotary polyhedral reflector or the like to scan the mask 32 zigzag to obtain signals. The signals are displayed on an inspection result indicator 36 through an inspector control system 54. A half mirror is provided in an optical path for the laser light to apply the light to a position locking plate 50. A light spot address is determined by a light detector 52 and applied to the control system 54 to produce a signal. These signals are synthesized, while a light transmitted through the mask 32 is changed into an electric pattern signal by a light detector 44. The pattern signal is converted into a binary code by a processing circuit 46. If the existence of a defect is detected, it is also displayed.
JP11072279A 1979-08-30 1979-08-30 Pattern inspection device Granted JPS5635419A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11072279A JPS5635419A (en) 1979-08-30 1979-08-30 Pattern inspection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11072279A JPS5635419A (en) 1979-08-30 1979-08-30 Pattern inspection device

Publications (2)

Publication Number Publication Date
JPS5635419A true JPS5635419A (en) 1981-04-08
JPS6156865B2 JPS6156865B2 (en) 1986-12-04

Family

ID=14542821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11072279A Granted JPS5635419A (en) 1979-08-30 1979-08-30 Pattern inspection device

Country Status (1)

Country Link
JP (1) JPS5635419A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852981U (en) * 1981-09-26 1983-04-11 不二製油株式会社 Room-temperature gelling material pumping device
JPS59186323A (en) * 1983-04-07 1984-10-23 Fujitsu Ltd Pattern testing system
KR100447988B1 (en) * 1998-10-27 2004-11-16 주식회사 하이닉스반도체 Defect inspection method of mask pattern

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6160667U (en) * 1984-09-25 1986-04-24
JPS61108316A (en) * 1984-10-30 1986-05-27 九州積水工業株式会社 Seeding of laver

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254483A (en) * 1975-10-29 1977-05-02 Hitachi Ltd Method of inspecting photo mask patterns, etc.

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254483A (en) * 1975-10-29 1977-05-02 Hitachi Ltd Method of inspecting photo mask patterns, etc.

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852981U (en) * 1981-09-26 1983-04-11 不二製油株式会社 Room-temperature gelling material pumping device
JPH0127670Y2 (en) * 1981-09-26 1989-08-21
JPS59186323A (en) * 1983-04-07 1984-10-23 Fujitsu Ltd Pattern testing system
KR100447988B1 (en) * 1998-10-27 2004-11-16 주식회사 하이닉스반도체 Defect inspection method of mask pattern

Also Published As

Publication number Publication date
JPS6156865B2 (en) 1986-12-04

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