JPS5790627A - Projecting exposure method - Google Patents

Projecting exposure method

Info

Publication number
JPS5790627A
JPS5790627A JP16751980A JP16751980A JPS5790627A JP S5790627 A JPS5790627 A JP S5790627A JP 16751980 A JP16751980 A JP 16751980A JP 16751980 A JP16751980 A JP 16751980A JP S5790627 A JPS5790627 A JP S5790627A
Authority
JP
Japan
Prior art keywords
reticles
exposed
photomask
constitution
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16751980A
Other languages
Japanese (ja)
Inventor
Setsuo Nagashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16751980A priority Critical patent/JPS5790627A/en
Publication of JPS5790627A publication Critical patent/JPS5790627A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To improve the production yield of a semiconductor device, by using two sheets of photomask having the same mask pattern and optically superposing the pattern images of these photomasks to project them on a surface to be exposed. CONSTITUTION:Ultraviolet beam sources 1a and 1b are provided at the upper part of a pair of parallel lens barrels, and the 1st and 2nd reticles 2a and 2b are added at the lower part of each beam source respectively. The mask patterns of the reticles 2a and 2b are reflected by a mirror 4a or 4b and made incident to a superposed mirror part 5 provided at the middle position of both barrels to be projected in reduction onto the surface to be exposed. In such constitution, the residue of a light shielding mask or the dust existing on the reticles is never transcribed to the surface to be exposed. Thus the production yield is increased for the photomask or semiconductor device.
JP16751980A 1980-11-28 1980-11-28 Projecting exposure method Pending JPS5790627A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16751980A JPS5790627A (en) 1980-11-28 1980-11-28 Projecting exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16751980A JPS5790627A (en) 1980-11-28 1980-11-28 Projecting exposure method

Publications (1)

Publication Number Publication Date
JPS5790627A true JPS5790627A (en) 1982-06-05

Family

ID=15851188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16751980A Pending JPS5790627A (en) 1980-11-28 1980-11-28 Projecting exposure method

Country Status (1)

Country Link
JP (1) JPS5790627A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0097831A2 (en) * 1982-06-30 1984-01-11 International Business Machines Corporation Optical projection systems and methods of producing optical images
US10145044B2 (en) 2015-04-09 2018-12-04 Adidas Ag Knitted bag

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0097831A2 (en) * 1982-06-30 1984-01-11 International Business Machines Corporation Optical projection systems and methods of producing optical images
US10145044B2 (en) 2015-04-09 2018-12-04 Adidas Ag Knitted bag

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