JPS53144270A - Projection-type mask aligner - Google Patents
Projection-type mask alignerInfo
- Publication number
- JPS53144270A JPS53144270A JP5868677A JP5868677A JPS53144270A JP S53144270 A JPS53144270 A JP S53144270A JP 5868677 A JP5868677 A JP 5868677A JP 5868677 A JP5868677 A JP 5868677A JP S53144270 A JPS53144270 A JP S53144270A
- Authority
- JP
- Japan
- Prior art keywords
- projection
- type mask
- mask aligner
- mask
- recision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To secure a high-recision alignment between the photo mask and the wafer by synchronizing the optical axis of the detecting optical system with the extended line combining the center of the mask positioning pattern and the incident iris of the projection lens.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5868677A JPS53144270A (en) | 1977-05-23 | 1977-05-23 | Projection-type mask aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5868677A JPS53144270A (en) | 1977-05-23 | 1977-05-23 | Projection-type mask aligner |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53144270A true JPS53144270A (en) | 1978-12-15 |
JPS6142419B2 JPS6142419B2 (en) | 1986-09-20 |
Family
ID=13091426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5868677A Granted JPS53144270A (en) | 1977-05-23 | 1977-05-23 | Projection-type mask aligner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53144270A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5673437A (en) * | 1979-11-20 | 1981-06-18 | Fujitsu Ltd | Far-ultraviolet light exposing method and device |
JPS58173832A (en) * | 1982-04-05 | 1983-10-12 | Oki Electric Ind Co Ltd | Alignment method for wafer |
JPS58173831A (en) * | 1982-04-05 | 1983-10-12 | Oki Electric Ind Co Ltd | Alignment method for wafer |
JPS5989421A (en) * | 1982-11-15 | 1984-05-23 | Canon Inc | Device for printing of pattern |
JPS62247372A (en) * | 1987-02-06 | 1987-10-28 | Hitachi Ltd | Method for reduced projection exposure |
JPH07183213A (en) * | 1994-09-30 | 1995-07-21 | Hitachi Ltd | Projection exposure method |
EP2150856B1 (en) * | 2007-05-24 | 2012-08-01 | Süss MicroTec Lithography GmbH | Mask aligner |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4960683A (en) * | 1972-10-13 | 1974-06-12 | ||
JPS5050873A (en) * | 1973-07-27 | 1975-05-07 |
-
1977
- 1977-05-23 JP JP5868677A patent/JPS53144270A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4960683A (en) * | 1972-10-13 | 1974-06-12 | ||
JPS5050873A (en) * | 1973-07-27 | 1975-05-07 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5673437A (en) * | 1979-11-20 | 1981-06-18 | Fujitsu Ltd | Far-ultraviolet light exposing method and device |
JPS6231490B2 (en) * | 1979-11-20 | 1987-07-08 | Fujitsu Ltd | |
JPS58173832A (en) * | 1982-04-05 | 1983-10-12 | Oki Electric Ind Co Ltd | Alignment method for wafer |
JPS58173831A (en) * | 1982-04-05 | 1983-10-12 | Oki Electric Ind Co Ltd | Alignment method for wafer |
JPS5989421A (en) * | 1982-11-15 | 1984-05-23 | Canon Inc | Device for printing of pattern |
JPS6362090B2 (en) * | 1982-11-15 | 1988-12-01 | ||
JPS62247372A (en) * | 1987-02-06 | 1987-10-28 | Hitachi Ltd | Method for reduced projection exposure |
JPS6341050B2 (en) * | 1987-02-06 | 1988-08-15 | Hitachi Ltd | |
JPH07183213A (en) * | 1994-09-30 | 1995-07-21 | Hitachi Ltd | Projection exposure method |
EP2150856B1 (en) * | 2007-05-24 | 2012-08-01 | Süss MicroTec Lithography GmbH | Mask aligner |
Also Published As
Publication number | Publication date |
---|---|
JPS6142419B2 (en) | 1986-09-20 |
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