JPS56102823A - Positioning device - Google Patents
Positioning deviceInfo
- Publication number
- JPS56102823A JPS56102823A JP515680A JP515680A JPS56102823A JP S56102823 A JPS56102823 A JP S56102823A JP 515680 A JP515680 A JP 515680A JP 515680 A JP515680 A JP 515680A JP S56102823 A JPS56102823 A JP S56102823A
- Authority
- JP
- Japan
- Prior art keywords
- microscope
- alignment
- mark
- coordinate
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To reduce an alignment error, by providing two positioning devices which are so arranged that they satisfy Abbe conditions for two orthogonal measure axes on the stage of an IC alignment device. CONSTITUTION:X microscope WX and Y microscope WY are arranged on the X axis and the Y axis respectively besides conventional measure parts on stage S2 of the alignment device. Wafer W2 is fixed on stage S2. When Y mark 12 is in the center of Y microscope WY, wafer W2 is so rotated that the theta mark comes to the center of theta microscope WY, and this Y coordinate is denoted as Y1. Next, alignment to theta mark 13 is performed by Y microscope WY, and this Y coordinate is denoted as Y2. The inclination of wafer W2 for the XY coordinate system is obtained from Y1 and Y2. Alignment in the X direction is performed by coinciding X mark 11 with the center of X microscope WX and measuring the X coordinate. As a result, the alignment error is reduced.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP515680A JPS56102823A (en) | 1980-01-19 | 1980-01-19 | Positioning device |
US06/225,049 US4385838A (en) | 1980-01-19 | 1981-01-14 | Alignment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP515680A JPS56102823A (en) | 1980-01-19 | 1980-01-19 | Positioning device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56102823A true JPS56102823A (en) | 1981-08-17 |
JPH0353770B2 JPH0353770B2 (en) | 1991-08-16 |
Family
ID=11603394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP515680A Granted JPS56102823A (en) | 1980-01-19 | 1980-01-19 | Positioning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56102823A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5918950A (en) * | 1982-07-09 | 1984-01-31 | パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト | Apparatus for projection transfer of mask on work piece and adjusting method thereof |
JPS6235640A (en) * | 1985-08-09 | 1987-02-16 | Nec Kyushu Ltd | Pre-alignment mechanism for semiconductor substrate |
JPS62248224A (en) * | 1986-04-21 | 1987-10-29 | Nikon Corp | Projection exposure device |
JPS63296339A (en) * | 1987-05-28 | 1988-12-02 | Nikon Corp | Positioning method |
JPH01161832A (en) * | 1987-12-18 | 1989-06-26 | Nikon Corp | Projection aligner |
JPH01309324A (en) * | 1988-06-07 | 1989-12-13 | Nikon Corp | Aligner |
JPH0774095A (en) * | 1994-06-20 | 1995-03-17 | Nikon Corp | Aligner |
US6265119B1 (en) | 1995-02-17 | 2001-07-24 | Nikon Corporation | Method for producing semiconductor devices |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2538855Y2 (en) * | 1991-08-13 | 1997-06-18 | 矢崎総業株式会社 | Structure of waterproof connector |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS541553A (en) * | 1977-06-07 | 1979-01-08 | Toshiba Corp | Group management control method of elevator |
JPS5493974A (en) * | 1978-01-06 | 1979-07-25 | Hitachi Ltd | Projection-system mask alignment unit |
JPS5541739A (en) * | 1978-09-20 | 1980-03-24 | Hitachi Ltd | Micro-projection type mask alignment device |
-
1980
- 1980-01-19 JP JP515680A patent/JPS56102823A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS541553A (en) * | 1977-06-07 | 1979-01-08 | Toshiba Corp | Group management control method of elevator |
JPS5493974A (en) * | 1978-01-06 | 1979-07-25 | Hitachi Ltd | Projection-system mask alignment unit |
JPS5541739A (en) * | 1978-09-20 | 1980-03-24 | Hitachi Ltd | Micro-projection type mask alignment device |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5918950A (en) * | 1982-07-09 | 1984-01-31 | パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト | Apparatus for projection transfer of mask on work piece and adjusting method thereof |
JPS6235640A (en) * | 1985-08-09 | 1987-02-16 | Nec Kyushu Ltd | Pre-alignment mechanism for semiconductor substrate |
JPH0334215B2 (en) * | 1985-08-09 | 1991-05-21 | Kyushu Nippon Electric | |
JPS62248224A (en) * | 1986-04-21 | 1987-10-29 | Nikon Corp | Projection exposure device |
JPS63296339A (en) * | 1987-05-28 | 1988-12-02 | Nikon Corp | Positioning method |
JPH01161832A (en) * | 1987-12-18 | 1989-06-26 | Nikon Corp | Projection aligner |
JPH01309324A (en) * | 1988-06-07 | 1989-12-13 | Nikon Corp | Aligner |
JPH0774095A (en) * | 1994-06-20 | 1995-03-17 | Nikon Corp | Aligner |
US6265119B1 (en) | 1995-02-17 | 2001-07-24 | Nikon Corporation | Method for producing semiconductor devices |
Also Published As
Publication number | Publication date |
---|---|
JPH0353770B2 (en) | 1991-08-16 |
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