JPS56102823A - Positioning device - Google Patents

Positioning device

Info

Publication number
JPS56102823A
JPS56102823A JP515680A JP515680A JPS56102823A JP S56102823 A JPS56102823 A JP S56102823A JP 515680 A JP515680 A JP 515680A JP 515680 A JP515680 A JP 515680A JP S56102823 A JPS56102823 A JP S56102823A
Authority
JP
Japan
Prior art keywords
microscope
alignment
mark
coordinate
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP515680A
Other languages
Japanese (ja)
Other versions
JPH0353770B2 (en
Inventor
Kiwao Nakazawa
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd, Nippon Kogaku KK filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP515680A priority Critical patent/JPS56102823A/en
Priority to US06/225,049 priority patent/US4385838A/en
Publication of JPS56102823A publication Critical patent/JPS56102823A/en
Publication of JPH0353770B2 publication Critical patent/JPH0353770B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To reduce an alignment error, by providing two positioning devices which are so arranged that they satisfy Abbe conditions for two orthogonal measure axes on the stage of an IC alignment device. CONSTITUTION:X microscope WX and Y microscope WY are arranged on the X axis and the Y axis respectively besides conventional measure parts on stage S2 of the alignment device. Wafer W2 is fixed on stage S2. When Y mark 12 is in the center of Y microscope WY, wafer W2 is so rotated that the theta mark comes to the center of theta microscope WY, and this Y coordinate is denoted as Y1. Next, alignment to theta mark 13 is performed by Y microscope WY, and this Y coordinate is denoted as Y2. The inclination of wafer W2 for the XY coordinate system is obtained from Y1 and Y2. Alignment in the X direction is performed by coinciding X mark 11 with the center of X microscope WX and measuring the X coordinate. As a result, the alignment error is reduced.
JP515680A 1980-01-19 1980-01-19 Positioning device Granted JPS56102823A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP515680A JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device
US06/225,049 US4385838A (en) 1980-01-19 1981-01-14 Alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP515680A JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device

Publications (2)

Publication Number Publication Date
JPS56102823A true JPS56102823A (en) 1981-08-17
JPH0353770B2 JPH0353770B2 (en) 1991-08-16

Family

ID=11603394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP515680A Granted JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device

Country Status (1)

Country Link
JP (1) JPS56102823A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918950A (en) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト Apparatus for projection transfer of mask on work piece and adjusting method thereof
JPS6235640A (en) * 1985-08-09 1987-02-16 Nec Kyushu Ltd Pre-alignment mechanism for semiconductor substrate
JPS62248224A (en) * 1986-04-21 1987-10-29 Nikon Corp Projection exposure device
JPS63296339A (en) * 1987-05-28 1988-12-02 Nikon Corp Positioning method
JPH01161832A (en) * 1987-12-18 1989-06-26 Nikon Corp Projection aligner
JPH01309324A (en) * 1988-06-07 1989-12-13 Nikon Corp Aligner
JPH0774095A (en) * 1994-06-20 1995-03-17 Nikon Corp Aligner
US6265119B1 (en) 1995-02-17 2001-07-24 Nikon Corporation Method for producing semiconductor devices

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2538855Y2 (en) * 1991-08-13 1997-06-18 矢崎総業株式会社 Structure of waterproof connector

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator
JPS5493974A (en) * 1978-01-06 1979-07-25 Hitachi Ltd Projection-system mask alignment unit
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator
JPS5493974A (en) * 1978-01-06 1979-07-25 Hitachi Ltd Projection-system mask alignment unit
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918950A (en) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト Apparatus for projection transfer of mask on work piece and adjusting method thereof
JPS6235640A (en) * 1985-08-09 1987-02-16 Nec Kyushu Ltd Pre-alignment mechanism for semiconductor substrate
JPH0334215B2 (en) * 1985-08-09 1991-05-21 Kyushu Nippon Electric
JPS62248224A (en) * 1986-04-21 1987-10-29 Nikon Corp Projection exposure device
JPS63296339A (en) * 1987-05-28 1988-12-02 Nikon Corp Positioning method
JPH01161832A (en) * 1987-12-18 1989-06-26 Nikon Corp Projection aligner
JPH01309324A (en) * 1988-06-07 1989-12-13 Nikon Corp Aligner
JPH0774095A (en) * 1994-06-20 1995-03-17 Nikon Corp Aligner
US6265119B1 (en) 1995-02-17 2001-07-24 Nikon Corporation Method for producing semiconductor devices

Also Published As

Publication number Publication date
JPH0353770B2 (en) 1991-08-16

Similar Documents

Publication Publication Date Title
BR0201166A (en) Aircraft piloting assistance process and device
JPS56102823A (en) Positioning device
JPS5780724A (en) Positioning device
JPS57167651A (en) Inspecting device for surface of semiconductor wafer
JPS5775889A (en) Method and device for screen printing
JPS6453545A (en) Semiconductor substrate having alignment mark and alignment using said mark
CN220041826U (en) Silicon wafer processing carrier
JPS57206037A (en) Device for positioning of flip chip
JPS5310269A (en) Positioning device for semiconductor devices
JP2764925B2 (en) Method for manufacturing semiconductor device
JPS5463677A (en) Production of mask for integrated circuit
JPS52122084A (en) Inspection system for semiconductor substrates
JPS5413783A (en) Photoelectric transducer
JPS5488776A (en) Alignment method and its alignment unit
KR960001466Y1 (en) Chip magnification rate of exposure device
JPS6484227A (en) Liquid crystal display device and its manufacture
JPS6461284A (en) Method and screen for printing pattern
JPS57207335A (en) Pattern checking system
JPS5376054A (en) Method of position detection
JPS6195521A (en) Mask pattern
JPS5330874A (en) Semiconductor element mounting device
JPH03272151A (en) Correction of position of wire bonding device
JPS62287108A (en) Measuring method for position of electronic parts
JPS62216242A (en) Aligning method of substrate
JPS55163852A (en) Connecting system