JPS57167651A - Inspecting device for surface of semiconductor wafer - Google Patents
Inspecting device for surface of semiconductor waferInfo
- Publication number
- JPS57167651A JPS57167651A JP5346981A JP5346981A JPS57167651A JP S57167651 A JPS57167651 A JP S57167651A JP 5346981 A JP5346981 A JP 5346981A JP 5346981 A JP5346981 A JP 5346981A JP S57167651 A JPS57167651 A JP S57167651A
- Authority
- JP
- Japan
- Prior art keywords
- magnification lens
- inspecting
- semiconductor wafer
- inspecting position
- visual field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Abstract
PURPOSE:To catch an inspecting position automatically in the visual field of a high-magnification lens by positioning the wafer according to the information of the inspecting position and inspecting the surface of the wafer by means of the high-magnification lens according to information detected by means of a low- magnification lens. CONSTITUTION:A base plate 6, on which the semiconductor wafer 1 is placed and which can be moved in the triaxial direction, is brought into the visual field of the low magnification lens system of the expanding section 12 of a pickup device 9a according to the information of the inspecting position previously determined. The pattern of the surface of the semiconductor wafer 1 is converted into electrical signals by a pickup section 13. The electrical signals from the pickup section 13 are displayed to a Braun tube 10 while being transmitted to a calculator 14, and the inspecting position is detected through the recognition of the pattern. The calculator 14 drives the base plate 6 by means of a driving device 18 so that the inspecting position is brought into the visual field of the high-magnification lens by information detected. The expanding section 12 is changed over to the high-magnification lens.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5346981A JPS57167651A (en) | 1981-04-07 | 1981-04-07 | Inspecting device for surface of semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5346981A JPS57167651A (en) | 1981-04-07 | 1981-04-07 | Inspecting device for surface of semiconductor wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57167651A true JPS57167651A (en) | 1982-10-15 |
JPH0324064B2 JPH0324064B2 (en) | 1991-04-02 |
Family
ID=12943709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5346981A Granted JPS57167651A (en) | 1981-04-07 | 1981-04-07 | Inspecting device for surface of semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57167651A (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5919344A (en) * | 1982-07-23 | 1984-01-31 | Hitachi Ltd | 2-field optical device |
JPS59144918A (en) * | 1982-12-08 | 1984-08-20 | テキサス・インスツルメンツ・インコ−ポレイテツド | Method and apparatus for positioning specified pattern |
JPS61241605A (en) * | 1985-04-19 | 1986-10-27 | Yoshiaki Ihara | Image processing device |
JPS6261340A (en) * | 1985-09-11 | 1987-03-18 | Fuji Electric Co Ltd | Detecting device for necessary positioning angle of wafer |
JPS6276732A (en) * | 1985-09-30 | 1987-04-08 | Hitachi Electronics Eng Co Ltd | Foreign material inspecting apparatus |
JPS62166505U (en) * | 1986-04-09 | 1987-10-22 | ||
JPH03108735A (en) * | 1989-09-22 | 1991-05-08 | Hitachi Ltd | Method and apparatus for comparison inspection |
JPH0373451U (en) * | 1984-02-22 | 1991-07-24 | ||
JPH05226460A (en) * | 1992-02-18 | 1993-09-03 | Nec Yamagata Ltd | Semiconductor chip position detecting device by processing image |
EP0647828A2 (en) * | 1993-10-12 | 1995-04-12 | Hughes Aircraft Company | Cofocal optical systems for thickness measurements of patterned wafers |
JP2007258359A (en) * | 2006-03-22 | 2007-10-04 | Sharp Corp | Process for manufacturing semiconductor device and deposition device of semiconductor device |
CN102628670A (en) * | 2011-02-01 | 2012-08-08 | 株式会社其恩斯 | Dimension measuring apparatus, dimension measuring method, and program for dimension measuring apparatus |
WO2020008838A1 (en) * | 2018-07-06 | 2020-01-09 | 東レエンジニアリング株式会社 | Dicing-tip inspection apparatus |
JP2021034403A (en) * | 2019-08-15 | 2021-03-01 | 株式会社ディスコ | Processing device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55125640A (en) * | 1979-03-22 | 1980-09-27 | Nec Corp | Automatic chip selection apparatus |
-
1981
- 1981-04-07 JP JP5346981A patent/JPS57167651A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55125640A (en) * | 1979-03-22 | 1980-09-27 | Nec Corp | Automatic chip selection apparatus |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5919344A (en) * | 1982-07-23 | 1984-01-31 | Hitachi Ltd | 2-field optical device |
JPS59144918A (en) * | 1982-12-08 | 1984-08-20 | テキサス・インスツルメンツ・インコ−ポレイテツド | Method and apparatus for positioning specified pattern |
JPH0537476Y2 (en) * | 1984-02-22 | 1993-09-22 | ||
JPH0373451U (en) * | 1984-02-22 | 1991-07-24 | ||
JPS61241605A (en) * | 1985-04-19 | 1986-10-27 | Yoshiaki Ihara | Image processing device |
JPS6261340A (en) * | 1985-09-11 | 1987-03-18 | Fuji Electric Co Ltd | Detecting device for necessary positioning angle of wafer |
JPS6276732A (en) * | 1985-09-30 | 1987-04-08 | Hitachi Electronics Eng Co Ltd | Foreign material inspecting apparatus |
JPS62166505U (en) * | 1986-04-09 | 1987-10-22 | ||
JPH03108735A (en) * | 1989-09-22 | 1991-05-08 | Hitachi Ltd | Method and apparatus for comparison inspection |
JPH05226460A (en) * | 1992-02-18 | 1993-09-03 | Nec Yamagata Ltd | Semiconductor chip position detecting device by processing image |
EP0647828A2 (en) * | 1993-10-12 | 1995-04-12 | Hughes Aircraft Company | Cofocal optical systems for thickness measurements of patterned wafers |
EP0647828A3 (en) * | 1993-10-12 | 1996-11-13 | Hughes Aircraft Co | Cofocal optical systems for thickness measurements of patterned wafers. |
JP2007258359A (en) * | 2006-03-22 | 2007-10-04 | Sharp Corp | Process for manufacturing semiconductor device and deposition device of semiconductor device |
CN102628670A (en) * | 2011-02-01 | 2012-08-08 | 株式会社其恩斯 | Dimension measuring apparatus, dimension measuring method, and program for dimension measuring apparatus |
JP2012159409A (en) * | 2011-02-01 | 2012-08-23 | Keyence Corp | Dimension measuring device, dimension measuring method, and program for dimension measuring device |
CN102628670B (en) * | 2011-02-01 | 2017-08-04 | 株式会社其恩斯 | Dimension measuring apparatus and dimension measurement method |
WO2020008838A1 (en) * | 2018-07-06 | 2020-01-09 | 東レエンジニアリング株式会社 | Dicing-tip inspection apparatus |
JP2020008383A (en) * | 2018-07-06 | 2020-01-16 | 東レエンジニアリング株式会社 | Dicing chip inspection device |
JP2021034403A (en) * | 2019-08-15 | 2021-03-01 | 株式会社ディスコ | Processing device |
Also Published As
Publication number | Publication date |
---|---|
JPH0324064B2 (en) | 1991-04-02 |
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