JPH05226460A - Semiconductor chip position detecting device by processing image - Google Patents
Semiconductor chip position detecting device by processing imageInfo
- Publication number
- JPH05226460A JPH05226460A JP2982492A JP2982492A JPH05226460A JP H05226460 A JPH05226460 A JP H05226460A JP 2982492 A JP2982492 A JP 2982492A JP 2982492 A JP2982492 A JP 2982492A JP H05226460 A JPH05226460 A JP H05226460A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor chip
- detected
- camera
- magnification
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は画像処理による半導体チ
ップ位置検出方法に関し、特に被検出物半導体チップを
TVカメラを用いたCRT画面上の画像を認識に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor chip position detecting method by image processing, and more particularly to recognizing an image on a CRT screen using a TV camera for an object semiconductor chip.
【0002】[0002]
【従来の技術】半導体装置の多くの製造工程で、ステー
ジに搭載された半導体チップの位置を正確に検出するこ
とが重要である。従来の被検出半導体チップ位置検出方
法は、必要とされる検出位置精度の固定倍率のレンズを
取付けたTVカメラを用いて、例えば半導体チップを撮
像し、図3に示す様にCRT画面2に写し出された半導
体チップ1の画像の中心点0の座標をCRT画面の中心
点の座標基準点3に対する位置として認識するために、
座標ズレ量X,Yを画像処理によって検出する。2. Description of the Related Art In many manufacturing processes of semiconductor devices, it is important to accurately detect the position of a semiconductor chip mounted on a stage. In the conventional method of detecting the position of a semiconductor chip to be detected, for example, a semiconductor camera is imaged using a TV camera equipped with a lens having a fixed magnification of the required detection position accuracy, and the image is displayed on a CRT screen 2 as shown in FIG. In order to recognize the coordinates of the center point 0 of the image of the semiconductor chip 1 formed as the position of the center point of the CRT screen with respect to the coordinate reference point 3,
The coordinate shift amounts X and Y are detected by image processing.
【0003】この場合にTVカメラのレンズ倍率が高倍
率になるほどCRT画像2に映る撮像範囲は狭くなる
が、検出精度は高くなる。また、レンズ倍率が低倍率に
なるほど撮像範囲は広くなるが、検出精度は低くなる。In this case, the higher the lens magnification of the TV camera, the narrower the imaging range shown in the CRT image 2, but the higher the detection accuracy. Further, the lower the lens magnification, the wider the imaging range, but the lower the detection accuracy.
【0004】[0004]
【発明が解決しようとする課題】この従来の画像処理に
よる半導体チップの位置検出方法では、検出精度を上げ
るために被検出半導体チップの全体の画像が、CRT画
面内に大きく写し出されている必要がある。In this conventional method for detecting the position of a semiconductor chip by image processing, it is necessary that the entire image of the semiconductor chip to be detected is largely projected on the CRT screen in order to improve the detection accuracy. is there.
【0005】この為、被検出半導体チップとTVカメラ
の位置のズレ量が拡大されてレンズの撮像範囲外になり
易く、その場合は被検出半導体チップを容易に認識でき
ず、検出時間が長いという問題があった。For this reason, the amount of deviation between the position of the semiconductor chip to be detected and the TV camera is enlarged, and the lens is likely to be out of the imaging range of the lens. In that case, the semiconductor chip to be detected cannot be easily recognized and the detection time is long. There was a problem.
【0006】[0006]
【課題を解決するための手段】本発明の画像処理による
半導体チップ位置検出方法は、ズームレンズを取付け撮
像用TVカメラを用いて、まず前記ズームレンズのレン
ズ倍率を低倍率にして被検出半導体チップを含む広範囲
を撮像して前記被検出半導体チップの位置を粗く検出
し、次にその検出した前記チップの中心附近の位置に前
記撮像用TVカメラの焦点を移動した後、前記レンズ倍
率を高倍率に切換えて再度被検出半導体チップを撮像し
て構成されている。According to a semiconductor chip position detecting method by image processing of the present invention, a zoom lens is attached and a TV camera for image pickup is used. First, the lens magnification of the zoom lens is reduced to a low semiconductor chip to be detected. Is detected to roughly detect the position of the semiconductor chip to be detected, and then the focus of the TV camera for imaging is moved to a position near the center of the detected chip. It is configured by imaging the semiconductor chip to be detected again after switching to.
【0007】[0007]
【実施例】次に本発明について図面を参照して説明す
る。図1(a)〜(c)は本発明の第1の実施例を説明
するための検出工程順のCRT画面図である。The present invention will be described below with reference to the drawings. FIGS. 1A to 1C are CRT screen diagrams in the order of detection steps for explaining the first embodiment of the present invention.
【0008】まず、図1(a)に示す様に、レンズ倍率
を低倍率に設定してチップ中心点0を有する被検出半導
体チップ1を撮像し、CRT画面2内の座標基準点3に
対する中心点0のズレ量X1,Y1を従来と同じように
検出する。First, as shown in FIG. 1 (a), the lens magnification is set to a low magnification, the semiconductor chip 1 to be detected having a chip center point 0 is imaged, and the center with respect to the coordinate reference point 3 in the CRT screen 2 is imaged. The shift amounts X1 and Y1 at point 0 are detected in the same manner as in the conventional case.
【0009】次に、図1(b)に示す様に、中心点0の
ズレ量X1,Y1をもとに、基準点3に被検出半導体チ
ップ1の中心0がほぼ位置する様にカメラを移動して粗
位置決めする。Next, as shown in FIG. 1B, the camera is set so that the center 0 of the semiconductor chip 1 to be detected is substantially located at the reference point 3 based on the deviations X1 and Y1 of the center point 0. Move and perform coarse positioning.
【0010】次に、図1(c)に示す様に、レンズ倍率
を高倍率に設定し、被検出半導体チップ1を再度アップ
で撮像し、基準点3に対する中心点0のズレ量X2,Y
2を高精密で検出する。Next, as shown in FIG. 1C, the lens magnification is set to a high magnification, the semiconductor chip 1 to be detected is imaged up again, and the deviation amount X2, Y of the central point 0 from the reference point 3 is taken.
2 is detected with high precision.
【0011】図2(a)〜(c)は本発明の第2の実施
例を説明するための検出工程順のCRT画面図である。
図2(a)に示す様に、被検出半導体IC1aのAパタ
ーン4とBパターン5は相対座標位置XP,YPと固定
されているものとする。FIGS. 2A to 2C are CRT screen diagrams in the order of detection steps for explaining the second embodiment of the present invention.
As shown in FIG. 2A, it is assumed that the A pattern 4 and the B pattern 5 of the detected semiconductor IC 1a are fixed at the relative coordinate positions XP and YP.
【0012】まず、前述と同様に倍率を低倍率に設定
し、被検出ICチップ1aをTVカメラで撮像し、Aパ
ターン4の基準点3に対するパターン中心点0のズレ量
X1,Y1を検出する。First, similarly to the above, the magnification is set to a low magnification, the detected IC chip 1a is imaged by the TV camera, and the deviation amounts X1 and Y1 of the pattern center point 0 with respect to the reference point 3 of the A pattern 4 are detected. ..
【0013】次に図2(b)に示す様に、前工程で検出
したズレ量X1,Y1及びAパターン4とBパターン5
の相対位置XP,YPをもとに、Bパターン5の位置
(X1+XP),(Y1+YP)を計算して、基準点3
にBパターン5が位置する様にカメラを移動し、粗位置
決めする。Next, as shown in FIG. 2B, the deviation amounts X1, Y1 detected in the previous step and the A pattern 4 and the B pattern 5 are detected.
The positions (X1 + XP) and (Y1 + YP) of the B pattern 5 are calculated based on the relative positions XP and YP of the reference point 3
The camera is moved so that the B pattern 5 is positioned at the position, and coarse positioning is performed.
【0014】次に図2(c)に示す様に、レンズ倍率を
高倍率に設定し、再度被検出ICチップ1aを撮像し、
Bパターン5の基準点3からのズレ量X2,Y2を高精
度に検出する。Next, as shown in FIG. 2C, the lens magnification is set to a high magnification and the IC chip 1a to be detected is imaged again,
The deviation amounts X2 and Y2 of the B pattern 5 from the reference point 3 are detected with high accuracy.
【0015】[0015]
【発明の効果】以上説明したように本発明は、TVカメ
ラにズームレンズを取付けレンズ倍率を低倍率にて被検
出半導体チップを撮像して位置検出を行った後、その検
出した位置にTVカメラを移動してレンズ倍率を高倍率
に切換え、再度被検出半導体撮像し位置検出を行うこと
により、被検出半導体チップの位置検出を広範囲かつ高
精度に行うことができるという効果を有する。As described above, according to the present invention, the zoom lens is attached to the TV camera, the semiconductor chip to be detected is imaged at a low lens magnification to detect the position, and then the TV camera is located at the detected position. Is moved to switch the lens magnification to a high magnification, and the position of the semiconductor chip to be detected can be detected with a wide range and with high accuracy by detecting the image of the semiconductor to be detected and detecting the position again.
【図1】(a)〜(c)は本発明の第1の実施例を説明
するための検出工程順のCRT画面図である。FIG. 1A to FIG. 1C are CRT screen diagrams in the order of detection steps for explaining a first embodiment of the present invention.
【図2】(a)〜(c)は本発明の第2の実施例を説明
するための検出工程順のCRT画面図である。2A to 2C are CRT screen diagrams in the order of detection steps for explaining a second embodiment of the present invention.
【図3】従来位置検出方法を示す図の画像処理による半
導体チップ位置検出方法の一例を説明するためのCRT
画面図である。FIG. 3 is a CRT for explaining an example of a semiconductor chip position detecting method by image processing of a conventional position detecting method.
It is a screen figure.
1,1a 被検出半導体チップ 2 CRT画面 3 座標基準点 4 Aパターン 5 Bパターン 6 CRT座標線 1, 1a Detected semiconductor chip 2 CRT screen 3 Coordinate reference point 4 A pattern 5 B pattern 6 CRT coordinate line
Claims (1)
を用いて、まず前記ズームレンズのレンズ倍率を低倍率
にして被検出半導体チップを含む広範囲を撮像して前記
被検出半導体チップの位置を粗く検出し、次にその検出
した前記チップの中心附近の位置に前記撮像用TVカメ
ラの焦点を移動した後、前記レンズ倍率を高倍率に切換
えて再度被検出半導体チップを撮像することを特徴とす
る画像処理によ半導体チップ位置検出方法。1. A zoom lens is attached to a TV camera for image pickup, and the lens magnification of the zoom lens is first set to a low magnification to image a wide area including a semiconductor chip to be detected to roughly detect the position of the semiconductor chip to be detected. Then, after moving the focal point of the imaging TV camera to a position near the center of the detected chip, the lens magnification is switched to a high magnification and the semiconductor chip to be detected is imaged again. Semiconductor chip position detection method by processing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2982492A JPH05226460A (en) | 1992-02-18 | 1992-02-18 | Semiconductor chip position detecting device by processing image |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2982492A JPH05226460A (en) | 1992-02-18 | 1992-02-18 | Semiconductor chip position detecting device by processing image |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05226460A true JPH05226460A (en) | 1993-09-03 |
Family
ID=12286776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2982492A Pending JPH05226460A (en) | 1992-02-18 | 1992-02-18 | Semiconductor chip position detecting device by processing image |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05226460A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005045658A1 (en) * | 2003-11-11 | 2005-05-19 | Xiroku, Inc. | Position-detecting device and method |
KR20180119376A (en) * | 2017-04-25 | 2018-11-02 | 주식회사 원익아이피에스 | Processing gap managing method and substrate processing apparatus performing the same |
CN111791589A (en) * | 2020-09-10 | 2020-10-20 | 季华实验室 | Positioning detection method and device based on ink-jet printer, electronic equipment and medium |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57167651A (en) * | 1981-04-07 | 1982-10-15 | Mitsubishi Electric Corp | Inspecting device for surface of semiconductor wafer |
JPS6262538A (en) * | 1985-09-13 | 1987-03-19 | Toshiba Corp | Positioning apparatus |
JPS6336543A (en) * | 1986-07-31 | 1988-02-17 | Nec Corp | Method and apparatus for automatic inspection of semiconductor device |
JPS6318839B2 (en) * | 1977-03-09 | 1988-04-20 | Ririwaito Sa | |
JPH02290040A (en) * | 1989-04-28 | 1990-11-29 | Disco Abrasive Syst Ltd | Alignment system |
-
1992
- 1992-02-18 JP JP2982492A patent/JPH05226460A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6318839B2 (en) * | 1977-03-09 | 1988-04-20 | Ririwaito Sa | |
JPS57167651A (en) * | 1981-04-07 | 1982-10-15 | Mitsubishi Electric Corp | Inspecting device for surface of semiconductor wafer |
JPS6262538A (en) * | 1985-09-13 | 1987-03-19 | Toshiba Corp | Positioning apparatus |
JPS6336543A (en) * | 1986-07-31 | 1988-02-17 | Nec Corp | Method and apparatus for automatic inspection of semiconductor device |
JPH02290040A (en) * | 1989-04-28 | 1990-11-29 | Disco Abrasive Syst Ltd | Alignment system |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005045658A1 (en) * | 2003-11-11 | 2005-05-19 | Xiroku, Inc. | Position-detecting device and method |
JP2005148773A (en) * | 2003-11-11 | 2005-06-09 | Xiroku:Kk | Position-detecting device and method |
KR20180119376A (en) * | 2017-04-25 | 2018-11-02 | 주식회사 원익아이피에스 | Processing gap managing method and substrate processing apparatus performing the same |
CN111791589A (en) * | 2020-09-10 | 2020-10-20 | 季华实验室 | Positioning detection method and device based on ink-jet printer, electronic equipment and medium |
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Legal Events
Date | Code | Title | Description |
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A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19980728 |