JPS54148376A - Work position detector device - Google Patents

Work position detector device

Info

Publication number
JPS54148376A
JPS54148376A JP5622078A JP5622078A JPS54148376A JP S54148376 A JPS54148376 A JP S54148376A JP 5622078 A JP5622078 A JP 5622078A JP 5622078 A JP5622078 A JP 5622078A JP S54148376 A JPS54148376 A JP S54148376A
Authority
JP
Japan
Prior art keywords
douser
wafer
detector
parallel
reflectors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5622078A
Other languages
Japanese (ja)
Inventor
Yoshiaki Arimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5622078A priority Critical patent/JPS54148376A/en
Publication of JPS54148376A publication Critical patent/JPS54148376A/en
Pending legal-status Critical Current

Links

Landscapes

  • Wire Bonding (AREA)

Abstract

PURPOSE: To enhance the working efficiency by providing the object lens, douser and detector in that order right above the work stage and then installing a pair of prism areas or reflectors across the position of the douser to secure a viewfield for the detector in parallel to the diagonal corner part of the work.
CONSTITUTION: Object lens 3, douser 4 and detector 5 are provided on stage 1 of wafer 2, and a pair of reflector 6 and 7 are installed in parallel to optical axis O and across douser 4. The reflected light from wafer 2 is magnified through lens 3 to form an image on surface 5a and 5b via the reflectors. In this case, the center part of the wafer is shielded 4 from the light to obtain a magnified pattern whose corners 2a and 2b are put in parallel to each other on the diagonal line. As a result, the visual error is reduced to enhance the working efficiency.
COPYRIGHT: (C)1979,JPO&Japio
JP5622078A 1978-05-12 1978-05-12 Work position detector device Pending JPS54148376A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5622078A JPS54148376A (en) 1978-05-12 1978-05-12 Work position detector device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5622078A JPS54148376A (en) 1978-05-12 1978-05-12 Work position detector device

Publications (1)

Publication Number Publication Date
JPS54148376A true JPS54148376A (en) 1979-11-20

Family

ID=13021012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5622078A Pending JPS54148376A (en) 1978-05-12 1978-05-12 Work position detector device

Country Status (1)

Country Link
JP (1) JPS54148376A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6113930U (en) * 1984-06-29 1986-01-27 日本電気株式会社 Semiconductor device recognition device for bonding equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6113930U (en) * 1984-06-29 1986-01-27 日本電気株式会社 Semiconductor device recognition device for bonding equipment

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