JPS5469075A - Electron beam drawing device - Google Patents

Electron beam drawing device

Info

Publication number
JPS5469075A
JPS5469075A JP13572577A JP13572577A JPS5469075A JP S5469075 A JPS5469075 A JP S5469075A JP 13572577 A JP13572577 A JP 13572577A JP 13572577 A JP13572577 A JP 13572577A JP S5469075 A JPS5469075 A JP S5469075A
Authority
JP
Japan
Prior art keywords
aperture
image
electron beam
lens
selecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13572577A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6133254B2 (enrdf_load_stackoverflow
Inventor
Katsuhiro Kuroda
Tadasuke Munakata
Akira Yanagisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13572577A priority Critical patent/JPS5469075A/ja
Publication of JPS5469075A publication Critical patent/JPS5469075A/ja
Publication of JPS6133254B2 publication Critical patent/JPS6133254B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP13572577A 1977-11-14 1977-11-14 Electron beam drawing device Granted JPS5469075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13572577A JPS5469075A (en) 1977-11-14 1977-11-14 Electron beam drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13572577A JPS5469075A (en) 1977-11-14 1977-11-14 Electron beam drawing device

Publications (2)

Publication Number Publication Date
JPS5469075A true JPS5469075A (en) 1979-06-02
JPS6133254B2 JPS6133254B2 (enrdf_load_stackoverflow) 1986-08-01

Family

ID=15158413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13572577A Granted JPS5469075A (en) 1977-11-14 1977-11-14 Electron beam drawing device

Country Status (1)

Country Link
JP (1) JPS5469075A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712521A (en) * 1980-06-26 1982-01-22 Nippon Telegr & Teleph Corp <Ntt> Drawing device of figure by electron beam
JPS5731133A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Drawing device by electron beam
JPS583228A (ja) * 1981-06-30 1983-01-10 Toshiba Corp 荷電ビ−ム光学鏡筒
JPS61124129A (ja) * 1984-11-21 1986-06-11 Hitachi Ltd 電子線露光装置の電子線絞りの位置調整方法
JPS62286274A (ja) * 1986-06-05 1987-12-12 Toshiba Mach Co Ltd 電子ビ−ム露光装置
JPH03119717A (ja) * 1989-09-30 1991-05-22 Fujitsu Ltd 荷電粒子露光装置および露光方法
JP2006128564A (ja) * 2004-11-01 2006-05-18 Toshiba Corp 荷電ビーム露光装置および荷電ビーム制御方法
JP2018190731A (ja) * 2017-05-11 2018-11-29 カール ツァイス マイクロスコーピー ゲーエムベーハーCarl Zeiss Microscopy GmbH 粒子ビームを生成するための粒子源及び粒子光学装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712521A (en) * 1980-06-26 1982-01-22 Nippon Telegr & Teleph Corp <Ntt> Drawing device of figure by electron beam
JPS5731133A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Drawing device by electron beam
JPS583228A (ja) * 1981-06-30 1983-01-10 Toshiba Corp 荷電ビ−ム光学鏡筒
JPS61124129A (ja) * 1984-11-21 1986-06-11 Hitachi Ltd 電子線露光装置の電子線絞りの位置調整方法
JPS62286274A (ja) * 1986-06-05 1987-12-12 Toshiba Mach Co Ltd 電子ビ−ム露光装置
JPH03119717A (ja) * 1989-09-30 1991-05-22 Fujitsu Ltd 荷電粒子露光装置および露光方法
JP2006128564A (ja) * 2004-11-01 2006-05-18 Toshiba Corp 荷電ビーム露光装置および荷電ビーム制御方法
JP2018190731A (ja) * 2017-05-11 2018-11-29 カール ツァイス マイクロスコーピー ゲーエムベーハーCarl Zeiss Microscopy GmbH 粒子ビームを生成するための粒子源及び粒子光学装置

Also Published As

Publication number Publication date
JPS6133254B2 (enrdf_load_stackoverflow) 1986-08-01

Similar Documents

Publication Publication Date Title
JPS5469075A (en) Electron beam drawing device
JPS52143776A (en) Electron beam exposure apparatus
JPS55103729A (en) Electron beam ringraphic device
JPS5576560A (en) Observation field moving device for electron microscope
JPS5322357A (en) Beam blanking unit
JPS5437685A (en) Electron beam exposure unit
JPS52130570A (en) Electron beam exposing device
JPS5587433A (en) Electron beam exposure device
JPS5694740A (en) Electronic beam exposure device
JPS53120277A (en) Electron beam exposure device
JPS5454581A (en) Electron beam exposure apparatus
JPS5360162A (en) Electron beam irradiation device
JPS5353975A (en) Electronic beam exposure device
JPS53145477A (en) Electron beam exposure method
JPS5346266A (en) Electronic microscope
JPS5413735A (en) Projection type picture tube
JPS545666A (en) Electron beam exposure device
JPS54148381A (en) Electron beam exposure method
JPS5762531A (en) Exposing device by electron beam
JPS5484484A (en) Device and method for electron beam exposure
JPS5279662A (en) Electron beam exposure device
JPS53128975A (en) Automatic focus control device for scanning type electron beam device and others
JPS55113242A (en) Electron gun for picture tube
GB2020849A (en) Transmission Electron Lithography Method
JPS5483772A (en) Electron-beam exposure unit