JPS5469075A - Electron beam drawing device - Google Patents
Electron beam drawing deviceInfo
- Publication number
- JPS5469075A JPS5469075A JP13572577A JP13572577A JPS5469075A JP S5469075 A JPS5469075 A JP S5469075A JP 13572577 A JP13572577 A JP 13572577A JP 13572577 A JP13572577 A JP 13572577A JP S5469075 A JPS5469075 A JP S5469075A
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- image
- electron beam
- lens
- selecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 4
- 230000015572 biosynthetic process Effects 0.000 abstract 3
- 230000003287 optical effect Effects 0.000 abstract 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13572577A JPS5469075A (en) | 1977-11-14 | 1977-11-14 | Electron beam drawing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13572577A JPS5469075A (en) | 1977-11-14 | 1977-11-14 | Electron beam drawing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5469075A true JPS5469075A (en) | 1979-06-02 |
JPS6133254B2 JPS6133254B2 (enrdf_load_stackoverflow) | 1986-08-01 |
Family
ID=15158413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13572577A Granted JPS5469075A (en) | 1977-11-14 | 1977-11-14 | Electron beam drawing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5469075A (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5712521A (en) * | 1980-06-26 | 1982-01-22 | Nippon Telegr & Teleph Corp <Ntt> | Drawing device of figure by electron beam |
JPS5731133A (en) * | 1980-08-01 | 1982-02-19 | Hitachi Ltd | Drawing device by electron beam |
JPS583228A (ja) * | 1981-06-30 | 1983-01-10 | Toshiba Corp | 荷電ビ−ム光学鏡筒 |
JPS61124129A (ja) * | 1984-11-21 | 1986-06-11 | Hitachi Ltd | 電子線露光装置の電子線絞りの位置調整方法 |
JPS62286274A (ja) * | 1986-06-05 | 1987-12-12 | Toshiba Mach Co Ltd | 電子ビ−ム露光装置 |
JPH03119717A (ja) * | 1989-09-30 | 1991-05-22 | Fujitsu Ltd | 荷電粒子露光装置および露光方法 |
JP2006128564A (ja) * | 2004-11-01 | 2006-05-18 | Toshiba Corp | 荷電ビーム露光装置および荷電ビーム制御方法 |
JP2018190731A (ja) * | 2017-05-11 | 2018-11-29 | カール ツァイス マイクロスコーピー ゲーエムベーハーCarl Zeiss Microscopy GmbH | 粒子ビームを生成するための粒子源及び粒子光学装置 |
-
1977
- 1977-11-14 JP JP13572577A patent/JPS5469075A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5712521A (en) * | 1980-06-26 | 1982-01-22 | Nippon Telegr & Teleph Corp <Ntt> | Drawing device of figure by electron beam |
JPS5731133A (en) * | 1980-08-01 | 1982-02-19 | Hitachi Ltd | Drawing device by electron beam |
JPS583228A (ja) * | 1981-06-30 | 1983-01-10 | Toshiba Corp | 荷電ビ−ム光学鏡筒 |
JPS61124129A (ja) * | 1984-11-21 | 1986-06-11 | Hitachi Ltd | 電子線露光装置の電子線絞りの位置調整方法 |
JPS62286274A (ja) * | 1986-06-05 | 1987-12-12 | Toshiba Mach Co Ltd | 電子ビ−ム露光装置 |
JPH03119717A (ja) * | 1989-09-30 | 1991-05-22 | Fujitsu Ltd | 荷電粒子露光装置および露光方法 |
JP2006128564A (ja) * | 2004-11-01 | 2006-05-18 | Toshiba Corp | 荷電ビーム露光装置および荷電ビーム制御方法 |
JP2018190731A (ja) * | 2017-05-11 | 2018-11-29 | カール ツァイス マイクロスコーピー ゲーエムベーハーCarl Zeiss Microscopy GmbH | 粒子ビームを生成するための粒子源及び粒子光学装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6133254B2 (enrdf_load_stackoverflow) | 1986-08-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5469075A (en) | Electron beam drawing device | |
JPS52143776A (en) | Electron beam exposure apparatus | |
JPS55103729A (en) | Electron beam ringraphic device | |
JPS5576560A (en) | Observation field moving device for electron microscope | |
JPS5322357A (en) | Beam blanking unit | |
JPS5437685A (en) | Electron beam exposure unit | |
JPS52130570A (en) | Electron beam exposing device | |
JPS5587433A (en) | Electron beam exposure device | |
JPS5694740A (en) | Electronic beam exposure device | |
JPS53120277A (en) | Electron beam exposure device | |
JPS5454581A (en) | Electron beam exposure apparatus | |
JPS5360162A (en) | Electron beam irradiation device | |
JPS5353975A (en) | Electronic beam exposure device | |
JPS53145477A (en) | Electron beam exposure method | |
JPS5346266A (en) | Electronic microscope | |
JPS5413735A (en) | Projection type picture tube | |
JPS545666A (en) | Electron beam exposure device | |
JPS54148381A (en) | Electron beam exposure method | |
JPS5762531A (en) | Exposing device by electron beam | |
JPS5484484A (en) | Device and method for electron beam exposure | |
JPS5279662A (en) | Electron beam exposure device | |
JPS53128975A (en) | Automatic focus control device for scanning type electron beam device and others | |
JPS55113242A (en) | Electron gun for picture tube | |
GB2020849A (en) | Transmission Electron Lithography Method | |
JPS5483772A (en) | Electron-beam exposure unit |