JPH11265947A5 - - Google Patents

Info

Publication number
JPH11265947A5
JPH11265947A5 JP1998066898A JP6689898A JPH11265947A5 JP H11265947 A5 JPH11265947 A5 JP H11265947A5 JP 1998066898 A JP1998066898 A JP 1998066898A JP 6689898 A JP6689898 A JP 6689898A JP H11265947 A5 JPH11265947 A5 JP H11265947A5
Authority
JP
Japan
Prior art keywords
ion implantation
implantation step
semiconductor device
manufacturing
diffusion region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998066898A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11265947A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10066898A priority Critical patent/JPH11265947A/ja
Priority claimed from JP10066898A external-priority patent/JPH11265947A/ja
Priority to US09/160,046 priority patent/US6507068B2/en
Publication of JPH11265947A publication Critical patent/JPH11265947A/ja
Publication of JPH11265947A5 publication Critical patent/JPH11265947A5/ja
Pending legal-status Critical Current

Links

JP10066898A 1998-03-17 1998-03-17 半導体装置およびその製造方法 Pending JPH11265947A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10066898A JPH11265947A (ja) 1998-03-17 1998-03-17 半導体装置およびその製造方法
US09/160,046 US6507068B2 (en) 1998-03-17 1998-09-25 Flash memory device and a fabrication process thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10066898A JPH11265947A (ja) 1998-03-17 1998-03-17 半導体装置およびその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005096274A Division JP2005229128A (ja) 2005-03-29 2005-03-29 半導体装置

Publications (2)

Publication Number Publication Date
JPH11265947A JPH11265947A (ja) 1999-09-28
JPH11265947A5 true JPH11265947A5 (enExample) 2005-09-08

Family

ID=13329222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10066898A Pending JPH11265947A (ja) 1998-03-17 1998-03-17 半導体装置およびその製造方法

Country Status (2)

Country Link
US (1) US6507068B2 (enExample)
JP (1) JPH11265947A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004152878A (ja) 2002-10-29 2004-05-27 Toshiba Corp 半導体記憶装置及びその製造方法
ES2383199T3 (es) * 2005-04-01 2012-06-19 Askoll Holding S.R.L. Lavadora mejorada y electrodomésticos similares con tambor giratorio
KR101063690B1 (ko) * 2008-11-21 2011-09-14 주식회사 동부하이텍 반도체 소자 및 그 제조 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5836508B2 (ja) * 1980-12-25 1983-08-09 富士通株式会社 半導体装置の製造方法
US5270240A (en) * 1991-07-10 1993-12-14 Micron Semiconductor, Inc. Four poly EPROM process and structure comprising a conductive source line structure and self-aligned polycrystalline silicon digit lines
US5482881A (en) * 1995-03-14 1996-01-09 Advanced Micro Devices, Inc. Method of making flash EEPROM memory with reduced column leakage current
JPH0982924A (ja) * 1995-09-14 1997-03-28 Toshiba Corp 半導体記憶装置の製造方法

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