JPH1070250A5 - - Google Patents

Info

Publication number
JPH1070250A5
JPH1070250A5 JP1996223939A JP22393996A JPH1070250A5 JP H1070250 A5 JPH1070250 A5 JP H1070250A5 JP 1996223939 A JP1996223939 A JP 1996223939A JP 22393996 A JP22393996 A JP 22393996A JP H1070250 A5 JPH1070250 A5 JP H1070250A5
Authority
JP
Japan
Prior art keywords
impurity concentration
impurity
semiconductor device
conductivity type
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996223939A
Other languages
English (en)
Japanese (ja)
Other versions
JP3958388B2 (ja
JPH1070250A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP22393996A external-priority patent/JP3958388B2/ja
Priority to JP22393996A priority Critical patent/JP3958388B2/ja
Priority to TW086110966A priority patent/TW356597B/zh
Priority to DE19734512A priority patent/DE19734512A1/de
Priority to KR1019970039793A priority patent/KR19980018840A/ko
Priority to CNB971186790A priority patent/CN1153295C/zh
Priority to CNB2003101163756A priority patent/CN1306615C/zh
Priority to US08/917,528 priority patent/US6420763B1/en
Publication of JPH1070250A publication Critical patent/JPH1070250A/ja
Publication of JPH1070250A5 publication Critical patent/JPH1070250A5/ja
Publication of JP3958388B2 publication Critical patent/JP3958388B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP22393996A 1996-08-26 1996-08-26 半導体装置 Expired - Fee Related JP3958388B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP22393996A JP3958388B2 (ja) 1996-08-26 1996-08-26 半導体装置
TW086110966A TW356597B (en) 1996-08-26 1997-07-31 Semiconductor device and its method of fabrication the same
DE19734512A DE19734512A1 (de) 1996-08-26 1997-08-08 Halbleitereinrichtung mit entarteter Wannenstruktur und Verfahren zum Herstellen derselben
KR1019970039793A KR19980018840A (ko) 1996-08-26 1997-08-21 반도체 장치 및 그 제조 방법 (Semiconductor Device and Method of Manufacturing Thereof)
CNB971186790A CN1153295C (zh) 1996-08-26 1997-08-22 半导体器件及其制造方法
CNB2003101163756A CN1306615C (zh) 1996-08-26 1997-08-22 半导体器件及其制造方法
US08/917,528 US6420763B1 (en) 1996-08-26 1997-08-26 Semiconductor device having a retrograde well structure and method of manufacturing thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22393996A JP3958388B2 (ja) 1996-08-26 1996-08-26 半導体装置

Publications (3)

Publication Number Publication Date
JPH1070250A JPH1070250A (ja) 1998-03-10
JPH1070250A5 true JPH1070250A5 (enExample) 2004-08-12
JP3958388B2 JP3958388B2 (ja) 2007-08-15

Family

ID=16806078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22393996A Expired - Fee Related JP3958388B2 (ja) 1996-08-26 1996-08-26 半導体装置

Country Status (6)

Country Link
US (1) US6420763B1 (enExample)
JP (1) JP3958388B2 (enExample)
KR (1) KR19980018840A (enExample)
CN (2) CN1153295C (enExample)
DE (1) DE19734512A1 (enExample)
TW (1) TW356597B (enExample)

Families Citing this family (14)

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Publication number Priority date Publication date Assignee Title
US6423615B1 (en) * 1999-09-22 2002-07-23 Intel Corporation Silicon wafers for CMOS and other integrated circuits
US6440805B1 (en) * 2000-02-29 2002-08-27 Mototrola, Inc. Method of forming a semiconductor device with isolation and well regions
US7145191B1 (en) * 2000-03-31 2006-12-05 National Semiconductor Corporation P-channel field-effect transistor with reduced junction capacitance
JP2003078032A (ja) 2001-09-05 2003-03-14 Mitsubishi Electric Corp 半導体装置およびその製造方法
JP2003158204A (ja) * 2001-11-22 2003-05-30 Mitsubishi Electric Corp 半導体記憶装置およびその製造方法
JP4232477B2 (ja) * 2003-02-13 2009-03-04 パナソニック株式会社 半導体集積回路の検証方法
WO2005038901A1 (en) * 2003-10-22 2005-04-28 Spinnaker Semiconductor, Inc. Dynamic schottky barrier mosfet device and method of manufacture
JP2005142321A (ja) 2003-11-06 2005-06-02 Nec Electronics Corp 半導体集積回路装置およびその製造方法
EP1784869A1 (en) * 2004-07-15 2007-05-16 Spinnaker Semiconductor, Inc. Metal source power transistor and method of manufacture
US20060049464A1 (en) * 2004-09-03 2006-03-09 Rao G R Mohan Semiconductor devices with graded dopant regions
JP2006344735A (ja) * 2005-06-08 2006-12-21 Seiko Epson Corp 半導体装置
CN101326640A (zh) * 2005-10-12 2008-12-17 斯平内克半导体股份有限公司 软差错率为零的cmos器件
DE102006023876A1 (de) * 2006-05-19 2007-11-22 Carl Zeiss Smt Ag Optische Abbildungseinrichtung
US7872903B2 (en) * 2009-03-19 2011-01-18 Altera Corporation Volatile memory elements with soft error upset immunity

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4442591A (en) * 1982-02-01 1984-04-17 Texas Instruments Incorporated High-voltage CMOS process
US4470191A (en) * 1982-12-09 1984-09-11 International Business Machines Corporation Process for making complementary transistors by sequential implantations using oxidation barrier masking layer
US4710477A (en) 1983-09-12 1987-12-01 Hughes Aircraft Company Method for forming latch-up immune, multiple retrograde well high density CMOS FET
US4633289A (en) 1983-09-12 1986-12-30 Hughes Aircraft Company Latch-up immune, multiple retrograde well high density CMOS FET
DE3340560A1 (de) * 1983-11-09 1985-05-15 Siemens AG, 1000 Berlin und 8000 München Verfahren zum gleichzeitigen herstellen von schnellen kurzkanal- und spannungsfesten mos-transistoren in vlsi-schaltungen
US4764482A (en) * 1986-11-21 1988-08-16 General Electric Company Method of fabricating an integrated circuit containing bipolar and MOS transistors
JPS6410656A (en) * 1987-07-03 1989-01-13 Hitachi Ltd Complementary type semiconductor device
CN1020028C (zh) * 1987-08-18 1993-03-03 联邦德国Itt工业股份有限公司 制作cmos集成电路的注入井和岛的方法
JPH0196962A (ja) * 1987-10-08 1989-04-14 Nissan Motor Co Ltd 縦型ｍｏｓトランジスタおよびその製造方法
JP2660056B2 (ja) 1989-09-12 1997-10-08 三菱電機株式会社 相補型ｍｏｓ半導体装置
JP2523409B2 (ja) 1990-05-02 1996-08-07 三菱電機株式会社 半導体記憶装置およびその製造方法
KR950009893B1 (ko) * 1990-06-28 1995-09-01 미쓰비시 뎅끼 가부시끼가이샤 반도체기억장치
JP2978345B2 (ja) 1992-11-26 1999-11-15 三菱電機株式会社 半導体装置の製造方法
JPH0758212A (ja) * 1993-08-19 1995-03-03 Sony Corp Ｃｍｏｓ集積回路
JP2682425B2 (ja) * 1993-12-24 1997-11-26 日本電気株式会社 半導体装置の製造方法
US5393679A (en) 1994-04-05 1995-02-28 United Microelectronics Corporation Use of double charge implant to improve retrograde process PMOS punch through voltage
JPH07312423A (ja) * 1994-05-17 1995-11-28 Hitachi Ltd Ｍｉｓ型半導体装置
US5654213A (en) * 1995-10-03 1997-08-05 Integrated Device Technology, Inc. Method for fabricating a CMOS device
US5767556A (en) * 1996-02-21 1998-06-16 Nec Corporation Field effect transistor

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