JPH10163099A5 - - Google Patents

Info

Publication number
JPH10163099A5
JPH10163099A5 JP1996332846A JP33284696A JPH10163099A5 JP H10163099 A5 JPH10163099 A5 JP H10163099A5 JP 1996332846 A JP1996332846 A JP 1996332846A JP 33284696 A JP33284696 A JP 33284696A JP H10163099 A5 JPH10163099 A5 JP H10163099A5
Authority
JP
Japan
Prior art keywords
substrate
stage
sensitive
holding member
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996332846A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10163099A (ja
JP4029182B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP33284696A external-priority patent/JP4029182B2/ja
Priority to JP33284696A priority Critical patent/JP4029182B2/ja
Priority to SG200005339A priority patent/SG93267A1/en
Priority to SG200103142A priority patent/SG88824A1/en
Priority to DE69738910T priority patent/DE69738910D1/de
Priority to CNB971811172A priority patent/CN1144263C/zh
Priority to HK00103393.7A priority patent/HK1024104B/xx
Priority to SG200103143A priority patent/SG102627A1/en
Priority to SG200103141A priority patent/SG88823A1/en
Priority to CNB011176660A priority patent/CN1244019C/zh
Priority to EP97913467A priority patent/EP0951054B1/en
Priority to CNB011216425A priority patent/CN1244020C/zh
Priority to AU50678/98A priority patent/AU5067898A/en
Priority to EP08005700A priority patent/EP1944654A3/en
Priority to CNB011176652A priority patent/CN1244018C/zh
Priority to PCT/JP1997/004350 priority patent/WO1998024115A1/ja
Priority to IL13013797A priority patent/IL130137A/xx
Priority to KR1020017006773A priority patent/KR20030096435A/ko
Priority to AT97913467T priority patent/ATE404906T1/de
Priority to CNB011216433A priority patent/CN1244021C/zh
Publication of JPH10163099A publication Critical patent/JPH10163099A/ja
Priority to KR1019997004747A priority patent/KR100315249B1/ko
Priority to KR1019997004939A priority patent/KR100314557B1/ko
Priority to US09/666,407 priority patent/US6400441B1/en
Priority to US09/714,620 priority patent/US6549269B1/en
Priority to US09/714,943 priority patent/US6341007B1/en
Priority to US09/716,405 priority patent/US6590634B1/en
Priority to KR1020017006771A priority patent/KR100315250B1/ko
Priority to KR1020017006772A priority patent/KR100315251B1/ko
Priority to US10/024,147 priority patent/US6798491B2/en
Priority to KR1020020072335A priority patent/KR20060086496A/ko
Priority to KR1020020072333A priority patent/KR20060086495A/ko
Priority to US10/879,144 priority patent/US7177008B2/en
Publication of JPH10163099A5 publication Critical patent/JPH10163099A5/ja
Priority to US11/647,492 priority patent/US7256869B2/en
Publication of JP4029182B2 publication Critical patent/JP4029182B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP33284696A 1996-11-28 1996-11-28 露光方法 Expired - Lifetime JP4029182B2 (ja)

Priority Applications (32)

Application Number Priority Date Filing Date Title
JP33284696A JP4029182B2 (ja) 1996-11-28 1996-11-28 露光方法
CNB011216433A CN1244021C (zh) 1996-11-28 1997-11-28 光刻装置和曝光方法
SG200103143A SG102627A1 (en) 1996-11-28 1997-11-28 Lithographic device
DE69738910T DE69738910D1 (de) 1996-11-28 1997-11-28 Ausrichtvorrichtung und belichtungsverfahren
CNB971811172A CN1144263C (zh) 1996-11-28 1997-11-28 曝光装置以及曝光方法
HK00103393.7A HK1024104B (en) 1996-11-28 1997-11-28 Aligner and method for exposure
PCT/JP1997/004350 WO1998024115A1 (fr) 1996-11-28 1997-11-28 Dispositif d'alignement et procede d'exposition
SG200103141A SG88823A1 (en) 1996-11-28 1997-11-28 Projection exposure apparatus
CNB011176660A CN1244019C (zh) 1996-11-28 1997-11-28 曝光装置以及曝光方法
EP97913467A EP0951054B1 (en) 1996-11-28 1997-11-28 Aligner and method for exposure
CNB011216425A CN1244020C (zh) 1996-11-28 1997-11-28 曝光装置
AU50678/98A AU5067898A (en) 1996-11-28 1997-11-28 Aligner and method for exposure
EP08005700A EP1944654A3 (en) 1996-11-28 1997-11-28 An exposure apparatus and an exposure method
CNB011176652A CN1244018C (zh) 1996-11-28 1997-11-28 曝光方法和曝光装置
SG200103142A SG88824A1 (en) 1996-11-28 1997-11-28 Projection exposure method
IL13013797A IL130137A (en) 1996-11-28 1997-11-28 Exposure apparatus and an exposure method
KR1020017006773A KR20030096435A (ko) 1996-11-28 1997-11-28 노광장치 및 노광방법
AT97913467T ATE404906T1 (de) 1996-11-28 1997-11-28 Ausrichtvorrichtung und belichtungsverfahren
SG200005339A SG93267A1 (en) 1996-11-28 1997-11-28 An exposure apparatus and an exposure method
KR1019997004747A KR100315249B1 (ko) 1996-11-28 1999-05-28 노광장치 및 노광방법
KR1019997004939A KR100314557B1 (ko) 1996-11-28 1999-06-03 노광장치 및 노광방법
US09/666,407 US6400441B1 (en) 1996-11-28 2000-09-20 Projection exposure apparatus and method
US09/714,620 US6549269B1 (en) 1996-11-28 2000-11-17 Exposure apparatus and an exposure method
US09/714,943 US6341007B1 (en) 1996-11-28 2000-11-20 Exposure apparatus and method
US09/716,405 US6590634B1 (en) 1996-11-28 2000-11-21 Exposure apparatus and method
KR1020017006771A KR100315250B1 (ko) 1996-11-28 2001-05-30 노광장치 및 노광방법
KR1020017006772A KR100315251B1 (ko) 1996-11-28 2001-05-30 노광장치 및 노광방법
US10/024,147 US6798491B2 (en) 1996-11-28 2001-12-21 Exposure apparatus and an exposure method
KR1020020072335A KR20060086496A (ko) 1996-11-28 2002-11-20 노광장치 및 노광방법
KR1020020072333A KR20060086495A (ko) 1996-11-28 2002-11-20 노광장치 및 노광방법
US10/879,144 US7177008B2 (en) 1996-11-28 2004-06-30 Exposure apparatus and method
US11/647,492 US7256869B2 (en) 1996-11-28 2006-12-29 Exposure apparatus and an exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33284696A JP4029182B2 (ja) 1996-11-28 1996-11-28 露光方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007112572A Division JP4196411B2 (ja) 2007-04-23 2007-04-23 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JPH10163099A JPH10163099A (ja) 1998-06-19
JPH10163099A5 true JPH10163099A5 (enrdf_load_stackoverflow) 2005-08-11
JP4029182B2 JP4029182B2 (ja) 2008-01-09

Family

ID=18259456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33284696A Expired - Lifetime JP4029182B2 (ja) 1996-11-28 1996-11-28 露光方法

Country Status (1)

Country Link
JP (1) JP4029182B2 (enrdf_load_stackoverflow)

Families Citing this family (193)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001023933A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
WO2001023935A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Procede et dispositif d'exposition par projection, et systeme optique de projection
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
TW497013B (en) * 2000-09-07 2002-08-01 Asm Lithography Bv Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method
JP2002287023A (ja) 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
CN101852993A (zh) 2002-12-10 2010-10-06 株式会社尼康 曝光装置和器件制造方法
AU2003289007A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Optical device and projection exposure apparatus using such optical device
EP3301511A1 (en) 2003-02-26 2018-04-04 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR20050110033A (ko) 2003-03-25 2005-11-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101124179B1 (ko) 2003-04-09 2012-03-27 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP1611486B1 (en) 2003-04-10 2016-03-16 Nikon Corporation Environmental system including a transport region for an immersion lithography apparatus
KR101469405B1 (ko) 2003-04-10 2014-12-10 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
ATE449982T1 (de) 2003-04-11 2009-12-15 Nikon Corp Reinigungsverfahren für optik in immersionslithographie
SG2012031209A (en) 2003-04-11 2015-07-30 Nippon Kogaku Kk Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
KR101516141B1 (ko) 2003-05-06 2015-05-04 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
TW201415536A (zh) 2003-05-23 2014-04-16 尼康股份有限公司 曝光方法及曝光裝置以及元件製造方法
TW201806001A (zh) 2003-05-23 2018-02-16 尼康股份有限公司 曝光裝置及元件製造方法
CN100541717C (zh) 2003-05-28 2009-09-16 株式会社尼康 曝光方法、曝光装置以及器件制造方法
KR101528089B1 (ko) 2003-06-13 2015-06-11 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
WO2004114380A1 (ja) 2003-06-19 2004-12-29 Nikon Corporation 露光装置及びデバイス製造方法
JP4835155B2 (ja) 2003-07-09 2011-12-14 株式会社ニコン 露光装置及びデバイス製造方法
EP2264531B1 (en) 2003-07-09 2013-01-16 Nikon Corporation Exposure apparatus and device manufacturing method
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
EP2264534B1 (en) 2003-07-28 2013-07-17 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus
EP1662554A4 (en) 2003-08-21 2008-01-23 Nikon Corp EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING A DEVICE
TWI471705B (zh) 2003-08-26 2015-02-01 尼康股份有限公司 Optical components and exposure devices
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
WO2005022615A1 (ja) 2003-08-29 2005-03-10 Nikon Corporation 液体回収装置、露光装置、露光方法及びデバイス製造方法
KR101380989B1 (ko) 2003-08-29 2014-04-04 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP3870182B2 (ja) 2003-09-09 2007-01-17 キヤノン株式会社 露光装置及びデバイス製造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
EP3007207B1 (en) 2003-09-26 2017-03-08 Nikon Corporation A projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method
WO2005031824A1 (ja) 2003-09-29 2005-04-07 Nikon Corporation 投影露光装置、投影露光方法およびデバイス製造方法
EP1670043B1 (en) 2003-09-29 2013-02-27 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TWI598934B (zh) 2003-10-09 2017-09-11 Nippon Kogaku Kk Exposure apparatus, exposure method, and device manufacturing method
KR20170024154A (ko) 2003-10-22 2017-03-06 가부시키가이샤 니콘 노광 장치, 노광 방법, 디바이스의 제조 방법
TWI360158B (en) 2003-10-28 2012-03-11 Nikon Corp Projection exposure device,exposure method and dev
EP1679738A4 (en) 2003-10-28 2008-08-06 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
EP1679737A4 (en) 2003-10-31 2008-01-30 Nikon Corp EXPOSURE APPARATUS AND DEVICE PRODUCTION METHOD
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
SG148994A1 (en) 2003-12-03 2009-01-29 Nikon Corp Exposure apparatus, exposure method, method for producing device, and optical part
KR101281397B1 (ko) 2003-12-15 2013-07-02 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US7460206B2 (en) 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
KR101561727B1 (ko) 2004-01-05 2015-10-20 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101407204B1 (ko) 2004-01-14 2014-06-13 칼 짜이스 에스엠티 게엠베하 투영 대물렌즈
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
WO2005069355A1 (ja) 2004-01-15 2005-07-28 Nikon Corporation 露光装置及びデバイスの製造方法
KR101204157B1 (ko) 2004-01-20 2012-11-22 칼 짜이스 에스엠테 게엠베하 마이크로 리소그래픽 투영 노광 장치 및 그 투영 렌즈를 위한 측정 장치
JP4319189B2 (ja) 2004-01-26 2009-08-26 株式会社ニコン 露光装置及びデバイス製造方法
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP4506674B2 (ja) 2004-02-03 2010-07-21 株式会社ニコン 露光装置及びデバイス製造方法
EP2765595B1 (en) 2004-02-04 2016-12-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
TWI360837B (en) 2004-02-06 2012-03-21 Nikon Corp Polarization changing device, optical illumination
JP4548341B2 (ja) 2004-02-10 2010-09-22 株式会社ニコン 露光装置及びデバイス製造方法、メンテナンス方法及び露光方法
JP5076497B2 (ja) 2004-02-20 2012-11-21 株式会社ニコン 露光装置、液体の供給方法及び回収方法、露光方法、並びにデバイス製造方法
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
WO2005093791A1 (ja) 2004-03-25 2005-10-06 Nikon Corporation 露光装置及びデバイス製造方法
US7034917B2 (en) 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
JP4677986B2 (ja) 2004-04-19 2011-04-27 株式会社ニコン ノズル部材、露光方法、露光装置及びデバイス製造方法
KR101391470B1 (ko) 2004-05-17 2014-05-07 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7486381B2 (en) 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101833247B (zh) 2004-06-04 2013-11-06 卡尔蔡司Smt有限责任公司 微光刻投影曝光系统的投影物镜的光学测量的测量系统
KR101433496B1 (ko) 2004-06-09 2014-08-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101511876B1 (ko) 2004-06-09 2015-04-13 가부시키가이샤 니콘 기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법, 디바이스 제조 방법, 그리고 발액 플레이트
KR20180072867A (ko) 2004-06-10 2018-06-29 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US8373843B2 (en) 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8717533B2 (en) 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR20070026603A (ko) 2004-06-10 2007-03-08 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
US8508713B2 (en) 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8368870B2 (en) 2004-06-21 2013-02-05 Nikon Corporation Exposure apparatus and device manufacturing method
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
KR101228244B1 (ko) 2004-06-21 2013-01-31 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조방법
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101433491B1 (ko) 2004-07-12 2014-08-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101202231B1 (ko) 2004-07-21 2012-11-16 가부시키가이샤 니콘 노광 방법 및 디바이스 제조 방법
EP3048485B1 (en) 2004-08-03 2017-09-27 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
ATE535015T1 (de) 2004-09-01 2011-12-15 Nikon Corp Substrathalter, bühnenvorrichtung und belichtungsvorrichtung
CN101002128A (zh) 2004-09-13 2007-07-18 尼康股份有限公司 投影光学系统及其制造方法、曝光装置及曝光方法
JP4618253B2 (ja) 2004-09-17 2011-01-26 株式会社ニコン 基板保持装置、露光装置、及びデバイス製造方法
US8675174B2 (en) 2004-09-17 2014-03-18 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR101151575B1 (ko) 2004-10-01 2012-06-01 가부시키가이샤 니콘 리니어 모터, 스테이지 장치 및 노광 장치
EP3046135B1 (en) 2004-10-15 2017-09-20 Nikon Corporation Exposure apparatus and device manufacturing method
US8040489B2 (en) 2004-10-26 2011-10-18 Nikon Corporation Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid
KR101318037B1 (ko) 2004-11-01 2013-10-14 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TW200636816A (en) 2004-11-11 2006-10-16 Nikon Corp Exposure method, device manufacturing method and substrate
TWI405041B (zh) 2004-12-01 2013-08-11 尼康股份有限公司 Stage device and exposure device
EP1821337B1 (en) 2004-12-06 2016-05-11 Nikon Corporation Maintenance method
JP4752473B2 (ja) 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
JP5181475B2 (ja) 2004-12-15 2013-04-10 株式会社ニコン 基板保持装置、露光装置、及びデバイス製造方法
US7450217B2 (en) 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
KR101440617B1 (ko) 2005-01-31 2014-09-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4946109B2 (ja) 2005-03-18 2012-06-06 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
CN100459039C (zh) 2005-03-25 2009-02-04 尼康股份有限公司 照射形状的测量方法、掩模
WO2006106832A1 (ja) 2005-03-30 2006-10-12 Nikon Corporation 露光条件の決定方法、露光方法及び露光装置、並びにデバイス製造方法
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
JP4872916B2 (ja) 2005-04-18 2012-02-08 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
WO2006118258A1 (ja) 2005-04-28 2006-11-09 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
JP5449672B2 (ja) 2005-05-12 2014-03-19 株式会社ニコン 投影光学系、露光装置、および露光方法
US8253924B2 (en) 2005-05-24 2012-08-28 Nikon Corporation Exposure method, exposure apparatus and device manufacturing method
WO2006137410A1 (ja) 2005-06-21 2006-12-28 Nikon Corporation 露光装置及び露光方法、メンテナンス方法、並びにデバイス製造方法
US7924416B2 (en) 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
US8693006B2 (en) 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
EP1901338A4 (en) 2005-06-30 2011-06-29 Nikon Corp EXPOSURE APPARATUS AND METHOD, METHOD OF SERVICING THE EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
TW200710616A (en) 2005-07-11 2007-03-16 Nikon Corp Exposure apparatus and method for manufacturing device
EP1926127A4 (en) 2005-08-23 2009-06-03 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
CN101258581B (zh) 2005-09-09 2011-05-11 株式会社尼康 曝光装置及曝光方法以及设备制造方法
US8111374B2 (en) 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
JPWO2007034838A1 (ja) 2005-09-21 2009-03-26 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US8681314B2 (en) 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
WO2007052659A1 (ja) 2005-11-01 2007-05-10 Nikon Corporation 露光装置、露光方法、及びデバイス製造方法
EP1950612A1 (en) 2005-11-09 2008-07-30 Nikon Corporation Exposure apparatus and method, and method for manufacturing device
TWI397945B (zh) 2005-11-14 2013-06-01 尼康股份有限公司 A liquid recovery member, an exposure apparatus, an exposure method, and an element manufacturing method
JPWO2007058188A1 (ja) 2005-11-15 2009-04-30 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
WO2007058240A1 (ja) 2005-11-16 2007-05-24 Nikon Corporation 基板処理方法、フォトマスクの製造方法及びフォトマスク、並びにデバイス製造方法
US7803516B2 (en) 2005-11-21 2010-09-28 Nikon Corporation Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
JP2007165869A (ja) 2005-11-21 2007-06-28 Nikon Corp 露光方法及びそれを用いたデバイス製造方法、露光装置、並びに基板処理方法及び装置
US8125610B2 (en) 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US7782442B2 (en) 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
EP1965414A4 (en) 2005-12-06 2010-08-25 Nikon Corp EXPOSURE METHOD, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
TW200722935A (en) 2005-12-06 2007-06-16 Nikon Corp Exposure apparatus, exposure method, projection optical system and device manufacturing method
KR101539517B1 (ko) 2005-12-08 2015-07-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
CN101300662B (zh) 2005-12-28 2012-05-09 株式会社尼康 图案形成方法及图案形成装置、以及元件制造方法
EP1978546A4 (en) 2005-12-28 2010-08-04 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
JPWO2007094470A1 (ja) 2006-02-16 2009-07-09 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
KR20080102192A (ko) 2006-02-16 2008-11-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR20080101865A (ko) 2006-02-16 2008-11-21 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR20080103564A (ko) 2006-02-16 2008-11-27 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US8134681B2 (en) 2006-02-17 2012-03-13 Nikon Corporation Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
KR20130057496A (ko) 2006-02-21 2013-05-31 가부시키가이샤 니콘 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
KR101346581B1 (ko) 2006-02-21 2014-01-02 가부시키가이샤 니콘 패턴 형성 장치 및 패턴 형성 방법, 이동체 구동 시스템 및이동체 구동 방법, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
KR101400570B1 (ko) 2006-02-21 2014-05-27 가부시키가이샤 니콘 측정 장치 및 방법, 처리 장치 및 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 그리고 디바이스 제조 방법
KR20080108226A (ko) 2006-03-03 2008-12-12 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP5077770B2 (ja) 2006-03-07 2012-11-21 株式会社ニコン デバイス製造方法、デバイス製造システム及び測定検査装置
KR20080114691A (ko) 2006-03-13 2008-12-31 가부시키가이샤 니콘 노광 장치, 메인터넌스 방법, 노광 방법 및 디바이스 제조 방법
US20070242254A1 (en) 2006-03-17 2007-10-18 Nikon Corporation Exposure apparatus and device manufacturing method
US8982322B2 (en) 2006-03-17 2015-03-17 Nikon Corporation Exposure apparatus and device manufacturing method
US20080013062A1 (en) 2006-03-23 2008-01-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR20090006064A (ko) 2006-04-05 2009-01-14 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 스테이지 제어 방법, 노광 방법및 디바이스 제조 방법
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
TWI439813B (zh) 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US7728462B2 (en) 2006-05-18 2010-06-01 Nikon Corporation Monolithic stage devices providing motion in six degrees of freedom
CN101410948B (zh) 2006-05-18 2011-10-26 株式会社尼康 曝光方法及装置、维护方法、以及组件制造方法
KR20090023335A (ko) 2006-05-22 2009-03-04 가부시키가이샤 니콘 노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법
EP2034515A4 (en) 2006-05-23 2012-01-18 Nikon Corp MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE AND COMPONENT MANUFACTURING METHOD
KR20090023545A (ko) 2006-05-31 2009-03-05 가부시키가이샤 니콘 노광 장치 및 노광 방법
WO2007142350A1 (ja) 2006-06-09 2007-12-13 Nikon Corporation パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
EP2037487A4 (en) 2006-06-09 2014-07-02 Nikon Corp APPARATUS WITH MOBILE BODY, APPARATUS AND METHOD FOR EXPOSURE, AND METHOD FOR MANUFACTURING DEVICES
WO2008001871A1 (fr) 2006-06-30 2008-01-03 Nikon Corporation Procédé de maintenance, procédé d'exposition et procédé de fabrication d'appareil et de dispositif
US20080073563A1 (en) 2006-07-01 2008-03-27 Nikon Corporation Exposure apparatus that includes a phase change circulation system for movers
JP5339056B2 (ja) 2006-07-14 2013-11-13 株式会社ニコン 露光装置及びデバイス製造方法
JP5151981B2 (ja) 2006-08-30 2013-02-27 株式会社ニコン 露光装置及びデバイス製造方法
JP5029611B2 (ja) 2006-09-08 2012-09-19 株式会社ニコン クリーニング用部材、クリーニング方法、露光装置、並びにデバイス製造方法
TW200830057A (en) 2006-09-08 2008-07-16 Nikon Corp Mask, exposure apparatus and device manufacturing method
US7592760B2 (en) * 2006-09-11 2009-09-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7872730B2 (en) 2006-09-15 2011-01-18 Nikon Corporation Immersion exposure apparatus and immersion exposure method, and device manufacturing method
WO2008044612A1 (en) 2006-09-29 2008-04-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP5151989B2 (ja) 2006-11-09 2013-02-27 株式会社ニコン 保持装置、位置検出装置及び露光装置、並びにデバイス製造方法
JP5055971B2 (ja) 2006-11-16 2012-10-24 株式会社ニコン 表面処理方法及び表面処理装置、露光方法及び露光装置、並びにデバイス製造方法
US20080156356A1 (en) 2006-12-05 2008-07-03 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8323855B2 (en) 2007-03-01 2012-12-04 Nikon Corporation Pellicle frame apparatus, mask, exposing method, exposure apparatus, and device fabricating method
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
US8243257B2 (en) 2007-07-24 2012-08-14 Nikon Corporation Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
US8264669B2 (en) 2007-07-24 2012-09-11 Nikon Corporation Movable body drive method, pattern formation method, exposure method, and device manufacturing method for maintaining position coordinate before and after switching encoder head
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US8421994B2 (en) 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US20090153824A1 (en) * 2007-12-17 2009-06-18 Kla-Tencor Corporation Multiple chuck scanning stage
JP5097166B2 (ja) 2008-05-28 2012-12-12 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び装置の動作方法
NL2003363A (en) 2008-09-10 2010-03-15 Asml Netherlands Bv Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
US8384875B2 (en) 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9312159B2 (en) 2009-06-09 2016-04-12 Nikon Corporation Transport apparatus and exposure apparatus
JP2013054144A (ja) * 2011-09-02 2013-03-21 Nikon Corp 位置合わせ方法、露光方法、デバイス製造方法、及びフラットパネルディスプレイの製造方法
JP6271831B2 (ja) * 2012-11-07 2018-01-31 キヤノン株式会社 露光装置、それを用いたデバイスの製造方法
JP2015032800A (ja) 2013-08-07 2015-02-16 キヤノン株式会社 リソグラフィ装置、および物品製造方法
SG11201906413XA (en) * 2017-02-03 2019-08-27 Asml Netherlands Bv Exposure apparatus
KR20230150880A (ko) * 2021-04-09 2023-10-31 가부시키가이샤 니콘 노광 장치, 디바이스 제조 방법, 플랫 패널 디스플레이의 제조 방법 및 노광 방법

Similar Documents

Publication Publication Date Title
JPH10163099A5 (enrdf_load_stackoverflow)
JPH10214783A5 (enrdf_load_stackoverflow)
JP4029182B2 (ja) 露光方法
JPH10163097A5 (enrdf_load_stackoverflow)
TW512428B (en) Stage apparatus, measurement apparatus and measurement method, and exposure apparatus and exposure method
KR970002482A (ko) 투영 노광 장치 및 투영 노광 방법
JP3826042B2 (ja) ステージ装置、それを用いた半導体露光装置および位置計測方法
CN112180696A (zh) 检测装置、曝光装置和物品制造方法
JP2646412B2 (ja) 露光装置
KR20040086779A (ko) 대물을 이송하는 이송장치와 그 사용 방법 및 이러한이송장치를 포함하는 리소그래피투영장치
JPH10163098A5 (enrdf_load_stackoverflow)
JPH10223528A (ja) 投影露光装置及び位置合わせ方法
JPH1050604A (ja) 位置管理方法及び位置合わせ方法
JP2004140290A (ja) ステージ装置
JPH11162833A (ja) 基板周縁露光方法
US6757049B2 (en) Apparatus and method for exposure
JP2004241666A (ja) 計測方法及び露光方法
JPH09148236A (ja) 露光装置の基板ステージの移動制御方法及び装置
TW200826154A (en) Exposure apparatus and device manufacturing method
JP3569962B2 (ja) 位置合わせ装置及び位置合わせ方法、それを用いた露光装置及び露光方法
JPH10335234A (ja) 投影露光装置
JP3204253B2 (ja) 露光装置及びその露光装置により製造されたデバイス、並びに露光方法及びその露光方法を用いてデバイスを製造する方法
JPH10199804A5 (enrdf_load_stackoverflow)
US20230273016A1 (en) Detection method, detection apparatus, lithography apparatus, and article manufacturing method
JP2001203148A (ja) 露光における間隙測定装置および間隙測定方法