JPH0587146B2 - - Google Patents

Info

Publication number
JPH0587146B2
JPH0587146B2 JP61138644A JP13864486A JPH0587146B2 JP H0587146 B2 JPH0587146 B2 JP H0587146B2 JP 61138644 A JP61138644 A JP 61138644A JP 13864486 A JP13864486 A JP 13864486A JP H0587146 B2 JPH0587146 B2 JP H0587146B2
Authority
JP
Japan
Prior art keywords
interlayer insulating
forming
insulating film
wiring layer
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61138644A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62295437A (ja
Inventor
Katsuyuki Yokoi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamaha Corp
Original Assignee
Yamaha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamaha Corp filed Critical Yamaha Corp
Priority to JP13864486A priority Critical patent/JPS62295437A/ja
Publication of JPS62295437A publication Critical patent/JPS62295437A/ja
Publication of JPH0587146B2 publication Critical patent/JPH0587146B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP13864486A 1986-06-14 1986-06-14 多層配線形成法 Granted JPS62295437A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13864486A JPS62295437A (ja) 1986-06-14 1986-06-14 多層配線形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13864486A JPS62295437A (ja) 1986-06-14 1986-06-14 多層配線形成法

Publications (2)

Publication Number Publication Date
JPS62295437A JPS62295437A (ja) 1987-12-22
JPH0587146B2 true JPH0587146B2 (enrdf_load_stackoverflow) 1993-12-15

Family

ID=15226822

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13864486A Granted JPS62295437A (ja) 1986-06-14 1986-06-14 多層配線形成法

Country Status (1)

Country Link
JP (1) JPS62295437A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6386547A (ja) * 1986-09-30 1988-04-16 Pioneer Electronic Corp 多重配線基板の製造方法
JPS6386546A (ja) * 1986-09-30 1988-04-16 Pioneer Electronic Corp 多重配線基板の製造方法
JPS63164342A (ja) * 1986-12-26 1988-07-07 Matsushita Electric Ind Co Ltd 絶縁膜形成方法
JPH01243553A (ja) * 1988-03-25 1989-09-28 Seiko Epson Corp 半導体装置の製造方法
JP2850341B2 (ja) * 1988-11-22 1999-01-27 セイコーエプソン株式会社 半導体装置の製造方法
JPH02172261A (ja) * 1988-12-25 1990-07-03 Nec Corp 半導体装置の製造方法
JPH02271630A (ja) * 1989-04-13 1990-11-06 Seiko Epson Corp 半導体装置の製造方法
JPH0682662B2 (ja) * 1989-07-18 1994-10-19 セイコーエプソン株式会社 半導体装置の製造方法
JPH04174541A (ja) * 1990-03-28 1992-06-22 Nec Corp 半導体集積回路及びその製造方法
JP2820070B2 (ja) * 1995-08-11 1998-11-05 日本電気株式会社 プラズマ化学気相成長法とその装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5897848A (ja) * 1981-12-08 1983-06-10 Seiko Instr & Electronics Ltd 表面平滑化方法
JPS607737A (ja) * 1983-06-27 1985-01-16 Nec Corp 半導体装置の製造方法
JPS6035535A (ja) * 1983-08-08 1985-02-23 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPS60173856A (ja) * 1984-02-10 1985-09-07 Fujitsu Ltd 半導体装置の製造方法
JPS61116858A (ja) * 1984-10-24 1986-06-04 Fujitsu Ltd 層間絶縁膜の形成方法
JPS6165454A (ja) * 1984-09-07 1986-04-04 Fujitsu Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS62295437A (ja) 1987-12-22

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