JPH0577284B2 - - Google Patents
Info
- Publication number
- JPH0577284B2 JPH0577284B2 JP8743744A JP4374487A JPH0577284B2 JP H0577284 B2 JPH0577284 B2 JP H0577284B2 JP 8743744 A JP8743744 A JP 8743744A JP 4374487 A JP4374487 A JP 4374487A JP H0577284 B2 JPH0577284 B2 JP H0577284B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- adhesive
- water
- adhesive sheet
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Adhesive Tapes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Adhesives Or Adhesive Processes (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MYPI87000930A MY102454A (en) | 1986-07-09 | 1987-07-02 | Adhesive sheets for sticking wafers thereto |
| KR1019870007148A KR910002826B1 (ko) | 1986-07-09 | 1987-07-04 | 웨이퍼 접착용 시이트 |
| EP87306075A EP0252739B1 (en) | 1986-07-09 | 1987-07-09 | Adhesive sheets for sticking wafers thereto |
| DE87306075T DE3787680T2 (de) | 1986-07-09 | 1987-07-09 | Klebestreifen zum Kleben von Plättchen. |
| MYPI91001866A MY109333A (en) | 1986-07-09 | 1991-10-12 | Adhesive sheets for sticking wafers thereto |
| SG23494A SG23494G (en) | 1986-07-09 | 1994-02-07 | Adhesive sheets for sticking wafers thereto. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61-161682 | 1986-07-09 | ||
| JP16168286 | 1986-07-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63153814A JPS63153814A (ja) | 1988-06-27 |
| JPH0577284B2 true JPH0577284B2 (enExample) | 1993-10-26 |
Family
ID=15739841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62043744A Granted JPS63153814A (ja) | 1986-07-09 | 1987-02-26 | ウエハ貼着用粘着シ−ト |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS63153814A (enExample) |
| KR (1) | KR910002826B1 (enExample) |
| MY (2) | MY102454A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7351645B2 (en) | 2004-06-02 | 2008-04-01 | Lintec Corporation | Pressure sensitive adhesive sheet for use in semiconductor working and method for producing semiconductor chip |
| US9670382B2 (en) | 2011-03-22 | 2017-06-06 | Lintec Corporation | Base film and pressure-sensitive adhesive sheet provided therewith |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3177149B2 (ja) * | 1996-03-15 | 2001-06-18 | リンテック株式会社 | 粘着テープ用基材、該基材を用いた粘着テープ、および該基材の製造方法 |
| JPH10337823A (ja) * | 1997-04-11 | 1998-12-22 | Lintec Corp | 基材および該基材を用いた粘着テープ |
| JP3809733B2 (ja) | 1998-02-25 | 2006-08-16 | セイコーエプソン株式会社 | 薄膜トランジスタの剥離方法 |
| US6235387B1 (en) | 1998-03-30 | 2001-05-22 | 3M Innovative Properties Company | Semiconductor wafer processing tapes |
| PT1568071T (pt) * | 2002-11-29 | 2019-06-17 | Fraunhofer Ges Forschung | Pastilha com camada de separação e camada de suporte e seu processo de fabrico |
| JP5665020B2 (ja) * | 2009-12-22 | 2015-02-04 | 国立大学法人九州工業大学 | 配線用電子部品の製造方法 |
| JP5762781B2 (ja) | 2011-03-22 | 2015-08-12 | リンテック株式会社 | 基材フィルムおよび該基材フィルムを備えた粘着シート |
| WO2016063916A1 (ja) | 2014-10-23 | 2016-04-28 | リンテック株式会社 | 表面保護用シート |
| JP6647267B2 (ja) | 2017-11-09 | 2020-02-14 | 古河電気工業株式会社 | 半導体チップの製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2319973B2 (de) * | 1972-04-26 | 1981-06-04 | Celanese Corp., 10036 New York, N.Y. | Verfahren zur Stabilisierung von Oxymethylencopolymer |
| JPS6031351B2 (ja) * | 1979-11-13 | 1985-07-22 | 日本合成化学工業株式会社 | 水溶性感圧接着剤 |
| JPS59157162A (ja) * | 1983-02-26 | 1984-09-06 | Dainippon Printing Co Ltd | 水による剥離の容易な粘着剤組成物 |
| JPS6143677A (ja) * | 1984-08-07 | 1986-03-03 | Mitsui Toatsu Chem Inc | Icプロセス用フイルム |
-
1987
- 1987-02-26 JP JP62043744A patent/JPS63153814A/ja active Granted
- 1987-07-02 MY MYPI87000930A patent/MY102454A/en unknown
- 1987-07-04 KR KR1019870007148A patent/KR910002826B1/ko not_active Expired
-
1991
- 1991-10-12 MY MYPI91001866A patent/MY109333A/en unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7351645B2 (en) | 2004-06-02 | 2008-04-01 | Lintec Corporation | Pressure sensitive adhesive sheet for use in semiconductor working and method for producing semiconductor chip |
| US9670382B2 (en) | 2011-03-22 | 2017-06-06 | Lintec Corporation | Base film and pressure-sensitive adhesive sheet provided therewith |
Also Published As
| Publication number | Publication date |
|---|---|
| MY102454A (en) | 1992-06-30 |
| KR910002826B1 (ko) | 1991-05-06 |
| MY109333A (en) | 1997-01-31 |
| KR880002261A (ko) | 1988-04-30 |
| JPS63153814A (ja) | 1988-06-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0252739B1 (en) | Adhesive sheets for sticking wafers thereto | |
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| JPH0577284B2 (enExample) | ||
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |