JP7781705B2 - プログラマブル直接描画装置のためのパターンデータ処理 - Google Patents

プログラマブル直接描画装置のためのパターンデータ処理

Info

Publication number
JP7781705B2
JP7781705B2 JP2022084484A JP2022084484A JP7781705B2 JP 7781705 B2 JP7781705 B2 JP 7781705B2 JP 2022084484 A JP2022084484 A JP 2022084484A JP 2022084484 A JP2022084484 A JP 2022084484A JP 7781705 B2 JP7781705 B2 JP 7781705B2
Authority
JP
Japan
Prior art keywords
data
pattern
charged particle
writing
pattern data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022084484A
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English (en)
Japanese (ja)
Other versions
JP2022181200A (ja
JP2022181200A5 (https=
Inventor
プラッツグマー エルマー
シュペングラー クリストフ
ハーベルラー ミヒャエル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IMS Nanofabrication GmbH
Original Assignee
IMS Nanofabrication GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IMS Nanofabrication GmbH filed Critical IMS Nanofabrication GmbH
Publication of JP2022181200A publication Critical patent/JP2022181200A/ja
Publication of JP2022181200A5 publication Critical patent/JP2022181200A5/ja
Application granted granted Critical
Publication of JP7781705B2 publication Critical patent/JP7781705B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H01J37/3023—Program control
    • H01J37/3026—Patterning strategy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31762—Computer and memory organisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP2022084484A 2021-05-25 2022-05-24 プログラマブル直接描画装置のためのパターンデータ処理 Active JP7781705B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP21175588 2021-05-25
EP21175588.9 2021-05-25

Publications (3)

Publication Number Publication Date
JP2022181200A JP2022181200A (ja) 2022-12-07
JP2022181200A5 JP2022181200A5 (https=) 2024-12-20
JP7781705B2 true JP7781705B2 (ja) 2025-12-08

Family

ID=76098813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022084484A Active JP7781705B2 (ja) 2021-05-25 2022-05-24 プログラマブル直接描画装置のためのパターンデータ処理

Country Status (4)

Country Link
US (1) US12040157B2 (https=)
EP (1) EP4095882A1 (https=)
JP (1) JP7781705B2 (https=)
KR (1) KR20220159285A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102919104B1 (ko) 2020-02-03 2026-01-29 아이엠에스 나노패브릭케이션 게엠베하 멀티―빔 라이터의 블러 변화 보정
KR102922552B1 (ko) 2020-04-24 2026-02-04 아이엠에스 나노패브릭케이션 게엠베하 대전 입자 소스
US12500060B2 (en) 2021-07-14 2025-12-16 Ims Nanofabrication Gmbh Electromagnetic lens
US12154756B2 (en) 2021-08-12 2024-11-26 Ims Nanofabrication Gmbh Beam pattern device having beam absorber structure

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