JP7376978B2 - 感光性樹脂組成物、硬化物の製造方法および表示装置の製造方法 - Google Patents
感光性樹脂組成物、硬化物の製造方法および表示装置の製造方法 Download PDFInfo
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- JP7376978B2 JP7376978B2 JP2018098216A JP2018098216A JP7376978B2 JP 7376978 B2 JP7376978 B2 JP 7376978B2 JP 2018098216 A JP2018098216 A JP 2018098216A JP 2018098216 A JP2018098216 A JP 2018098216A JP 7376978 B2 JP7376978 B2 JP 7376978B2
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018098216A JP7376978B2 (ja) | 2018-05-22 | 2018-05-22 | 感光性樹脂組成物、硬化物の製造方法および表示装置の製造方法 |
| TW108117519A TWI810301B (zh) | 2018-05-22 | 2019-05-21 | 感光性樹脂組成物、該感光性樹脂組成物的硬化物及含有該硬化物的顯示裝置 |
| CN201910425152.9A CN110515268A (zh) | 2018-05-22 | 2019-05-21 | 感光树脂组合物、该感光树脂组合物的硬化物及含有该硬化物的显示装置 |
| KR1020190060002A KR20190133113A (ko) | 2018-05-22 | 2019-05-22 | 감광성 수지 조성물, 그 경화물 및 그 경화물을 포함하는 표시 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018098216A JP7376978B2 (ja) | 2018-05-22 | 2018-05-22 | 感光性樹脂組成物、硬化物の製造方法および表示装置の製造方法 |
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| Publication Number | Publication Date |
|---|---|
| JP2019203963A JP2019203963A (ja) | 2019-11-28 |
| JP7376978B2 true JP7376978B2 (ja) | 2023-11-09 |
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| JP2018098216A Active JP7376978B2 (ja) | 2018-05-22 | 2018-05-22 | 感光性樹脂組成物、硬化物の製造方法および表示装置の製造方法 |
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| JP (1) | JP7376978B2 (zh) |
| KR (1) | KR20190133113A (zh) |
| CN (1) | CN110515268A (zh) |
| TW (1) | TWI810301B (zh) |
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| WO2022172605A1 (ja) * | 2021-02-09 | 2022-08-18 | 東レ株式会社 | ネガ型感光性組成物、硬化膜、有機ｅｌ表示装置および硬化膜の製造方法 |
| CN113075862A (zh) * | 2021-03-03 | 2021-07-06 | 长春人造树脂厂股份有限公司 | 抗蚀刻组合物 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005255753A (ja) | 2004-03-10 | 2005-09-22 | Mitsubishi Chemicals Corp | 硬化性樹脂組成物、カラーフィルタ、および液晶表示装置 |
| JP2007271687A (ja) | 2006-03-30 | 2007-10-18 | Nippon Steel Chem Co Ltd | カラーフィルター用遮光性樹脂組成物及びカラーフィルター |
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| JP4691877B2 (ja) | 2002-08-08 | 2011-06-01 | 住友化学株式会社 | 着色感光性樹脂組成物 |
| CN1918515B (zh) * | 2004-02-16 | 2010-12-08 | 三菱化学株式会社 | 可固化树脂组合物、滤色器和液晶显示装置 |
| WO2008123340A1 (ja) * | 2007-03-30 | 2008-10-16 | Nippon Steel Chemical Co., Ltd. | カラーフィルター用遮光性樹脂組成物及びカラーフィルター |
| KR101390709B1 (ko) * | 2008-11-07 | 2014-04-30 | 주식회사 엘지화학 | 감광성 수지 조성물 및 이로부터 제조된 미세패턴을 포함하는 액정표시소자 |
| TWI501027B (zh) | 2008-11-18 | 2015-09-21 | Sumitomo Chemical Co | Photosensitive resin composition and display device |
| KR20170043307A (ko) * | 2015-10-13 | 2017-04-21 | 주식회사 엘지화학 | 감광성 수지 조성물 및 이를 포함하는 감광재 |
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2018
- 2018-05-22 JP JP2018098216A patent/JP7376978B2/ja active Active
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- 2019-05-21 TW TW108117519A patent/TWI810301B/zh active
- 2019-05-21 CN CN201910425152.9A patent/CN110515268A/zh active Pending
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005255753A (ja) | 2004-03-10 | 2005-09-22 | Mitsubishi Chemicals Corp | 硬化性樹脂組成物、カラーフィルタ、および液晶表示装置 |
| JP2007271687A (ja) | 2006-03-30 | 2007-10-18 | Nippon Steel Chem Co Ltd | カラーフィルター用遮光性樹脂組成物及びカラーフィルター |
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| Publication number | Publication date |
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| CN110515268A (zh) | 2019-11-29 |
| TWI810301B (zh) | 2023-08-01 |
| KR20190133113A (ko) | 2019-12-02 |
| TW202003610A (zh) | 2020-01-16 |
| JP2019203963A (ja) | 2019-11-28 |
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