JP7324734B2 - 基板搬送装置及び基板処理装置 - Google Patents

基板搬送装置及び基板処理装置 Download PDF

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Publication number
JP7324734B2
JP7324734B2 JP2020112018A JP2020112018A JP7324734B2 JP 7324734 B2 JP7324734 B2 JP 7324734B2 JP 2020112018 A JP2020112018 A JP 2020112018A JP 2020112018 A JP2020112018 A JP 2020112018A JP 7324734 B2 JP7324734 B2 JP 7324734B2
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substrate
rollers
roller
transport
pressing
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JP2020112018A
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Japanese (ja)
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JP2021022729A5 (enExample
JP2021022729A (ja
Inventor
幸伸 西部
健吾 亀井
絵美 松井
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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Priority to KR1020200089545A priority Critical patent/KR102404501B1/ko
Priority to CN202010702618.8A priority patent/CN112309933B/zh
Priority to TW109124725A priority patent/TWI734565B/zh
Publication of JP2021022729A publication Critical patent/JP2021022729A/ja
Publication of JP2021022729A5 publication Critical patent/JP2021022729A5/ja
Priority to JP2023066690A priority patent/JP7434640B2/ja
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Publication of JP7324734B2 publication Critical patent/JP7324734B2/ja
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)
  • Drying Of Solid Materials (AREA)
JP2020112018A 2019-07-25 2020-06-29 基板搬送装置及び基板処理装置 Active JP7324734B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020200089545A KR102404501B1 (ko) 2019-07-25 2020-07-20 기판 반송 장치 및 기판 처리 장치
CN202010702618.8A CN112309933B (zh) 2019-07-25 2020-07-21 基板搬送装置及基板处理装置
TW109124725A TWI734565B (zh) 2019-07-25 2020-07-22 基板搬送裝置及基板處理裝置
JP2023066690A JP7434640B2 (ja) 2019-07-25 2023-04-14 基板搬送装置及び基板処理装置

Applications Claiming Priority (2)

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JP2019137160 2019-07-25
JP2019137160 2019-07-25

Related Child Applications (1)

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JP2023066690A Division JP7434640B2 (ja) 2019-07-25 2023-04-14 基板搬送装置及び基板処理装置

Publications (3)

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JP2021022729A JP2021022729A (ja) 2021-02-18
JP2021022729A5 JP2021022729A5 (enExample) 2022-02-28
JP7324734B2 true JP7324734B2 (ja) 2023-08-10

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JP (1) JP7324734B2 (enExample)
TW (1) TWI734565B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7324823B2 (ja) * 2021-01-22 2023-08-10 芝浦メカトロニクス株式会社 基板搬送装置及び基板処理装置
JP7419320B2 (ja) * 2021-09-30 2024-01-22 芝浦メカトロニクス株式会社 基板処理装置
CN117509132B (zh) * 2023-12-18 2025-12-05 青岛新松机器人自动化有限公司 一种载片翘曲后自动矫正推片装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004345744A (ja) 2003-05-20 2004-12-09 Hitachi Zosen Corp 空気浮上装置および空気浮上式搬送装置
JP2010222063A (ja) 2009-03-19 2010-10-07 Sumitomo Precision Prod Co Ltd 基板処理装置
JP2016207847A (ja) 2015-04-23 2016-12-08 凸版印刷株式会社 基板の搬送方法および搬送装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3306954B2 (ja) * 1993-02-15 2002-07-24 松下電器産業株式会社 リフロー装置
JPH08288250A (ja) * 1995-04-19 1996-11-01 Dainippon Screen Mfg Co Ltd 基板の液切り装置
JP3336349B2 (ja) * 1996-12-16 2002-10-21 株式会社オーシャン 回路基板の表面処理装置
JP4022288B2 (ja) * 1997-09-02 2007-12-12 大日本スクリーン製造株式会社 基板処理装置
CN201478284U (zh) * 2009-08-03 2010-05-19 扬博科技股份有限公司 基板输送装置
WO2011121632A1 (ja) * 2010-03-29 2011-10-06 キヤノンアネルバ株式会社 搬送機構及びこれを用いた真空処理装置と電子デバイスの製造方法
JP2014175497A (ja) * 2013-03-08 2014-09-22 Toshiba Corp 処理装置、および処理方法
JP2016167475A (ja) * 2015-03-09 2016-09-15 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN109641246A (zh) * 2016-08-25 2019-04-16 康宁股份有限公司 用于清洁玻璃基材的方法和设备
CN207903511U (zh) * 2018-02-13 2018-09-25 睿明科技股份有限公司 基板传送设备

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004345744A (ja) 2003-05-20 2004-12-09 Hitachi Zosen Corp 空気浮上装置および空気浮上式搬送装置
JP2010222063A (ja) 2009-03-19 2010-10-07 Sumitomo Precision Prod Co Ltd 基板処理装置
JP2016207847A (ja) 2015-04-23 2016-12-08 凸版印刷株式会社 基板の搬送方法および搬送装置

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TWI734565B (zh) 2021-07-21
JP2021022729A (ja) 2021-02-18
TW202104046A (zh) 2021-02-01

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