TWI734565B - 基板搬送裝置及基板處理裝置 - Google Patents
基板搬送裝置及基板處理裝置 Download PDFInfo
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- TWI734565B TWI734565B TW109124725A TW109124725A TWI734565B TW I734565 B TWI734565 B TW I734565B TW 109124725 A TW109124725 A TW 109124725A TW 109124725 A TW109124725 A TW 109124725A TW I734565 B TWI734565 B TW I734565B
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- substrate
- roller
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- 239000000758 substrate Substances 0.000 title claims abstract description 300
- 238000012545 processing Methods 0.000 title claims abstract description 127
- 238000003825 pressing Methods 0.000 claims abstract description 113
- 238000000926 separation method Methods 0.000 claims abstract description 72
- 238000001035 drying Methods 0.000 claims description 49
- 239000007788 liquid Substances 0.000 claims description 48
- 238000007664 blowing Methods 0.000 claims description 37
- 238000011144 upstream manufacturing Methods 0.000 claims description 21
- 238000012546 transfer Methods 0.000 claims description 15
- 239000007789 gas Substances 0.000 description 44
- 238000004140 cleaning Methods 0.000 description 39
- 238000012937 correction Methods 0.000 description 20
- 238000010586 diagram Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Rollers For Roller Conveyors For Transfer (AREA)
- Drying Of Solid Materials (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-137160 | 2019-07-25 | ||
| JP2019137160 | 2019-07-25 | ||
| JP2020-112018 | 2020-06-29 | ||
| JP2020112018A JP7324734B2 (ja) | 2019-07-25 | 2020-06-29 | 基板搬送装置及び基板処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202104046A TW202104046A (zh) | 2021-02-01 |
| TWI734565B true TWI734565B (zh) | 2021-07-21 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109124725A TWI734565B (zh) | 2019-07-25 | 2020-07-22 | 基板搬送裝置及基板處理裝置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7324734B2 (enExample) |
| TW (1) | TWI734565B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7324823B2 (ja) * | 2021-01-22 | 2023-08-10 | 芝浦メカトロニクス株式会社 | 基板搬送装置及び基板処理装置 |
| JP7419320B2 (ja) * | 2021-09-30 | 2024-01-22 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
| CN117509132B (zh) * | 2023-12-18 | 2025-12-05 | 青岛新松机器人自动化有限公司 | 一种载片翘曲后自动矫正推片装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201478284U (zh) * | 2009-08-03 | 2010-05-19 | 扬博科技股份有限公司 | 基板输送装置 |
| WO2011121632A1 (ja) * | 2010-03-29 | 2011-10-06 | キヤノンアネルバ株式会社 | 搬送機構及びこれを用いた真空処理装置と電子デバイスの製造方法 |
| TW201448040A (zh) * | 2013-03-08 | 2014-12-16 | Toshiba Kk | 處理裝置及處理方法 |
| TW201633435A (zh) * | 2015-03-09 | 2016-09-16 | Screen Holdings Co Ltd | 基板處理裝置 |
| TW201811640A (zh) * | 2016-08-25 | 2018-04-01 | 美商康寧公司 | 用於清潔玻璃基板之方法及設備 |
| CN207903511U (zh) * | 2018-02-13 | 2018-09-25 | 睿明科技股份有限公司 | 基板传送设备 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3306954B2 (ja) * | 1993-02-15 | 2002-07-24 | 松下電器産業株式会社 | リフロー装置 |
| JPH08288250A (ja) * | 1995-04-19 | 1996-11-01 | Dainippon Screen Mfg Co Ltd | 基板の液切り装置 |
| JP3336349B2 (ja) * | 1996-12-16 | 2002-10-21 | 株式会社オーシャン | 回路基板の表面処理装置 |
| JP4022288B2 (ja) * | 1997-09-02 | 2007-12-12 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP2004345744A (ja) * | 2003-05-20 | 2004-12-09 | Hitachi Zosen Corp | 空気浮上装置および空気浮上式搬送装置 |
| JP5260370B2 (ja) * | 2009-03-19 | 2013-08-14 | 住友精密工業株式会社 | 基板処理装置 |
| JP2016207847A (ja) * | 2015-04-23 | 2016-12-08 | 凸版印刷株式会社 | 基板の搬送方法および搬送装置 |
-
2020
- 2020-06-29 JP JP2020112018A patent/JP7324734B2/ja active Active
- 2020-07-22 TW TW109124725A patent/TWI734565B/zh active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201478284U (zh) * | 2009-08-03 | 2010-05-19 | 扬博科技股份有限公司 | 基板输送装置 |
| WO2011121632A1 (ja) * | 2010-03-29 | 2011-10-06 | キヤノンアネルバ株式会社 | 搬送機構及びこれを用いた真空処理装置と電子デバイスの製造方法 |
| TW201448040A (zh) * | 2013-03-08 | 2014-12-16 | Toshiba Kk | 處理裝置及處理方法 |
| TW201633435A (zh) * | 2015-03-09 | 2016-09-16 | Screen Holdings Co Ltd | 基板處理裝置 |
| TW201811640A (zh) * | 2016-08-25 | 2018-04-01 | 美商康寧公司 | 用於清潔玻璃基板之方法及設備 |
| CN207903511U (zh) * | 2018-02-13 | 2018-09-25 | 睿明科技股份有限公司 | 基板传送设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7324734B2 (ja) | 2023-08-10 |
| JP2021022729A (ja) | 2021-02-18 |
| TW202104046A (zh) | 2021-02-01 |
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