JP7101406B2 - 向上した性能を備える、ナノ結晶を利用した中遠赤外光検出器 - Google Patents
向上した性能を備える、ナノ結晶を利用した中遠赤外光検出器 Download PDFInfo
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- JP7101406B2 JP7101406B2 JP2018503538A JP2018503538A JP7101406B2 JP 7101406 B2 JP7101406 B2 JP 7101406B2 JP 2018503538 A JP2018503538 A JP 2018503538A JP 2018503538 A JP2018503538 A JP 2018503538A JP 7101406 B2 JP7101406 B2 JP 7101406B2
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- nanocrystals
- metal chalcogenide
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- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1557213A FR3039531A1 (enExample) | 2015-07-28 | 2015-07-28 | |
| FR1557213 | 2015-07-28 | ||
| PCT/EP2016/068106 WO2017017238A1 (en) | 2015-07-28 | 2016-07-28 | Mid and far-infrared nanocrystals based photodetectors with enhanced performances |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018524820A JP2018524820A (ja) | 2018-08-30 |
| JP2018524820A5 JP2018524820A5 (enExample) | 2019-08-08 |
| JP7101406B2 true JP7101406B2 (ja) | 2022-07-15 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018503538A Expired - Fee Related JP7101406B2 (ja) | 2015-07-28 | 2016-07-28 | 向上した性能を備える、ナノ結晶を利用した中遠赤外光検出器 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10944065B2 (enExample) |
| EP (1) | EP3328791A1 (enExample) |
| JP (1) | JP7101406B2 (enExample) |
| KR (1) | KR20180033536A (enExample) |
| CN (1) | CN108137323B (enExample) |
| FR (1) | FR3039531A1 (enExample) |
| WO (1) | WO2017017238A1 (enExample) |
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| US9394608B2 (en) | 2009-04-06 | 2016-07-19 | Asm America, Inc. | Semiconductor processing reactor and components thereof |
| US20130023129A1 (en) | 2011-07-20 | 2013-01-24 | Asm America, Inc. | Pressure transmitter for a semiconductor processing environment |
| US10714315B2 (en) | 2012-10-12 | 2020-07-14 | Asm Ip Holdings B.V. | Semiconductor reaction chamber showerhead |
| US20160376700A1 (en) | 2013-02-01 | 2016-12-29 | Asm Ip Holding B.V. | System for treatment of deposition reactor |
| US11015245B2 (en) | 2014-03-19 | 2021-05-25 | Asm Ip Holding B.V. | Gas-phase reactor and system having exhaust plenum and components thereof |
| US10858737B2 (en) | 2014-07-28 | 2020-12-08 | Asm Ip Holding B.V. | Showerhead assembly and components thereof |
| US10941490B2 (en) | 2014-10-07 | 2021-03-09 | Asm Ip Holding B.V. | Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same |
| US10276355B2 (en) | 2015-03-12 | 2019-04-30 | Asm Ip Holding B.V. | Multi-zone reactor, system including the reactor, and method of using the same |
| US10458018B2 (en) | 2015-06-26 | 2019-10-29 | Asm Ip Holding B.V. | Structures including metal carbide material, devices including the structures, and methods of forming same |
| US10211308B2 (en) | 2015-10-21 | 2019-02-19 | Asm Ip Holding B.V. | NbMC layers |
| US11139308B2 (en) | 2015-12-29 | 2021-10-05 | Asm Ip Holding B.V. | Atomic layer deposition of III-V compounds to form V-NAND devices |
| US10529554B2 (en) | 2016-02-19 | 2020-01-07 | Asm Ip Holding B.V. | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches |
| US10343920B2 (en) | 2016-03-18 | 2019-07-09 | Asm Ip Holding B.V. | Aligned carbon nanotubes |
| US10190213B2 (en) | 2016-04-21 | 2019-01-29 | Asm Ip Holding B.V. | Deposition of metal borides |
| US10367080B2 (en) | 2016-05-02 | 2019-07-30 | Asm Ip Holding B.V. | Method of forming a germanium oxynitride film |
| US11453943B2 (en) | 2016-05-25 | 2022-09-27 | Asm Ip Holding B.V. | Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor |
| US10612137B2 (en) | 2016-07-08 | 2020-04-07 | Asm Ip Holdings B.V. | Organic reactants for atomic layer deposition |
| US9859151B1 (en) | 2016-07-08 | 2018-01-02 | Asm Ip Holding B.V. | Selective film deposition method to form air gaps |
| US9887082B1 (en) | 2016-07-28 | 2018-02-06 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
| KR102532607B1 (ko) | 2016-07-28 | 2023-05-15 | 에이에스엠 아이피 홀딩 비.브이. | 기판 가공 장치 및 그 동작 방법 |
| US9812320B1 (en) | 2016-07-28 | 2017-11-07 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
| US10643826B2 (en) | 2016-10-26 | 2020-05-05 | Asm Ip Holdings B.V. | Methods for thermally calibrating reaction chambers |
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| WO2017017238A1 (en) | 2017-02-02 |
| EP3328791A1 (en) | 2018-06-06 |
| CN108137323A (zh) | 2018-06-08 |
| US10944065B2 (en) | 2021-03-09 |
| US20200083469A1 (en) | 2020-03-12 |
| CN108137323B (zh) | 2021-06-15 |
| KR20180033536A (ko) | 2018-04-03 |
| FR3039531A1 (enExample) | 2017-02-03 |
| JP2018524820A (ja) | 2018-08-30 |
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