JP6909881B2 - フェライトビーズを有するスイッチング回路 - Google Patents
フェライトビーズを有するスイッチング回路 Download PDFInfo
- Publication number
- JP6909881B2 JP6909881B2 JP2020003415A JP2020003415A JP6909881B2 JP 6909881 B2 JP6909881 B2 JP 6909881B2 JP 2020003415 A JP2020003415 A JP 2020003415A JP 2020003415 A JP2020003415 A JP 2020003415A JP 6909881 B2 JP6909881 B2 JP 6909881B2
- Authority
- JP
- Japan
- Prior art keywords
- transistor
- gate
- iii
- lead
- package
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011324 bead Substances 0.000 title claims description 69
- 229910000859 α-Fe Inorganic materials 0.000 title claims description 69
- 230000003071 parasitic effect Effects 0.000 claims description 12
- 238000010586 diagram Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 244000089486 Phragmites australis subsp australis Species 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 230000005533 two-dimensional electron gas Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/16—Modifications for eliminating interference voltages or currents
- H03K17/161—Modifications for eliminating interference voltages or currents in field-effect transistor switches
- H03K17/162—Modifications for eliminating interference voltages or currents in field-effect transistor switches without feedback from the output circuit to the control circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
- H01L23/49562—Geometry of the lead-frame for devices being provided for in H01L29/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/645—Inductive arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/0883—Combination of depletion and enhancement field effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L29/2003—Nitride compounds
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/04—Modifications for accelerating switching
- H03K17/041—Modifications for accelerating switching without feedback from the output circuit to the control circuit
- H03K17/04106—Modifications for accelerating switching without feedback from the output circuit to the control circuit in field-effect transistor switches
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/10—Modifications for increasing the maximum permissible switched voltage
- H03K17/102—Modifications for increasing the maximum permissible switched voltage in field-effect transistor switches
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/12—Modifications for increasing the maximum permissible switched current
- H03K17/122—Modifications for increasing the maximum permissible switched current in field-effect transistor switches
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/16—Modifications for eliminating interference voltages or currents
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/16—Modifications for eliminating interference voltages or currents
- H03K17/161—Modifications for eliminating interference voltages or currents in field-effect transistor switches
- H03K17/165—Modifications for eliminating interference voltages or currents in field-effect transistor switches by feedback from the output circuit to the control circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48105—Connecting bonding areas at different heights
- H01L2224/48106—Connecting bonding areas at different heights the connector being orthogonal to a side surface of the semiconductor or solid-state body, e.g. parallel layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
- H03K2017/6875—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors using self-conductive, depletion FETs
Landscapes
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- Electronic Switches (AREA)
- Power Conversion In General (AREA)
- Inverter Devices (AREA)
Description
第1の態様では、回路が、少なくとも第1のリードを有する電子構成要素パッケージを備え、電子構成要素パッケージは、ドレイン、ゲート、及びソースを有するIII‐N装置を含み、ソースが第1のリードに接続されている。回路は、第1及び第2の端子を有するゲートドライバを更に備え、第1の端子は第1のリードに接続され、フェライトビーズが、III‐Nトランジスタのゲートとゲートドライバの第2の端子との間に接続されている。
Claims (20)
- 第1のリード、第2のリード、及び第3のリードを備えた電子構成要素ICパッケージと、
前記電子構成要素ICパッケージ内に入れられたIII‐N装置であって、前記III‐N装置はディプリーションモードIII‐Nトランジスタ及びエンハンスメントモードトランジスタを備え、前記ディプリーションモードIII‐Nトランジスタは第1のドレイン、第1のゲート、及び第1のソースを備え、前記エンハンスメントモードトランジスタは第2のドレイン、第2のゲート、及び第2のソースを備え、前記ディプリーションモードIII‐Nトランジスタの前記第1のゲート及び前記エンハンスメントモードトランジスタの前記第2のソースはそれぞれ前記第1のリードに接続され、前記第1のドレインは前記第3のリードに接続された、III‐N装置と、
前記電子構成要素ICパッケージの前記第2のリードに接続されたゲートドライバと、
前記電子構成要素ICパッケージ内に入れられ、且つ、
前記エンハンスメントモードトランジスタの前記第2のゲートと前記第2のリードとの間に接続されたフェライトビーズと、
を備え、
前記ディプリーションモードIII‐Nトランジスタの前記第1のソースは、前記エンハンスメントモードトランジスタの前記第2のドレインに接続された、回路。 - 前記電子構成要素ICパッケージは導電性構造ベースを更に備え、前記ディプリーションモードIII‐NトランジスタはラテラルIII‐Nトランジスタであり、前記III‐Nトランジスタの前記第1のゲートは前記電子構成要素ICパッケージの前記導電性構造ベースと電気的に接続された、請求項1に記載の回路。
- 前記エンハンスメントモードトランジスタの前記第2のソースは前記導電性構造ベースと電気的に接続され、前記導電性構造ベースは前記第1のリードに直接的に接続された、請求項2に記載の回路。
- 前記ゲートドライバ、前記フェライトビーズ、前記III‐N装置、及び前記第1のリードはゲートループを形成し、前記第1のリードは寄生インダクタンスを有し、前記フェライトビーズは、前記寄生インダクタンスによる前記ゲートループにおける振動及び電磁干渉を低減するように構成された、請求項1に記載の回路。
- 前記III‐N装置及び前記電子構成要素ICパッケージはローサイドスイッチを形成し、前記第1のリードはグランドノードに接続され、前記回路は前記第3のリードと高電圧ノードとの間に接続されたハイサイドスイッチを更に備え、前記ハイサイドスイッチは前記ゲートドライバの第3の端子に接続されたハイサイドゲートを備えた、請求項1に記載の回路。
- 前記ゲートドライバに接続されたプロセッサと、
前記プロセッサによって実行されたときに、前記プロセッサに、前記回路をハーフブリッジとして動作させるように前記ゲートドライバを制御させる、実行可能な指示命令を記憶しているメモリと、
を備える、請求項5に記載の回路。 - 前記ゲートドライバは、前記電子構成要素ICパッケージの前記第1のリードに接続された第1の端子と、前記電子構成要素ICパッケージの前記第2のリードに接続された第2の端子と、を更に備え、
前記ゲートドライバは、前記第1の端子に対して前記第2の端子にローサイド制御信号を印加し且つ前記ゲートドライバの第4の端子に対して前記第3の端子にハイサイド制御信号を印加するように構成され、前記第4の端子は前記ハイサイドスイッチのハイサイドソースに接続された、
請求項5に記載の回路。 - 前記グランドノードに対する前記高電圧ノードにおける電圧は約400V以上である、請求項7に記載の回路。
- 前記ゲートドライバは前記第1の端子に対して前記第2の端子に、30kHzと10MHzの間の周波数を有する制御信号を印加するように構成された、請求項8に記載の回路。
- 前記ハイサイドゲートと前記ゲートドライバの前記第3の端子との間に接続された第2のフェライトビーズを更に備えた、請求項5に記載の回路。
- 前記フェライトビーズが、100MHzより上の周波数を有する電磁干渉を遮断するように構成された、受動的なローパスフィルタを形成している、請求項1に記載の回路。
- 第1のリード、第2のリード、及び第3のリードを含む電子ICパッケージと、
前記電子ICパッケージ内に入れられ、ゲートを備えたIII‐Nスイッチング装置と、
前記電子ICパッケージ内に入れられ、前記ゲートと前記第1のリードとの間に接続されたフェライトビーズと、
を備え、
前記III‐Nスイッチング装置はディプリーションモードIII‐Nトランジスタ及びエンハンスメントモードトランジスタを備え、前記ゲートは前記エンハンスメントモードトランジスタの第1のゲートである、
電子構成要素。 - 前記電子ICパッケージは導電性ベースを更に備え、前記ディプリーションモードIII‐Nトランジスタは第2のゲートを備えたラテラルIII‐Nトランジスタであり、前記III‐Nトランジスタの前記第2のゲートは前記電子ICパッケージの前記導電性ベースと電気的に接続された、請求項12に記載の電子構成要素。
- 前記ディプリーションモードIII‐Nトランジスタ及び前記フェライトビーズは共に、前記導電性ベースに直接的に取り付けられた、請求項13に記載の電子構成要素。
- 前記フェライトビーズと前記ゲートとの間の第1のワイヤー接合、及び前記フェライトビーズと前記第1のリードとの間の第2のワイヤー接合を備えた、請求項12に記載の電子構成要素。
- 前記ディプリーションモードIII‐Nトランジスタは、前記電子ICパッケージの前記第2のリードに接続されたゲート、及び前記第3のリードに接続されたドレインを備え、
前記電子ICパッケージは、直接的にソースをゲートドライバに接続するために、前記エンハンスメントモードトランジスタのソースに接続された第4のリードを含む、
請求項12に記載の電子構成要素。 - 第1のリードを含む電子ICパッケージと、
共に前記電子ICパッケージ内に入れられたディプリーションモードIII‐Nトランジスタ及びエンハンスメントモードトランジスタと、
前記電子ICパッケージ内に入れられたフェライトビーズであって、前記エンハンスメントモードトランジスタのゲート電極と前記第1のリードとの間に接続されたフェライトビーズと、
を備え、
前記エンハンスメントモードトランジスタのソース電極は前記ディプリーションモードIII‐Nトランジスタのゲート電極と電気的に接続され、前記エンハンスメントモードトランジスタのドレイン電極は前記ディプリーションモードIII‐Nトランジスタのソース電極と電気的に接続された、
電子構成要素。 - 前記エンハンスメントモードトランジスタの前記ソース電極は前記電子ICパッケージの第2のリードに接続され、前記ディプリーションモードIII‐Nトランジスタのドレイン電極は前記電子ICパッケージの第3のリードに接続された、請求項17に記載の電子構成要素。
- 前記電子ICパッケージは導電性ベースを含み、前記エンハンスメントモードトランジスタの前記ソース電極は前記導電性ベースと電気的に接続された、請求項17に記載の電子構成要素。
- 前記ディプリーションモードIII‐Nトランジスタ及び前記フェライトビーズは共に前記導電性ベースに直接的に取り付けられた、請求項19に記載の電子構成要素。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/323,777 | 2014-07-03 | ||
US14/323,777 US9543940B2 (en) | 2014-07-03 | 2014-07-03 | Switching circuits having ferrite beads |
JP2017521045A JP6647294B2 (ja) | 2014-07-03 | 2015-07-02 | フェライトビーズを有するスイッチング回路 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017521045A Division JP6647294B2 (ja) | 2014-07-03 | 2015-07-02 | フェライトビーズを有するスイッチング回路 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020074562A JP2020074562A (ja) | 2020-05-14 |
JP6909881B2 true JP6909881B2 (ja) | 2021-07-28 |
Family
ID=55017766
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017521045A Active JP6647294B2 (ja) | 2014-07-03 | 2015-07-02 | フェライトビーズを有するスイッチング回路 |
JP2020003415A Active JP6909881B2 (ja) | 2014-07-03 | 2020-01-14 | フェライトビーズを有するスイッチング回路 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017521045A Active JP6647294B2 (ja) | 2014-07-03 | 2015-07-02 | フェライトビーズを有するスイッチング回路 |
Country Status (4)
Country | Link |
---|---|
US (3) | US9543940B2 (ja) |
JP (2) | JP6647294B2 (ja) |
CN (2) | CN106716630B (ja) |
WO (1) | WO2016004338A1 (ja) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9660639B2 (en) * | 2012-12-21 | 2017-05-23 | Gan Systems Inc. | Distributed driver circuitry integrated with GaN power transistors |
WO2015009514A1 (en) | 2013-07-19 | 2015-01-22 | Transphorm Inc. | Iii-nitride transistor including a p-type depleting layer |
US9543940B2 (en) | 2014-07-03 | 2017-01-10 | Transphorm Inc. | Switching circuits having ferrite beads |
US9590494B1 (en) * | 2014-07-17 | 2017-03-07 | Transphorm Inc. | Bridgeless power factor correction circuits |
WO2017203186A1 (fr) * | 2016-05-26 | 2017-11-30 | Exagan | Circuit intégré comprenant une puce formée d'un transistor à haute tension et comprenant une puce formée d'un transistor à basse tension |
JP6645924B2 (ja) * | 2016-07-12 | 2020-02-14 | 株式会社東芝 | 半導体装置及び電力変換装置 |
FR3059497A1 (fr) * | 2016-11-25 | 2018-06-01 | Exagan | Procede et circuit de commande d'un dispositif de commutation d'un circuit de puissance |
CN106941325A (zh) * | 2017-03-08 | 2017-07-11 | 中国矿业大学 | 一种提高碳化硅h桥逆变器稳定性与降低损耗的方法 |
WO2019027442A1 (en) * | 2017-08-01 | 2019-02-07 | Cummins Inc. | LOGIC CONTROL CIRCUIT FOR CONNECTING MULTIPLE HIGH SIDE LOADS IN A MOTOR CONTROL MODULE |
CN107527899B (zh) * | 2017-08-24 | 2019-11-22 | 广东美的制冷设备有限公司 | 功率组件、功率组件的制造方法及氮化镓智能功率模块 |
EP3462479B1 (en) * | 2017-10-02 | 2020-12-09 | General Electric Technology GmbH | Semiconductor assembly with fault protection |
US10630285B1 (en) | 2017-11-21 | 2020-04-21 | Transphorm Technology, Inc. | Switching circuits having drain connected ferrite beads |
US10090751B1 (en) * | 2018-02-21 | 2018-10-02 | Ixys, Llc | Gate driver for switching converter having body diode power loss minimization |
CN108667280A (zh) * | 2018-05-17 | 2018-10-16 | 电子科技大学 | 一种基于nmos管h桥的铁氧体移相与开关器件驱动电路 |
US10224817B1 (en) * | 2018-07-19 | 2019-03-05 | Navitas Semiconductor, Inc. | Power transistor control signal gating |
CN109067228A (zh) * | 2018-08-06 | 2018-12-21 | 西北工业大学 | 一种基于氮化镓功率器件的驱动器及印刷电路布局 |
US10756207B2 (en) | 2018-10-12 | 2020-08-25 | Transphorm Technology, Inc. | Lateral III-nitride devices including a vertical gate module |
WO2020191357A1 (en) | 2019-03-21 | 2020-09-24 | Transphorm Technology, Inc. | Integrated design for iii-nitride devices |
US11749656B2 (en) | 2020-06-16 | 2023-09-05 | Transphorm Technology, Inc. | Module configurations for integrated III-Nitride devices |
JP2023537713A (ja) | 2020-08-05 | 2023-09-05 | トランスフォーム テクノロジー,インコーポレーテッド | 空乏層を有するiii族窒化物デバイス |
CN112165313B (zh) * | 2020-09-23 | 2023-07-25 | 西安交通大学 | 一种基于雪崩管的高幅值高重频快脉冲产生电路 |
EP3982404A1 (en) * | 2020-10-07 | 2022-04-13 | Infineon Technologies Austria AG | Semiconductor module |
JPWO2022264851A1 (ja) * | 2021-06-17 | 2022-12-22 | ||
CN113659971B (zh) * | 2021-06-29 | 2023-09-29 | 北京无线电测量研究所 | 一种铁氧体开关驱动器 |
WO2024101141A1 (ja) * | 2022-11-11 | 2024-05-16 | ローム株式会社 | 電子部品、および、半導体装置 |
WO2024196166A1 (ko) * | 2023-03-21 | 2024-09-26 | 루시드마이크로시스템즈 주식회사 | 갈륨나이트라이드 소자의 구동장치 및 구동방법 |
CN116314321B (zh) * | 2023-03-24 | 2024-08-09 | 厦门市三安集成电路有限公司 | 一种hemt射频器件及其制作方法 |
CN117096149B (zh) * | 2023-10-20 | 2023-12-22 | 广东仁懋电子有限公司 | 一种氮化稼器件及其制造方法 |
CN117747248A (zh) * | 2023-12-26 | 2024-03-22 | 北京理工大学 | 一种电磁作动器及其驱动电路 |
Family Cites Families (159)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55149871A (en) | 1978-07-31 | 1980-11-21 | Fujitsu Ltd | Line voltage detector |
JPS55136726A (en) | 1979-04-11 | 1980-10-24 | Nec Corp | High voltage mos inverter and its drive method |
US4665508A (en) | 1985-05-23 | 1987-05-12 | Texas Instruments Incorporated | Gallium arsenide MESFET memory |
US4717863A (en) * | 1986-02-18 | 1988-01-05 | Zeiler Kenneth T | Frequency modulation ballast circuit |
US4728826A (en) | 1986-03-19 | 1988-03-01 | Siemens Aktiengesellschaft | MOSFET switch with inductive load |
JPH0667744B2 (ja) | 1986-10-24 | 1994-08-31 | 本田技研工業株式会社 | 不整地走行車両における燃料供給装置の配置構造 |
US4808853A (en) | 1987-11-25 | 1989-02-28 | Triquint Semiconductor, Inc. | Tristate output circuit with selectable output impedance |
US4864479A (en) | 1988-03-07 | 1989-09-05 | General Electric Company | Full-bridge lossless switching converter |
JP2901091B2 (ja) | 1990-09-27 | 1999-06-02 | 株式会社日立製作所 | 半導体装置 |
US6143582A (en) | 1990-12-31 | 2000-11-07 | Kopin Corporation | High density electronic circuit modules |
JPH0575040A (ja) | 1991-09-13 | 1993-03-26 | Fujitsu Ltd | 半導体集積回路装置 |
JPH0575040U (ja) | 1992-03-13 | 1993-10-12 | 日信工業株式会社 | 負圧倍力装置 |
JPH0667744A (ja) | 1992-08-18 | 1994-03-11 | Fujitsu Ltd | 定電圧回路 |
US5379209A (en) | 1993-02-09 | 1995-01-03 | Performance Controls, Inc. | Electronic switching circuit |
US5493487A (en) | 1993-02-09 | 1996-02-20 | Performance Controls, Inc. | Electronic switching circuit |
US5637922A (en) | 1994-02-07 | 1997-06-10 | General Electric Company | Wireless radio frequency power semiconductor devices using high density interconnect |
JP3429921B2 (ja) | 1995-10-26 | 2003-07-28 | 三菱電機株式会社 | 半導体装置 |
US20020190389A1 (en) * | 1995-11-15 | 2002-12-19 | Koenck Steven E. | Reduction of electromagnetic interference in integrated circuit device packages |
JP3665419B2 (ja) | 1996-05-02 | 2005-06-29 | 新電元工業株式会社 | 誘導性負荷駆動方法、及びhブリッジ回路制御装置 |
US6172550B1 (en) | 1996-08-16 | 2001-01-09 | American Superconducting Corporation | Cryogenically-cooled switching circuit |
US6008684A (en) | 1996-10-23 | 1999-12-28 | Industrial Technology Research Institute | CMOS output buffer with CMOS-controlled lateral SCR devices |
US5789951A (en) | 1997-01-31 | 1998-08-04 | Motorola, Inc. | Monolithic clamping circuit and method of preventing transistor avalanche breakdown |
JP3731358B2 (ja) | 1998-09-25 | 2006-01-05 | 株式会社村田製作所 | 高周波電力増幅回路 |
US6107844A (en) | 1998-09-28 | 2000-08-22 | Tripath Technology, Inc. | Methods and apparatus for reducing MOSFET body diode conduction in a half-bridge configuration |
JP3275851B2 (ja) | 1998-10-13 | 2002-04-22 | 松下電器産業株式会社 | 高周波集積回路 |
JP3049427B2 (ja) | 1998-10-21 | 2000-06-05 | 株式会社ハイデン研究所 | 正負パルス式高周波スイッチング電源 |
DE19902520B4 (de) | 1999-01-22 | 2005-10-06 | Siemens Ag | Hybrid-Leistungs-MOSFET |
US6395593B1 (en) | 1999-05-06 | 2002-05-28 | Texas Instruments Incorporated | Method of manufacturing high side and low side guard rings for lowest parasitic performance in an H-bridge configuration |
US6864131B2 (en) | 1999-06-02 | 2005-03-08 | Arizona State University | Complementary Schottky junction transistors and methods of forming the same |
JP3458768B2 (ja) | 1999-06-10 | 2003-10-20 | 株式会社デンソー | 負荷駆動装置 |
JP4138192B2 (ja) * | 1999-12-27 | 2008-08-20 | 三菱電機株式会社 | 半導体スイッチ装置 |
US6424101B1 (en) | 2000-12-05 | 2002-07-23 | Koninklijke Philips Electronics N.V. | Electronic ballast with feed-forward control |
US6556053B2 (en) | 2001-02-06 | 2003-04-29 | Harman International Industries, Incorporated | Half-bridge gate driver optimized for hard-switching |
US6455905B1 (en) | 2001-04-05 | 2002-09-24 | Ericsson Inc. | Single chip push-pull power transistor device |
US6650169B2 (en) | 2001-10-01 | 2003-11-18 | Koninklijke Philips Electronics N.V. | Gate driver apparatus having an energy recovering circuit |
JP2003244943A (ja) | 2002-02-13 | 2003-08-29 | Honda Motor Co Ltd | 電源装置の昇圧装置 |
US7122884B2 (en) | 2002-04-16 | 2006-10-17 | Fairchild Semiconductor Corporation | Robust leaded molded packages and methods for forming the same |
DE10219760A1 (de) | 2002-05-02 | 2003-11-20 | Eupec Gmbh & Co Kg | Halbbrückenschaltung |
JP3731562B2 (ja) | 2002-05-22 | 2006-01-05 | 日産自動車株式会社 | 電流制御型素子用駆動回路 |
US6791159B2 (en) * | 2002-06-03 | 2004-09-14 | Sumitomo Electric Industries, Ltd. | Optical module |
JP4479168B2 (ja) * | 2002-06-03 | 2010-06-09 | 住友電気工業株式会社 | 光モジュール |
US6975023B2 (en) | 2002-09-04 | 2005-12-13 | International Rectifier Corporation | Co-packaged control circuit, transistor and inverted diode |
JP4142922B2 (ja) * | 2002-09-12 | 2008-09-03 | 株式会社ルネサステクノロジ | ストロボ制御回路、igbtデバイス、半導体装置および電子機器 |
AU2003263510A1 (en) | 2002-10-29 | 2004-05-25 | Koninklijke Philips Electronics N.V. | Bi-directional double nmos switch |
US6859087B2 (en) * | 2002-10-31 | 2005-02-22 | International Rectifier Corporation | Half-bridge high voltage gate driver providing protection of a transistor |
JP4385205B2 (ja) | 2002-12-16 | 2009-12-16 | 日本電気株式会社 | 電界効果トランジスタ |
US6825559B2 (en) | 2003-01-02 | 2004-11-30 | Cree, Inc. | Group III nitride based flip-chip intergrated circuit and method for fabricating |
TW583636B (en) | 2003-03-11 | 2004-04-11 | Toppoly Optoelectronics Corp | Source follower capable of compensating the threshold voltage |
JP4241106B2 (ja) | 2003-03-12 | 2009-03-18 | シャープ株式会社 | 半導体装置及びその製造方法 |
JP4531343B2 (ja) | 2003-03-26 | 2010-08-25 | 株式会社半導体エネルギー研究所 | 駆動回路 |
GB0308674D0 (en) | 2003-04-15 | 2003-05-21 | Koninkl Philips Electronics Nv | Driver for inductive load |
US6850423B2 (en) | 2003-05-30 | 2005-02-01 | Comarco Wireless Technologies, Inc. | Common mode noise cancellation circuit |
JP2004364345A (ja) * | 2003-06-02 | 2004-12-24 | Hitachi Home & Life Solutions Inc | インバータパワーモジュール |
JP4248953B2 (ja) | 2003-06-30 | 2009-04-02 | 株式会社ルネサステクノロジ | 半導体装置およびその製造方法 |
EP1494354B1 (en) | 2003-07-04 | 2010-12-01 | Dialog Semiconductor GmbH | High-voltage interface and driver control circuit |
JP3973638B2 (ja) | 2003-09-05 | 2007-09-12 | 三洋電機株式会社 | 電源ユニット及びこれを有する電源システム |
US7501669B2 (en) | 2003-09-09 | 2009-03-10 | Cree, Inc. | Wide bandgap transistor devices with field plates |
US6900657B2 (en) | 2003-09-24 | 2005-05-31 | Saia-Burgess Automotive, Inc. | Stall detection circuit and method |
US7166867B2 (en) | 2003-12-05 | 2007-01-23 | International Rectifier Corporation | III-nitride device with improved layout geometry |
US7193396B2 (en) | 2003-12-24 | 2007-03-20 | Potentia Semiconductor Corporation | DC converters having buck or boost configurations |
US7382001B2 (en) | 2004-01-23 | 2008-06-03 | International Rectifier Corporation | Enhancement mode III-nitride FET |
US7550781B2 (en) | 2004-02-12 | 2009-06-23 | International Rectifier Corporation | Integrated III-nitride power devices |
US7465997B2 (en) | 2004-02-12 | 2008-12-16 | International Rectifier Corporation | III-nitride bidirectional switch |
US7199636B2 (en) | 2004-03-31 | 2007-04-03 | Matsushita Electric Industrial Co., Ltd. | Active diode |
JP2006032552A (ja) | 2004-07-14 | 2006-02-02 | Toshiba Corp | 窒化物含有半導体装置 |
JP2006033723A (ja) | 2004-07-21 | 2006-02-02 | Sharp Corp | 電力制御用光結合素子およびこの電力制御用光結合素子を用いた電子機器 |
US7227198B2 (en) | 2004-08-11 | 2007-06-05 | International Rectifier Corporation | Half-bridge package |
JP4637553B2 (ja) | 2004-11-22 | 2011-02-23 | パナソニック株式会社 | ショットキーバリアダイオード及びそれを用いた集積回路 |
CN100359686C (zh) | 2004-11-30 | 2008-01-02 | 万代半导体元件(上海)有限公司 | 金属氧化物半导体场效应晶体管和肖特基二极管结合的瘦小外形封装 |
JP2006173754A (ja) | 2004-12-13 | 2006-06-29 | Oki Electric Ind Co Ltd | 高周波スイッチ |
US7116567B2 (en) | 2005-01-05 | 2006-10-03 | Velox Semiconductor Corporation | GaN semiconductor based voltage conversion device |
US7239108B2 (en) | 2005-01-31 | 2007-07-03 | Texas Instruments Incorporated | Method for stepper motor position referencing |
US7612602B2 (en) | 2005-01-31 | 2009-11-03 | Queen's University At Kingston | Resonant gate drive circuits |
US7745930B2 (en) | 2005-04-25 | 2010-06-29 | International Rectifier Corporation | Semiconductor device packages with substrates for redistributing semiconductor device electrodes |
US7368980B2 (en) | 2005-04-25 | 2008-05-06 | Triquint Semiconductor, Inc. | Producing reference voltages using transistors |
US7408399B2 (en) | 2005-06-27 | 2008-08-05 | International Rectifier Corporation | Active driving of normally on, normally off cascoded configuration devices through asymmetrical CMOS |
US7855401B2 (en) | 2005-06-29 | 2010-12-21 | Cree, Inc. | Passivation of wide band-gap based semiconductor devices with hydrogen-free sputtered nitrides |
JP4730529B2 (ja) | 2005-07-13 | 2011-07-20 | サンケン電気株式会社 | 電界効果トランジスタ |
US7548112B2 (en) | 2005-07-21 | 2009-06-16 | Cree, Inc. | Switch mode power amplifier using MIS-HEMT with field plate extension |
JP2007059595A (ja) | 2005-08-24 | 2007-03-08 | Toshiba Corp | 窒化物半導体素子 |
US7482788B2 (en) | 2005-10-12 | 2009-01-27 | System General Corp. | Buck converter for both full load and light load operations |
US7489166B2 (en) | 2005-11-15 | 2009-02-10 | International Rectifier Corporation | Gate drive for lower switching noise emission |
US7932539B2 (en) | 2005-11-29 | 2011-04-26 | The Hong Kong University Of Science And Technology | Enhancement-mode III-N devices, circuits, and methods |
US8018056B2 (en) | 2005-12-21 | 2011-09-13 | International Rectifier Corporation | Package for high power density devices |
JP5065595B2 (ja) | 2005-12-28 | 2012-11-07 | 株式会社東芝 | 窒化物系半導体装置 |
JP2007215331A (ja) | 2006-02-10 | 2007-08-23 | Hitachi Ltd | 昇圧回路 |
US7521907B2 (en) | 2006-03-06 | 2009-04-21 | Enpirion, Inc. | Controller for a power converter and method of operating the same |
JP2007242853A (ja) | 2006-03-08 | 2007-09-20 | Sanken Electric Co Ltd | 半導体基体及びこれを使用した半導体装置 |
JP2007294769A (ja) | 2006-04-26 | 2007-11-08 | Toshiba Corp | 窒化物半導体素子 |
US20080017998A1 (en) | 2006-07-19 | 2008-01-24 | Pavio Jeanne S | Semiconductor component and method of manufacture |
US7893676B2 (en) | 2006-07-20 | 2011-02-22 | Enpirion, Inc. | Driver for switch and a method of driving the same |
US7649414B2 (en) * | 2006-08-10 | 2010-01-19 | Texas Instruments Incorporated | Methods and apparatus to reduce substrate voltage bounces and spike voltages in switching amplifiers |
US7902809B2 (en) | 2006-11-28 | 2011-03-08 | International Rectifier Corporation | DC/DC converter including a depletion mode power switch |
US7863877B2 (en) | 2006-12-11 | 2011-01-04 | International Rectifier Corporation | Monolithically integrated III-nitride power converter |
JP2008164796A (ja) | 2006-12-27 | 2008-07-17 | Sony Corp | 画素回路および表示装置とその駆動方法 |
US7378883B1 (en) | 2007-01-03 | 2008-05-27 | Tpo Displays Corp. | Source follower and electronic system utilizing the same |
US8014110B2 (en) | 2007-01-22 | 2011-09-06 | Johnson Controls Technology Company | Variable speed drive with integral bypass contactor |
US8188596B2 (en) | 2007-02-09 | 2012-05-29 | Infineon Technologies Ag | Multi-chip module |
JP2008199771A (ja) | 2007-02-13 | 2008-08-28 | Fujitsu Ten Ltd | 昇圧回路制御装置、及び昇圧回路 |
KR101391925B1 (ko) | 2007-02-28 | 2014-05-07 | 페어차일드코리아반도체 주식회사 | 반도체 패키지 및 이를 제조하기 위한 반도체 패키지 금형 |
WO2008129071A1 (en) | 2007-04-24 | 2008-10-30 | Ingenium Pharmaceuticals Gmbh | Inhibitors of protein kinases |
US7453107B1 (en) | 2007-05-04 | 2008-11-18 | Dsm Solutions, Inc. | Method for applying a stress layer to a semiconductor device and device formed therefrom |
US7719055B1 (en) | 2007-05-10 | 2010-05-18 | Northrop Grumman Systems Corporation | Cascode power switch topologies |
US7477082B2 (en) | 2007-05-15 | 2009-01-13 | Freescale Semiconductor, Inc. | Method and circuit for driving H-bridge that reduces switching noise |
JP2008288289A (ja) | 2007-05-16 | 2008-11-27 | Oki Electric Ind Co Ltd | 電界効果トランジスタとその製造方法 |
JP4478175B2 (ja) | 2007-06-26 | 2010-06-09 | 株式会社東芝 | 半導体装置 |
JP4775859B2 (ja) | 2007-08-24 | 2011-09-21 | シャープ株式会社 | 窒化物半導体装置とそれを含む電力変換装置 |
EP2887402B1 (en) | 2007-09-12 | 2019-06-12 | Transphorm Inc. | III-nitride bidirectional switches |
US7795642B2 (en) | 2007-09-14 | 2010-09-14 | Transphorm, Inc. | III-nitride devices with recessed gates |
US20090072269A1 (en) | 2007-09-17 | 2009-03-19 | Chang Soo Suh | Gallium nitride diodes and integrated components |
US7915643B2 (en) | 2007-09-17 | 2011-03-29 | Transphorm Inc. | Enhancement mode gallium nitride power devices |
JP4528321B2 (ja) | 2007-09-26 | 2010-08-18 | シャープ株式会社 | スイッチング回路、回路、並びにスイッチング回路及び駆動パルス生成回路を含む回路 |
US7851825B2 (en) | 2007-12-10 | 2010-12-14 | Transphorm Inc. | Insulated gate e-mode transistors |
JP5130906B2 (ja) | 2007-12-26 | 2013-01-30 | サンケン電気株式会社 | スイッチ装置 |
US8063616B2 (en) | 2008-01-11 | 2011-11-22 | International Rectifier Corporation | Integrated III-nitride power converter circuit |
US7639064B2 (en) | 2008-01-21 | 2009-12-29 | Eutech Microelectronic Inc. | Drive circuit for reducing inductive kickback voltage |
US7965126B2 (en) | 2008-02-12 | 2011-06-21 | Transphorm Inc. | Bridge circuits and their components |
JP2009200338A (ja) | 2008-02-22 | 2009-09-03 | Renesas Technology Corp | 半導体装置の製造方法 |
US7920013B2 (en) | 2008-04-18 | 2011-04-05 | Linear Technology Corporation | Systems and methods for oscillation suppression in switching circuits |
US8519438B2 (en) | 2008-04-23 | 2013-08-27 | Transphorm Inc. | Enhancement mode III-N HEMTs |
US8957642B2 (en) | 2008-05-06 | 2015-02-17 | International Rectifier Corporation | Enhancement mode III-nitride switch with increased efficiency and operating frequency |
US8405445B2 (en) * | 2008-05-30 | 2013-03-26 | Hitachi Kokusai Electric Inc. | Switching circuit and imaging apparatus utilizing the same |
US7804328B2 (en) | 2008-06-23 | 2010-09-28 | Texas Instruments Incorporated | Source/emitter follower buffer driving a switching load and having improved linearity |
TWI371163B (en) | 2008-09-12 | 2012-08-21 | Glacialtech Inc | Unidirectional mosfet and applications thereof |
US8289065B2 (en) | 2008-09-23 | 2012-10-16 | Transphorm Inc. | Inductive load power switching circuits |
US7893791B2 (en) | 2008-10-22 | 2011-02-22 | The Boeing Company | Gallium nitride switch methodology |
US8084783B2 (en) | 2008-11-10 | 2011-12-27 | International Rectifier Corporation | GaN-based device cascoded with an integrated FET/Schottky diode device |
US7898004B2 (en) | 2008-12-10 | 2011-03-01 | Transphorm Inc. | Semiconductor heterostructure diodes |
ITMI20082356A1 (it) * | 2008-12-30 | 2010-06-30 | St Microelectronics Srl | Controllo di un sistema a commutazione risonante con monitoraggio della corrente di lavoro in una finestra di osservazione |
US8054110B2 (en) | 2009-01-20 | 2011-11-08 | University Of South Carolina | Driver circuit for gallium nitride (GaN) heterojunction field effect transistors (HFETs) |
US8193559B2 (en) | 2009-01-27 | 2012-06-05 | Infineon Technologies Austria Ag | Monolithic semiconductor switches and method for manufacturing |
US7884394B2 (en) | 2009-02-09 | 2011-02-08 | Transphorm Inc. | III-nitride devices and circuits |
US8742459B2 (en) | 2009-05-14 | 2014-06-03 | Transphorm Inc. | High voltage III-nitride semiconductor devices |
US8681518B2 (en) | 2009-07-21 | 2014-03-25 | Cree, Inc. | High speed rectifier circuit |
JP5334189B2 (ja) * | 2009-08-26 | 2013-11-06 | シャープ株式会社 | 半導体装置および電子機器 |
US8390000B2 (en) | 2009-08-28 | 2013-03-05 | Transphorm Inc. | Semiconductor devices with field plates |
US8138529B2 (en) | 2009-11-02 | 2012-03-20 | Transphorm Inc. | Package configurations for low EMI circuits |
US8389977B2 (en) | 2009-12-10 | 2013-03-05 | Transphorm Inc. | Reverse side engineered III-nitride devices |
US8816497B2 (en) | 2010-01-08 | 2014-08-26 | Transphorm Inc. | Electronic devices and components for high efficiency power circuits |
US8624662B2 (en) | 2010-02-05 | 2014-01-07 | Transphorm Inc. | Semiconductor electronic components and circuits |
US8530904B2 (en) | 2010-03-19 | 2013-09-10 | Infineon Technologies Austria Ag | Semiconductor device including a normally-on transistor and a normally-off transistor |
US8742460B2 (en) | 2010-12-15 | 2014-06-03 | Transphorm Inc. | Transistors with isolation regions |
JP5548141B2 (ja) * | 2011-01-07 | 2014-07-16 | 日立オートモティブシステムズ株式会社 | シートベルトリトラクタの制御装置 |
US8643062B2 (en) | 2011-02-02 | 2014-02-04 | Transphorm Inc. | III-N device structures and methods |
US8786327B2 (en) | 2011-02-28 | 2014-07-22 | Transphorm Inc. | Electronic components with reactive filters |
US8772842B2 (en) | 2011-03-04 | 2014-07-08 | Transphorm, Inc. | Semiconductor diodes with low reverse bias currents |
US8716141B2 (en) | 2011-03-04 | 2014-05-06 | Transphorm Inc. | Electrode configurations for semiconductor devices |
US20120241820A1 (en) * | 2011-03-21 | 2012-09-27 | International Rectifier Corporation | III-Nitride Transistor with Passive Oscillation Prevention |
US9166028B2 (en) | 2011-05-31 | 2015-10-20 | Infineon Technologies Austria Ag | Circuit configured to adjust the activation state of transistors based on load conditions |
US8441128B2 (en) | 2011-08-16 | 2013-05-14 | Infineon Technologies Ag | Semiconductor arrangement |
US8598937B2 (en) | 2011-10-07 | 2013-12-03 | Transphorm Inc. | High power semiconductor electronic components with increased reliability |
US9209176B2 (en) | 2011-12-07 | 2015-12-08 | Transphorm Inc. | Semiconductor modules and methods of forming the same |
JP2013153027A (ja) * | 2012-01-24 | 2013-08-08 | Fujitsu Ltd | 半導体装置及び電源装置 |
US8648643B2 (en) | 2012-02-24 | 2014-02-11 | Transphorm Inc. | Semiconductor power modules and devices |
CN103516038A (zh) * | 2012-06-28 | 2014-01-15 | 鸿富锦精密工业(深圳)有限公司 | 省电电路及电子装置 |
US8803246B2 (en) | 2012-07-16 | 2014-08-12 | Transphorm Inc. | Semiconductor electronic components with integrated current limiters |
JP2014075694A (ja) * | 2012-10-04 | 2014-04-24 | Renesas Electronics Corp | ゲートドライバ、及びスイッチング方法 |
JP2014120638A (ja) * | 2012-12-18 | 2014-06-30 | Rohm Co Ltd | パワーモジュール半導体装置およびその製造方法 |
US9543940B2 (en) | 2014-07-03 | 2017-01-10 | Transphorm Inc. | Switching circuits having ferrite beads |
-
2014
- 2014-07-03 US US14/323,777 patent/US9543940B2/en active Active
-
2015
- 2015-07-02 WO PCT/US2015/039041 patent/WO2016004338A1/en active Application Filing
- 2015-07-02 CN CN201580035088.3A patent/CN106716630B/zh active Active
- 2015-07-02 CN CN202010602181.0A patent/CN111785702B/zh active Active
- 2015-07-02 JP JP2017521045A patent/JP6647294B2/ja active Active
-
2016
- 2016-11-29 US US15/363,987 patent/US9660640B2/en active Active
-
2017
- 2017-04-19 US US15/491,920 patent/US9991884B2/en active Active
-
2020
- 2020-01-14 JP JP2020003415A patent/JP6909881B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
CN106716630B (zh) | 2020-08-07 |
US9543940B2 (en) | 2017-01-10 |
US9991884B2 (en) | 2018-06-05 |
US20170222640A1 (en) | 2017-08-03 |
CN111785702A (zh) | 2020-10-16 |
CN106716630A (zh) | 2017-05-24 |
US20170085258A1 (en) | 2017-03-23 |
US9660640B2 (en) | 2017-05-23 |
WO2016004338A1 (en) | 2016-01-07 |
JP2020074562A (ja) | 2020-05-14 |
JP6647294B2 (ja) | 2020-02-14 |
US20160006428A1 (en) | 2016-01-07 |
JP2017524267A (ja) | 2017-08-24 |
CN111785702B (zh) | 2024-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6909881B2 (ja) | フェライトビーズを有するスイッチング回路 | |
US9818686B2 (en) | Semiconductor modules and methods of forming the same | |
JP6130863B2 (ja) | 半導体パワーモジュール及びデバイス | |
JP5883392B2 (ja) | 低emi回路のためのパッケージ構成 | |
JP5883799B2 (ja) | 高効率電源回路のための電子デバイスおよび部品 | |
US10897249B1 (en) | Switching circuits having drain connected ferrite beads | |
US20160172279A1 (en) | Integrated Power Assembly with Reduced Form Factor and Enhanced Thermal Dissipation | |
WO2016149146A1 (en) | Paralleling of switching devices for high power circuits | |
JP6352556B1 (ja) | 半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200205 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200205 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20201026 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20201104 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210302 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210511 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210608 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210705 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6909881 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |