JP6551837B2 - ペリクルフレーム、及びこれを含むペリクル - Google Patents
ペリクルフレーム、及びこれを含むペリクル Download PDFInfo
- Publication number
- JP6551837B2 JP6551837B2 JP2015160519A JP2015160519A JP6551837B2 JP 6551837 B2 JP6551837 B2 JP 6551837B2 JP 2015160519 A JP2015160519 A JP 2015160519A JP 2015160519 A JP2015160519 A JP 2015160519A JP 6551837 B2 JP6551837 B2 JP 6551837B2
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- frame
- electrodeposition coating
- bis
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004070 electrodeposition Methods 0.000 claims description 111
- 238000000576 coating method Methods 0.000 claims description 96
- 239000011248 coating agent Substances 0.000 claims description 91
- 229920001721 polyimide Polymers 0.000 claims description 65
- 239000009719 polyimide resin Substances 0.000 claims description 58
- 239000000203 mixture Substances 0.000 claims description 27
- 229920005989 resin Polymers 0.000 claims description 22
- 239000011347 resin Substances 0.000 claims description 22
- 229920006317 cationic polymer Polymers 0.000 claims description 18
- 239000012528 membrane Substances 0.000 claims description 16
- 150000003949 imides Chemical class 0.000 claims description 14
- 238000006068 polycondensation reaction Methods 0.000 claims description 8
- 229910000838 Al alloy Inorganic materials 0.000 claims description 5
- 125000002091 cationic group Chemical group 0.000 description 40
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 34
- -1 tetracarboxylic acid dianhydride Chemical class 0.000 description 30
- 238000011282 treatment Methods 0.000 description 25
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 23
- 150000002500 ions Chemical class 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- 239000004925 Acrylic resin Substances 0.000 description 12
- 229920000178 Acrylic resin Polymers 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- 150000001412 amines Chemical class 0.000 description 11
- 238000007743 anodising Methods 0.000 description 10
- 239000012736 aqueous medium Substances 0.000 description 10
- 238000007789 sealing Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- 239000012790 adhesive layer Substances 0.000 description 9
- 239000003822 epoxy resin Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 229920000647 polyepoxide Polymers 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000000428 dust Substances 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 238000000059 patterning Methods 0.000 description 8
- 239000004642 Polyimide Substances 0.000 description 7
- 239000008199 coating composition Substances 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 238000010828 elution Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 125000002723 alicyclic group Chemical group 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 150000002576 ketones Chemical class 0.000 description 5
- 230000003472 neutralizing effect Effects 0.000 description 5
- 239000003973 paint Substances 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- 150000004984 aromatic diamines Chemical class 0.000 description 4
- 150000004985 diamines Chemical class 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 238000007689 inspection Methods 0.000 description 4
- 238000010943 off-gassing Methods 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 3
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 3
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 3
- UCQABCHSIIXVOY-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]phenoxy]aniline Chemical group NC1=CC=CC(OC=2C=CC(=CC=2)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 UCQABCHSIIXVOY-UHFFFAOYSA-N 0.000 description 3
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 3
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 3
- JYZPDAUOQGFBKT-UHFFFAOYSA-N 4-[2-[2-[2-(3,4-dicarboxyphenoxy)phenyl]propan-2-yl]phenoxy]phthalic acid Chemical compound C=1C=CC=C(OC=2C=C(C(C(O)=O)=CC=2)C(O)=O)C=1C(C)(C)C1=CC=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 JYZPDAUOQGFBKT-UHFFFAOYSA-N 0.000 description 3
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 3
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 3
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- YMHQVDAATAEZLO-UHFFFAOYSA-N cyclohexane-1,1-diamine Chemical group NC1(N)CCCCC1 YMHQVDAATAEZLO-UHFFFAOYSA-N 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 150000004658 ketimines Chemical class 0.000 description 3
- 229940018564 m-phenylenediamine Drugs 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 235000002906 tartaric acid Nutrition 0.000 description 3
- 239000011975 tartaric acid Substances 0.000 description 3
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 3
- UGCMFUQMPWJOON-UHFFFAOYSA-N (1-cycloheptylcycloheptyl)methanediamine Chemical compound C1CCCCCC1C1(C(N)N)CCCCCC1 UGCMFUQMPWJOON-UHFFFAOYSA-N 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- MNKDMOZTFOSBSA-UHFFFAOYSA-N 1-(1-aminocycloheptyl)cycloheptan-1-amine Chemical group C1CCCCCC1(N)C1(N)CCCCCC1 MNKDMOZTFOSBSA-UHFFFAOYSA-N 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 2
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 2
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical group CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 2
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 2
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 2
- LJMPOXUWPWEILS-UHFFFAOYSA-N 3a,4,4a,7a,8,8a-hexahydrofuro[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1C2C(=O)OC(=O)C2CC2C(=O)OC(=O)C21 LJMPOXUWPWEILS-UHFFFAOYSA-N 0.000 description 2
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- XDYLWBWPEDSSLU-UHFFFAOYSA-N 4-(3-carboxyphenyl)benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C(C(O)=O)=CC=2)C(O)=O)=C1 XDYLWBWPEDSSLU-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
- QHHKLPCQTTWFSS-UHFFFAOYSA-N 5-[2-(1,3-dioxo-2-benzofuran-5-yl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)(C(F)(F)F)C(F)(F)F)=C1 QHHKLPCQTTWFSS-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical group C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
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- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- OXIKYYJDTWKERT-UHFFFAOYSA-N [4-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCC(CN)CC1 OXIKYYJDTWKERT-UHFFFAOYSA-N 0.000 description 2
- 229920006243 acrylic copolymer Polymers 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
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- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- XMSVKICKONKVNM-UHFFFAOYSA-N bicyclo[2.2.1]heptane-3,4-diamine Chemical group C1CC2(N)C(N)CC1C2 XMSVKICKONKVNM-UHFFFAOYSA-N 0.000 description 2
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- XRLHAJCIEMOBLT-UHFFFAOYSA-N cyclobutane-1,1-diamine Chemical group NC1(N)CCC1 XRLHAJCIEMOBLT-UHFFFAOYSA-N 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
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- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 2
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- 230000003647 oxidation Effects 0.000 description 2
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- 239000004065 semiconductor Substances 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
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- 150000003462 sulfoxides Chemical class 0.000 description 2
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- GWNMOARSGRXJMV-UHFFFAOYSA-N (1-cycloheptylcycloheptyl)oxymethanediamine Chemical compound C1CCCCCC1C1(OC(N)N)CCCCCC1 GWNMOARSGRXJMV-UHFFFAOYSA-N 0.000 description 1
- OTJFQRMIRKXXRS-UHFFFAOYSA-N (hydroxymethylamino)methanol Chemical compound OCNCO OTJFQRMIRKXXRS-UHFFFAOYSA-N 0.000 description 1
- ZXVZGGVDYOBILI-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluoropropane Chemical compound FC(F)C(F)(F)C(F)F ZXVZGGVDYOBILI-UHFFFAOYSA-N 0.000 description 1
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- IBUPNDMHIOTKBL-UHFFFAOYSA-N 1,5-diaminopentan-2-ol Chemical compound NCCCC(O)CN IBUPNDMHIOTKBL-UHFFFAOYSA-N 0.000 description 1
- YFOOEYJGMMJJLS-UHFFFAOYSA-N 1,8-diaminonaphthalene Chemical compound C1=CC(N)=C2C(N)=CC=CC2=C1 YFOOEYJGMMJJLS-UHFFFAOYSA-N 0.000 description 1
- SAZUUDGWWJRKBO-UHFFFAOYSA-N 1-(1-aminocyclohexyl)cyclohexan-1-amine Chemical group C1CCCCC1(N)C1(N)CCCCC1 SAZUUDGWWJRKBO-UHFFFAOYSA-N 0.000 description 1
- SPJXZYLLLWOSLQ-UHFFFAOYSA-N 1-[(1-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CCCCC1(N)CC1(N)CCCCC1 SPJXZYLLLWOSLQ-UHFFFAOYSA-N 0.000 description 1
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- BBRLKRNNIMVXOD-UHFFFAOYSA-N bis[4-(3-aminophenoxy)phenyl]methanone Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)C(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 BBRLKRNNIMVXOD-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- LMGZGXSXHCMSAA-UHFFFAOYSA-N cyclodecane Chemical group C1CCCCCCCCC1 LMGZGXSXHCMSAA-UHFFFAOYSA-N 0.000 description 1
- BUHHLLHZSWAEKS-UHFFFAOYSA-N cyclodecane-1,1-diamine Chemical group NC1(N)CCCCCCCCC1 BUHHLLHZSWAEKS-UHFFFAOYSA-N 0.000 description 1
- OEKJORBYIFXKLI-UHFFFAOYSA-N cycloheptane-1,1-diamine Chemical group NC1(N)CCCCCC1 OEKJORBYIFXKLI-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- 229940043276 diisopropanolamine Drugs 0.000 description 1
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 1
- FGJLAJMGHXGFDE-UHFFFAOYSA-L disodium;2,3-dihydroxybutanedioate;dihydrate Chemical compound O.O.[Na+].[Na+].[O-]C(=O)C(O)C(O)C([O-])=O FGJLAJMGHXGFDE-UHFFFAOYSA-L 0.000 description 1
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- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- UXYBXUYUKHUNOM-UHFFFAOYSA-M ethyl(trimethyl)azanium;chloride Chemical compound [Cl-].CC[N+](C)(C)C UXYBXUYUKHUNOM-UHFFFAOYSA-M 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Chemical group C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 229940102253 isopropanolamine Drugs 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- UDGSVBYJWHOHNN-UHFFFAOYSA-N n',n'-diethylethane-1,2-diamine Chemical compound CCN(CC)CCN UDGSVBYJWHOHNN-UHFFFAOYSA-N 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KADGVXXDDWDKBX-UHFFFAOYSA-N naphthalene-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C21 KADGVXXDDWDKBX-UHFFFAOYSA-N 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- BBYQSYQIKWRMOE-UHFFFAOYSA-N naphthalene-1,2,6,7-tetracarboxylic acid Chemical compound C1=C(C(O)=O)C(C(O)=O)=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 BBYQSYQIKWRMOE-UHFFFAOYSA-N 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical group C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- OKBVMLGZPNDWJK-UHFFFAOYSA-N naphthalene-1,4-diamine Chemical compound C1=CC=C2C(N)=CC=C(N)C2=C1 OKBVMLGZPNDWJK-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- LRVQLPADDHAOGH-UHFFFAOYSA-N naphthalene-2,6-diamine;naphthalene-2,7-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21.C1=CC(N)=CC2=CC(N)=CC=C21 LRVQLPADDHAOGH-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 1
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Chemical group C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- CYPCCLLEICQOCV-UHFFFAOYSA-N phenanthrene-1,2,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C3=CC=C(C(=O)O)C(C(O)=O)=C3C=CC2=C1 CYPCCLLEICQOCV-UHFFFAOYSA-N 0.000 description 1
- UMSVUULWTOXCQY-UHFFFAOYSA-N phenanthrene-1,2,7,8-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C2C3=CC=C(C(=O)O)C(C(O)=O)=C3C=CC2=C1C(O)=O UMSVUULWTOXCQY-UHFFFAOYSA-N 0.000 description 1
- RVRYJZTZEUPARA-UHFFFAOYSA-N phenanthrene-1,2,9,10-tetracarboxylic acid Chemical compound C1=CC=C2C(C(O)=O)=C(C(O)=O)C3=C(C(O)=O)C(C(=O)O)=CC=C3C2=C1 RVRYJZTZEUPARA-UHFFFAOYSA-N 0.000 description 1
- 150000004986 phenylenediamines Chemical group 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
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- 229920000642 polymer Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
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- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229940092162 sodium tartrate dihydrate Drugs 0.000 description 1
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- 239000012780 transparent material Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
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- 229940124543 ultraviolet light absorber Drugs 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/24—Aluminium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2379/00—Other polymers having nitrogen, with or without oxygen or carbon only, in the main chain
- B32B2379/08—Polyimides
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/20—Electrolytic after-treatment
- C25D11/22—Electrolytic after-treatment for colouring layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
[1]ペリクル膜の外周を支持するペリクルフレームであって、フレームと、前記フレームの表面に形成された、ポリイミド樹脂を含む電着塗装膜と、を有するペリクルフレーム。
[3]前記電着塗装膜の厚さが、25μm以下である、[1]または[2]に記載のペリクルフレーム。
[4]前記フレームは、陽極酸化処理されたアルミニウム合金フレームである、[1]〜[3]のいずれかに記載のペリクルフレーム。
[5]前記フレームが、黒色化処理されている、[1]〜[4]のいずれかに記載のペリクルフレーム。
本発明のペリクルフレームは、フレームと、当該フレームの表面に形成された、ポリイミド樹脂を含む電着塗装膜とを有する。
本発明のペリクルフレームのフレームの形状は、ペリクルと貼り合わせるマスクの形状に合わせて適宜選択される。フレームの材質は、表面に電着塗装膜を形成可能な金属であれば特に制限されず、その例には、アルミニウム、アルミニウム合金、マグネシウム合金、チタン、真鍮、鉄、ステンレス等が含まれる。中でもアルミニウム合金が、重量、加工性、耐久性、電着塗装膜の形成容易性等の観点から好ましい。
電着塗装膜は、フレームの表面に電着塗装法により形成された膜であって、ポリイミド樹脂を含む膜である。電着塗装膜は、カチオン電着塗装法で形成された膜であってもよく、アニオン電着塗装法で形成された膜であってもよい。
カチオン電着塗装用組成物は、例えば、(A)ポリイミド樹脂と、(B)カチオン性ポリマーと、(C)中和剤と、(D)水性媒体とを含む組成物とすることができる。また、(A)ポリイミド樹脂及び(B)カチオン性ポリマーの代わりに、ポリイミド樹脂がカチオン変性された(A’)カチオン変性ポリイミド樹脂を含んでもよい。また、カチオン電着塗装用組成物は、必要に応じて(E)顔料や(F)その他の成分を含んでもよい。以下、これらの成分について説明する。
カチオン電着塗装用組成物が含むポリイミド樹脂は特に制限されない。(A)ポリイミド樹脂は、電着塗装膜の耐熱性や耐光性が高まるとの観点から、例えば下記一般式(1)で表される繰り返し単位を有する「重縮合ポリイミド樹脂」を含むことが好ましい。なお、本発明でいう「重縮合ポリイミド樹脂」とは、テトラカルボン酸二無水物とジアミンとを重縮合させて得られるポリイミド樹脂をいい、全芳香族ポリイミド類、全脂肪族ポリイミド類、半芳香族(半脂肪族)ポリイミド類のいずれかは問わない。ただし、後述の「熱架橋イミド樹脂」は含まないものとする。
(B)カチオン性ポリマーは、例えばアミノ基や、アミノ基の4級化塩等のカチオン性基を少なくとも1種含むポリマーであり得る。カチオン電着塗装用組成物が(B)カチオン性ポリマーを含む場合、前述の(A)ポリイミド樹脂に直接カチオン性基を導入しなくとも、(B)カチオン性ポリマーと(A)ポリイミド樹脂との相溶性等によって、(A)ポリイミド樹脂をフレーム表面に析出させることが可能となる。(B)カチオン性ポリマーは、例えばアクリル共重合体や、エポキシアミンアダクト樹脂等でありうる。
前述のように、カチオン電着塗装用組成物は、前述の(A)ポリイミド樹脂及び(B)カチオン性ポリマーの代わりに、(A’)カチオン変性ポリイミド樹脂を含んでもよい。カチオン電着塗装用組成物が、(A’)カチオン変性ポリイミド樹脂を含む場合、カチオン電着塗装用組成物に上述のアクリル樹脂やエポキシ樹脂等からなる(B)カチオン性ポリマーを別途含む必要がない。したがって、電着塗装膜の耐熱性がより高まりやすくなる。
カチオン電着塗装用組成物は、上述の(B)カチオン性ポリマーや、(A’)カチオン変性ポリイミド樹脂の水性媒体への分散性を向上させるための中和剤を含む。中和剤の例には、塩酸、硝酸、リン酸、ギ酸、酢酸、乳酸、コハク酸、酪酸のような無機酸または有機酸などが含まれる。中和剤は、カチオン電着塗装用組成物のpHが3〜5の範囲となるように含まれることが好ましい。
カチオン電着塗装用組成物が含む水性媒体は、イオン交換水、純水などである。水性媒体は、必要に応じて、少量のアルコール類などを含んでもよい。カチオン電着塗装用組成物が含む(D)水性媒体の量は、カチオン電着塗装用組成物の粘度等に応じて適宜選択される。
カチオン電着塗装用組成物は、カーボンブラック等の顔料を含んでもよい。ペリクルフレームが、カチオン電着塗装膜により黒色化されると、前述のようにペリクルフレーム表面に付着した塵埃を確認しやすくなる。
カチオン電着塗装用組成物は、必要に応じて、他の成分を含んでもよい。他の成分の例には、水混和性有機溶剤、界面活性剤、酸化防止剤、紫外線吸収剤などが含まれる。
電着塗装膜は、1)フレーム表面に、前述のカチオン電着塗装用組成物の膜を形成する工程と、2)得られた膜を加熱硬化および乾燥させて硬化電着塗装膜とする工程と、により形成される。
本発明のペリクルは、ペリクル膜と、前記ペリクル膜の外周を支持する前述のペリクルフレームと、前記ペリクルフレームと前記ペリクル膜とを接着させる膜接着剤と、前記ペリクルフレームと前記マスクとを接着するためのマスク接着剤とを有する。図1には、本発明のペリクルの一例が示される。ペリクル10は、ペリクル膜12と、ペリクル膜12の外周を支持するペリクルフレーム14とを有する。ペリクル膜12は、ペリクルフレーム14の一方の端面にある膜接着剤層13を介して張設されている。一方、ペリクルフレーム14をマスク(不図示)に接着させるために、ペリクルフレーム14のもう一方の端面には、マスク接着剤層15が設けられている。
JIS A7075−T6製のアルミニウムフレーム(寸法:149mm×122mm×高さ5.8mm、支持枠厚さ2mm)を用意した。当該フレームを大気中、温度250℃で20分間焼鈍した。その後、平均直径約100μmのステンレスにて、フレーム表面をショットブラスト処理した。
次いで、15質量%の硫酸の電解浴を用い、電解電圧20V、電気量10C/cm2にて当該フレームを陽極酸化した。その後、硫酸ニッケル6水和物160g/L、ホウ酸40g/L、酒石酸3g/L、及び酸化マグネシウム1g/Lが溶解した電解析出浴を用い、30℃、交流電圧15Vの定電圧電解にて、電解析出処理を6分間行った。これにより、着色したフレームが得られた。
そして、フレームを純水にて洗浄し、カチオン系ポリイミド電着塗料((株)シミズ製 エレコートPI)の入った浴槽に入れ、25℃、電圧100Vで1分間電着塗装した。電着塗装後のフレームを水洗し、100℃で15分乾燥後、180℃、30分間焼付を実施して、フレーム上に厚さ10μmの電着塗装膜が形成されたペリクルフレーム1を得た。
陽極酸化処理及び電着塗装を以下の条件で行った以外は、実施例1と同様にペリクルフレーム2を作製した。
酒石酸ナトリウム二水和物53g/L、及び水酸化ナトリウム4g/Lが溶解したアルカリ性水溶液を電解液とし、5℃、電解電圧30V、電気量10C/cm2の条件で陽極酸化を行った。
電解析出処理後のフレームを純水で洗浄し、カチオン系ポリイミド電着塗料((株)シミズ製 エレコートPI)の入った浴槽に入れた。そして、陽極にカーボン板、陰極にフレームを使用し、25℃、電圧100Vで1分電着塗装した。その後、実施例1と同様に水洗、乾燥、及び焼き付けを実施し、厚さ9μmの電着塗装膜を得た。
電着塗装の代わりに、以下の条件で封孔処理した以外は、実施例1と同様にペリクルフレーム3を作製した。
電解析出処理後のフレームを、蒸気封孔装置にいれ、相対湿度100%、2.0kg/cm2G、130℃の水蒸気を発生させながら30分間封孔処理を行った。
電着塗装の代わりに、以下の条件で封孔処理した以外は、実施例2と同様にペリクルフレーム4を作製した。
(封孔処理)
電解析出処理後のフレームを、蒸気封孔装置にいれ、相対湿度100%、2.0kg/cm2G、130℃の水蒸気を発生させながら30分間封孔処理を行った。
電着塗装時に、カチオン系ポリイミド電着塗料((株)シミズ製 エレコートPI)の代わりに、アクリル系樹脂電着塗料((株)シミズ製 エレコート ナイスロン)を使用し、陰極にカーボン板、陽極にフレームを使用した以外は、実施例1と同様に、ペリクルフレーム5を作製した。このとき、電着塗装膜の厚さは10μmであった。
1)発生ガス量の評価
実施例1、及び比較例3で作成したペリクルフレームを各々4cm程度に切断し、測定用サンプルを作製した。各測定用サンプルをそれぞれ2口のスクリューキャップが付いた太鼓型石英セルに入れ、1つのスクリューキャップに窒素を流すラインを取り付け、窒素を100mL/minで流した。さらにもう1つのスクリューキャップに捕集管(ジーエルサイエンス製TRAP TUBE、TENAX GL)を取り付けた。窒素を使用するのは、酸素があるとArFレーザにより酸素がオゾンに変化し、オゾンによって捕集管中の捕集材が劣化するため、サンプルから発生するガスが捕集できなくなることを防ぐためである。
スクリューキャップ内を完全に窒素置換後、太鼓型石英セル内の測定用サンプルにArFレーザを1000Hz、0.4mJ/cm2の条件で5分間照射した。
ArFレーザ照射により、測定用サンプル表面からガスとなって脱離した物質を捕集管に採取し、発生ガスサンプルを得た。
次いで、加熱脱着ガスクロマトグラフ質量分析計(GC−MS)を用いて捕集管で採取した物質量を発生ガス量(ウンデカン換算)として測定した。測定には株式会社島津製作所製の加熱脱着GC−MS(TDTS−2010)、ガスクロマトグラフ(GC−2010)、質量分析計(GCMS−QP2010)を使用した。結果を表1に示す。
旭化成株式会社製のジッパー付き耐熱袋(ジップロック(登録商標))に、100mlの超純水を入れた。これに、実施例1、2、および比較例1、2で作製したペリクルフレーム毎に、ペリクルフレームを3枚ずつ入れて空気を抜き、ジッパーで密閉した。この耐熱袋を、90℃の高温水槽に3時間浸漬して、ペリクルフレームに含まれる各種イオンを抽出した。抽出液に含まれる各種イオン量を、イオンクロマトグラフ分析装置(DIONEX Corporation製ICS−1000(カラム:AS9−HC))により測定した。このとき、溶離液は1mmol/LのK2CO3溶液とした。各ペリクルフレームから溶出されたイオンの種類及びその量を表2に示す。
12 ペリクル膜
13 膜接着剤層
14 ペリクルフレーム
15 マスク接着剤層
Claims (5)
- ペリクル膜の外周を支持するペリクルフレームであって、
フレームと、前記フレームの表面に形成された、ポリイミド樹脂を含む電着塗装膜と、を有し、
前記電着塗装膜が、重縮合ポリイミド樹脂、熱架橋イミド樹脂、及びカチオン性ポリマーを含む組成物の硬化膜である、
ペリクルフレーム。 - 前記電着塗装膜の厚さが、25μm以下である、請求項1に記載のペリクルフレーム。
- 前記フレームは、陽極酸化処理されたアルミニウム合金フレームである、請求項1または2に記載のペリクルフレーム。
- 前記フレームが、黒色化処理されている、請求項1〜3のいずれか一項に記載のペリクルフレーム。
- ペリクル膜と、
前記ペリクル膜の外周を支持する請求項1〜4のいずれか一項に記載のペリクルフレームと、を有する、ペリクル。
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