JP6496579B2 - 基板処理方法及び基板処理装置 - Google Patents

基板処理方法及び基板処理装置 Download PDF

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Publication number
JP6496579B2
JP6496579B2 JP2015053349A JP2015053349A JP6496579B2 JP 6496579 B2 JP6496579 B2 JP 6496579B2 JP 2015053349 A JP2015053349 A JP 2015053349A JP 2015053349 A JP2015053349 A JP 2015053349A JP 6496579 B2 JP6496579 B2 JP 6496579B2
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JP
Japan
Prior art keywords
substrate
frequency power
substrate processing
voltage
mounting table
Prior art date
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Active
Application number
JP2015053349A
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English (en)
Japanese (ja)
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JP2016174081A (ja
Inventor
利洋 東条
利洋 東条
克昌 山口
克昌 山口
康史 宇津木
康史 宇津木
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2015053349A priority Critical patent/JP6496579B2/ja
Priority to TW105107031A priority patent/TWI686844B/zh
Priority to KR1020160027463A priority patent/KR101918810B1/ko
Priority to CN201610153582.6A priority patent/CN105990194B/zh
Publication of JP2016174081A publication Critical patent/JP2016174081A/ja
Application granted granted Critical
Publication of JP6496579B2 publication Critical patent/JP6496579B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386—Separation by peeling

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
JP2015053349A 2015-03-17 2015-03-17 基板処理方法及び基板処理装置 Active JP6496579B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015053349A JP6496579B2 (ja) 2015-03-17 2015-03-17 基板処理方法及び基板処理装置
TW105107031A TWI686844B (zh) 2015-03-17 2016-03-08 基板處理方法及基板處理裝置
KR1020160027463A KR101918810B1 (ko) 2015-03-17 2016-03-08 기판 처리 방법 및 기판 처리 장치
CN201610153582.6A CN105990194B (zh) 2015-03-17 2016-03-17 基板处理方法和基板处理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015053349A JP6496579B2 (ja) 2015-03-17 2015-03-17 基板処理方法及び基板処理装置

Publications (2)

Publication Number Publication Date
JP2016174081A JP2016174081A (ja) 2016-09-29
JP6496579B2 true JP6496579B2 (ja) 2019-04-03

Family

ID=57009086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015053349A Active JP6496579B2 (ja) 2015-03-17 2015-03-17 基板処理方法及び基板処理装置

Country Status (4)

Country Link
JP (1) JP6496579B2 (ko)
KR (1) KR101918810B1 (ko)
CN (1) CN105990194B (ko)
TW (1) TWI686844B (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6851270B2 (ja) * 2017-06-16 2021-03-31 東京エレクトロン株式会社 静電吸着方法
KR102513466B1 (ko) * 2017-08-28 2023-03-23 가부시키가이샤 크리에이티브 테크놀러지 정전식 피작업물 보유 방법 및 정전식 피작업물 보유 시스템
CN111052320B (zh) * 2018-01-29 2023-04-14 株式会社爱发科 反应性离子蚀刻装置
JP7020311B2 (ja) * 2018-06-14 2022-02-16 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP7052584B2 (ja) * 2018-06-15 2022-04-12 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP7306083B2 (ja) * 2019-06-11 2023-07-11 日新電機株式会社 制御装置及び制御方法
KR102073789B1 (ko) * 2019-07-05 2020-02-05 김태화 반도체 제조 장비용 펌프 백 스트림 방지 구조
KR20210006682A (ko) * 2019-07-09 2021-01-19 세메스 주식회사 기판 처리 장치
JP2022024265A (ja) * 2020-07-13 2022-02-09 東京エレクトロン株式会社 基板離脱方法及びプラズマ処理装置
CN111933565B (zh) * 2020-09-27 2021-01-29 北京京仪自动化装备技术有限公司 用于传送机械手的晶圆吸附力调节系统及方法、手臂
CN114582763A (zh) * 2022-05-06 2022-06-03 拓荆科技(北京)有限公司 一种晶圆吸附状态的检测方法、检测装置及控制器

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06244146A (ja) * 1993-02-16 1994-09-02 Tokyo Electron Ltd プラズマ処理装置
JP4282100B2 (ja) * 1997-08-20 2009-06-17 東京エレクトロン株式会社 静電チャックにおける被吸着物の離脱方法及び静電チャック
JPH11260897A (ja) * 1998-03-12 1999-09-24 Matsushita Electric Ind Co Ltd 基板の取り扱い方法と装置、それに用いる吸着検査方法、装置
US6492612B1 (en) 1998-12-28 2002-12-10 Tokyo Electron Limited Plasma apparatus and lower electrode thereof
JP4590031B2 (ja) * 2000-07-26 2010-12-01 東京エレクトロン株式会社 被処理体の載置機構
JP2005072521A (ja) * 2003-08-28 2005-03-17 Hitachi Ltd プラズマ処理装置
JP5127147B2 (ja) * 2006-03-08 2013-01-23 東京エレクトロン株式会社 基板吸着脱離方法
KR100690136B1 (ko) * 2006-05-29 2007-03-08 우범제 정전척의 잔류 전하 제거 장치 및 제거 방법
JP5315942B2 (ja) * 2008-05-21 2013-10-16 東京エレクトロン株式会社 載置台機構、これを用いたプラズマ処理装置及び静電チャックへの電圧印加方法
JP5401343B2 (ja) * 2010-01-28 2014-01-29 株式会社日立ハイテクノロジーズ 静電チャック用電源回路、及び静電チャック装置
JP5503503B2 (ja) * 2010-11-09 2014-05-28 東京エレクトロン株式会社 プラズマ処理装置
JP2013033726A (ja) * 2011-06-27 2013-02-14 Tokyo Electron Ltd 異常検出装置及び異常検出方法
US8927985B2 (en) 2012-09-20 2015-01-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP5971144B2 (ja) * 2013-02-06 2016-08-17 東京エレクトロン株式会社 基板処理装置及び成膜方法

Also Published As

Publication number Publication date
KR101918810B1 (ko) 2018-11-14
TWI686844B (zh) 2020-03-01
CN105990194B (zh) 2019-12-06
JP2016174081A (ja) 2016-09-29
KR20160111848A (ko) 2016-09-27
CN105990194A (zh) 2016-10-05
TW201705194A (zh) 2017-02-01

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