JP6494451B2 - チャックテーブル及び洗浄装置 - Google Patents

チャックテーブル及び洗浄装置 Download PDF

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Publication number
JP6494451B2
JP6494451B2 JP2015135409A JP2015135409A JP6494451B2 JP 6494451 B2 JP6494451 B2 JP 6494451B2 JP 2015135409 A JP2015135409 A JP 2015135409A JP 2015135409 A JP2015135409 A JP 2015135409A JP 6494451 B2 JP6494451 B2 JP 6494451B2
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JP
Japan
Prior art keywords
wafer
chuck table
adhesive tape
annular frame
held
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015135409A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017017286A (ja
Inventor
秀次 新田
秀次 新田
直功 瓜田
直功 瓜田
惇 八木原
惇 八木原
和也 江角
和也 江角
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Priority to JP2015135409A priority Critical patent/JP6494451B2/ja
Priority to TW105117412A priority patent/TWI681485B/zh
Priority to KR1020160082689A priority patent/KR102435772B1/ko
Priority to CN201610522459.7A priority patent/CN106340483B/zh
Publication of JP2017017286A publication Critical patent/JP2017017286A/ja
Application granted granted Critical
Publication of JP6494451B2 publication Critical patent/JP6494451B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
JP2015135409A 2015-07-06 2015-07-06 チャックテーブル及び洗浄装置 Active JP6494451B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015135409A JP6494451B2 (ja) 2015-07-06 2015-07-06 チャックテーブル及び洗浄装置
TW105117412A TWI681485B (zh) 2015-07-06 2016-06-02 工作夾台及洗淨裝置
KR1020160082689A KR102435772B1 (ko) 2015-07-06 2016-06-30 척 테이블 및 세정 장치
CN201610522459.7A CN106340483B (zh) 2015-07-06 2016-07-05 卡盘工作台和清洗装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015135409A JP6494451B2 (ja) 2015-07-06 2015-07-06 チャックテーブル及び洗浄装置

Publications (2)

Publication Number Publication Date
JP2017017286A JP2017017286A (ja) 2017-01-19
JP6494451B2 true JP6494451B2 (ja) 2019-04-03

Family

ID=57826939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015135409A Active JP6494451B2 (ja) 2015-07-06 2015-07-06 チャックテーブル及び洗浄装置

Country Status (4)

Country Link
JP (1) JP6494451B2 (zh)
KR (1) KR102435772B1 (zh)
CN (1) CN106340483B (zh)
TW (1) TWI681485B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018167367A (ja) * 2017-03-30 2018-11-01 株式会社ディスコ 研削装置
JP6994852B2 (ja) * 2017-06-30 2022-01-14 株式会社ディスコ レーザー加工装置及びレーザー加工方法
JP7108424B2 (ja) * 2018-02-20 2022-07-28 株式会社ディスコ 保護膜形成装置
JP7217165B2 (ja) * 2019-02-14 2023-02-02 株式会社ディスコ チャックテーブル及び検査装置
JP7390615B2 (ja) 2019-12-27 2023-12-04 パナソニックＩｐマネジメント株式会社 樹脂塗布装置、樹脂膜形成方法ならびに素子チップの製造方法
JP7442342B2 (ja) 2020-02-28 2024-03-04 株式会社ディスコ 搬出方法及び搬出装置
JP2023536154A (ja) * 2020-07-31 2023-08-23 ラム リサーチ コーポレーション 低傾斜トレンチエッチングのための薄いシャドウリング

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002313891A (ja) * 2001-04-16 2002-10-25 Matsushita Electric Ind Co Ltd 基板搬送用トレーおよびその製造方法
JP2002203783A (ja) * 2001-10-18 2002-07-19 Tokyo Electron Ltd 処理方法及び処理装置
JP4373736B2 (ja) * 2003-08-27 2009-11-25 株式会社ディスコ 加工装置のチャックテーブル
JP4020938B2 (ja) * 2005-08-22 2007-12-12 東京エレクトロン株式会社 半導体ウェハ用搬送トレイおよび半導体ウェハ搬送システム
JP2007281050A (ja) * 2006-04-04 2007-10-25 Miraial Kk 半導体ウエハのウエハトレイ
JP2008283025A (ja) * 2007-05-11 2008-11-20 Disco Abrasive Syst Ltd ウエーハの分割方法
JP2009043771A (ja) * 2007-08-06 2009-02-26 Disco Abrasive Syst Ltd チャックテーブル機構および被加工物の保持方法
JP2010016147A (ja) * 2008-07-03 2010-01-21 Disco Abrasive Syst Ltd 粘着テープの貼着方法
JP5198203B2 (ja) * 2008-09-30 2013-05-15 株式会社ディスコ 加工装置
JP2010283286A (ja) 2009-06-08 2010-12-16 Disco Abrasive Syst Ltd ワーク保持装置
JP2011135026A (ja) * 2009-11-27 2011-07-07 Disco Abrasive Syst Ltd ワークユニットの保持方法および保持機構
JP5607965B2 (ja) * 2010-03-23 2014-10-15 日東電工株式会社 半導体ウエハマウント方法および半導体ウエハマウント装置
JP5554617B2 (ja) * 2010-04-12 2014-07-23 株式会社ディスコ 保持テーブル
JP5554661B2 (ja) * 2010-08-27 2014-07-23 株式会社ディスコ ダイシング加工装置
JP6059921B2 (ja) * 2012-08-31 2017-01-11 日東電工株式会社 粘着テープ貼付け方法および粘着テープ貼付け装置
JP6189700B2 (ja) * 2013-10-03 2017-08-30 株式会社ディスコ ウエーハの加工方法
JP6305750B2 (ja) * 2013-12-12 2018-04-04 株式会社ディスコ 静電気除去装置を備えた加工機
JP6276988B2 (ja) * 2013-12-27 2018-02-07 日東精機株式会社 粘着テープ貼付け方法および粘着テープ貼付け装置

Also Published As

Publication number Publication date
KR20170005762A (ko) 2017-01-16
JP2017017286A (ja) 2017-01-19
TWI681485B (zh) 2020-01-01
CN106340483A (zh) 2017-01-18
CN106340483B (zh) 2021-11-19
TW201703173A (zh) 2017-01-16
KR102435772B1 (ko) 2022-08-23

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