JP6419979B2 - シアノアルキルフルオロシランの製造方法 - Google Patents
シアノアルキルフルオロシランの製造方法 Download PDFInfo
- Publication number
- JP6419979B2 JP6419979B2 JP2017538437A JP2017538437A JP6419979B2 JP 6419979 B2 JP6419979 B2 JP 6419979B2 JP 2017538437 A JP2017538437 A JP 2017538437A JP 2017538437 A JP2017538437 A JP 2017538437A JP 6419979 B2 JP6419979 B2 JP 6419979B2
- Authority
- JP
- Japan
- Prior art keywords
- fluoride
- group
- cyanoalkylfluorosilane
- producing
- value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000000034 method Methods 0.000 claims description 13
- GPIARXZSVWTOMD-UHFFFAOYSA-N 4-[chloro(dimethyl)silyl]butanenitrile Chemical compound C[Si](C)(Cl)CCCC#N GPIARXZSVWTOMD-UHFFFAOYSA-N 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 11
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 8
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 8
- RZHGQUVEZKATLV-UHFFFAOYSA-N 4-[fluoro(dimethyl)silyl]butanenitrile Chemical compound C(#N)CCC[Si](F)(C)C RZHGQUVEZKATLV-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 229910052700 potassium Inorganic materials 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 18
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- -1 1-n-butyl Chemical group 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- 238000003682 fluorination reaction Methods 0.000 description 6
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 6
- 238000003756 stirring Methods 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000011698 potassium fluoride Substances 0.000 description 4
- 235000005074 zinc chloride Nutrition 0.000 description 4
- 239000011592 zinc chloride Substances 0.000 description 4
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 3
- 235000003270 potassium fluoride Nutrition 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000012025 fluorinating agent Substances 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 229910013870 LiPF 6 Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 239000002801 charged material Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002001 electrolyte material Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- DPYIKVADDNJMDC-UHFFFAOYSA-K potassium;zinc;trifluoride Chemical compound [F-].[F-].[F-].[K+].[Zn+2] DPYIKVADDNJMDC-UHFFFAOYSA-K 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/123—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-halogen linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B39/00—Halogenation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
Description
N≡C−(CH2)n−SiF3−xRx (I)、
のシアノアルキルフルオロシランの製造方法であって、
一般式II:
N≡C−(CH2)n−SiCl3−xRx (II)、
のシアノアルキルクロロシランを、金属フッ化物と反応させ、前記金属が周期表の元素の第1主族、並びに8つの遷移族、1B及び2Bの軽金属から選択され、
Rは、アルキル基を表し、
nは、1〜10の整数値を表し、及び
xは、0、1又は2の値を表す、
シアノアルキルフルオロシランの製造方法を提供する。
5.0g 3−シアノプロピルジメチルクロロシラン
1.6g フッ化亜鉛、乾燥
10ml アセトニトリル、乾燥
165g 3−シアノプロピルジメチルクロロシラン
68g フッ化亜鉛、無水
10g 塩化亜鉛(73mmol)
12.8g フッ化カリウム
50ml 水
24.6% K; 38% Zn; 36% F; 0.9% Cl; 0.1% H; 1.32% O
4g 3−シアノプロピルジメチルクロロシラン
1.33g フッ化亜鉛、無水
Claims (7)
- 一般式I:
N≡C−(CH2)n−SiF3−xRx (I)、 のシアノアルキルフルオロシランの製造方法であって、
一般式II:
N≡C−(CH2)n−SiCl3−xRx (II)、 のシアノアルキルクロロシランを、ZnF 2 、並びにZn及びKの混合フッ化物から選択される金属フッ化物と反応させ、
Rが、アルキル基を表し、
nが、1〜10の整数値を表し、及び
xが、0、1又は2の値を表す、
シアノアルキルフルオロシランの製造方法。 - Rが、1〜6個の炭素原子を有するアルキル基を表す、請求項1に記載の方法。
- nが、3、4又は5の値を表す、請求項1又は2に記載の方法。
- xが、2の値を表す、請求項1〜3のいずれか一項に記載の方法。
- 3−シアノプロピルジメチルクロロシランを使用し、3−シアノプロピルジメチルフルオロシランを製造する、請求項1〜4のいずれか一項に記載の方法。
- 前記シアノアルキルクロロシラン中の塩素のモル当たり、前記フッ化物中のフッ素原子のモル量に基づいて、1.00mol〜2molのフッ化物を使用する、請求項1〜5のいずれか一項に記載の方法。
- 前記反応をバルクで実施する、請求項1〜6のいずれか一項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102015222019.2A DE102015222019A1 (de) | 2015-11-09 | 2015-11-09 | Verfahren zur Herstellung von Cyanoalkylfluorsilanen |
DE102015222019.2 | 2015-11-09 | ||
PCT/EP2016/076367 WO2017080878A1 (de) | 2015-11-09 | 2016-11-02 | Verfahren zur herstellung von cyanoalkylfluorsilanen |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018502880A JP2018502880A (ja) | 2018-02-01 |
JP6419979B2 true JP6419979B2 (ja) | 2018-11-07 |
Family
ID=57223686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017538437A Expired - Fee Related JP6419979B2 (ja) | 2015-11-09 | 2016-11-02 | シアノアルキルフルオロシランの製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10100067B2 (ja) |
EP (1) | EP3218383B1 (ja) |
JP (1) | JP6419979B2 (ja) |
KR (1) | KR102017403B1 (ja) |
CN (1) | CN107207541A (ja) |
DE (1) | DE102015222019A1 (ja) |
WO (1) | WO2017080878A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109897059B (zh) * | 2019-03-18 | 2021-05-18 | 山东东岳有机硅材料股份有限公司 | 锂电池助剂3-氰丙基二甲基氟硅烷的合成方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56167693A (en) * | 1980-05-30 | 1981-12-23 | Shin Etsu Chem Co Ltd | Preparation of fluorosilane |
JPS61151015A (ja) * | 1984-12-24 | 1986-07-09 | Mitsui Toatsu Chem Inc | 部分置換フルオロシランの製造方法 |
JPH0680678A (ja) * | 1992-07-21 | 1994-03-22 | Mitsui Toatsu Chem Inc | ジシリルアセチレン化合物 |
EP0599278B1 (en) | 1992-11-27 | 1996-01-31 | MITSUI TOATSU CHEMICALS, Inc. | Process for the preparation of partially-substituted fluorosilane |
JP3208423B2 (ja) * | 1997-06-19 | 2001-09-10 | 工業技術院長 | フルオロシラン類の製造方法 |
KR101708576B1 (ko) * | 2013-06-04 | 2017-02-20 | 실라트로닉스, 인크. | 니트릴-치환된 실란 및 전해질 조성물 및 이들을 함유하는 전기화학적 장치 |
CN104892658B (zh) * | 2015-06-12 | 2017-12-01 | 张家港市国泰华荣化工新材料有限公司 | 二苯基二氟硅烷的制备方法 |
-
2015
- 2015-11-09 DE DE102015222019.2A patent/DE102015222019A1/de not_active Withdrawn
-
2016
- 2016-11-02 JP JP2017538437A patent/JP6419979B2/ja not_active Expired - Fee Related
- 2016-11-02 KR KR1020177021484A patent/KR102017403B1/ko active IP Right Grant
- 2016-11-02 EP EP16790346.7A patent/EP3218383B1/de not_active Not-in-force
- 2016-11-02 CN CN201680008096.3A patent/CN107207541A/zh active Pending
- 2016-11-02 WO PCT/EP2016/076367 patent/WO2017080878A1/de active Application Filing
- 2016-11-02 US US15/547,634 patent/US10100067B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP3218383B1 (de) | 2019-03-06 |
DE102015222019A1 (de) | 2017-05-11 |
JP2018502880A (ja) | 2018-02-01 |
WO2017080878A1 (de) | 2017-05-18 |
KR102017403B1 (ko) | 2019-09-02 |
KR20170101299A (ko) | 2017-09-05 |
CN107207541A (zh) | 2017-09-26 |
US10100067B2 (en) | 2018-10-16 |
US20180258108A1 (en) | 2018-09-13 |
EP3218383A1 (de) | 2017-09-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5974181B2 (ja) | リチウムビス(フルオロスルホニル)イミドの製造方法 | |
JP5471045B2 (ja) | イミド酸塩の製造方法 | |
CN104755418B (zh) | 用于制备含有氟磺酰基基团的酰亚胺盐的方法 | |
EP3381923A1 (en) | Novel method for preparing lithium bis(fluorosulfonyl)imide | |
CA2619346A1 (en) | Process for preparing sulfonylimides and derivatives thereof | |
KR20080069270A (ko) | 리튬이온전지용 전해액의 제조방법 및 이를 사용한리튬이온전지 | |
TW201627313A (zh) | 用來製備三〈三烷基矽基〉膦的方法 | |
JP6419979B2 (ja) | シアノアルキルフルオロシランの製造方法 | |
CN106632014B (zh) | 一种2-氨基-5-氯吡啶的制备方法 | |
JP5151121B2 (ja) | リチウムイオン電池用電解液の製造方法およびそれを用いたリチウムイオン電池 | |
KR20190061478A (ko) | 리튬 플루오로술포닐이미드의 제조방법 및 이를 이용한 리튬 플루오로술포닐이미드 | |
JP2012062331A (ja) | 高純度トリアルキルインジウム及びその製法 | |
JP5544892B2 (ja) | 2−シアノ−1,3−ジケトネート塩の製造法及びイオン液体 | |
US8487124B2 (en) | Cyclic aza-sila compounds | |
JP2008184419A (ja) | 高純度トリアルキルインジウム及びその製法 | |
JP6149668B2 (ja) | Al−N−H系化合物粉末及びその製造方法 | |
CN109705156B (zh) | 一种氟磺酰二氟磷酰亚胺锂的制备方法 | |
JP2011148752A (ja) | トリアリールボランの製造方法及びトリアリールボラン錯体の製造方法 | |
JP4822651B2 (ja) | フェノール金属塩の製造方法 | |
KR102261967B1 (ko) | 5-플루오로-1-메틸-3-디플루오로메틸-1h-피라졸-4-카브알데히드 제조 방법 | |
JP5604255B2 (ja) | アルキルスルフィニルクロライドの製造方法 | |
TW201821400A (zh) | 含氮化合物之製造方法 | |
JP2007055932A (ja) | ボラジン化合物の製造方法 | |
JP2010173945A (ja) | N−アルキルボラジンの製法 | |
JPS6293253A (ja) | 弗化オキサリルの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170720 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180514 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180518 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180803 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180914 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20181010 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6419979 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |