JP6386700B2 - 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法 - Google Patents

構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法 Download PDF

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Publication number
JP6386700B2
JP6386700B2 JP2013105491A JP2013105491A JP6386700B2 JP 6386700 B2 JP6386700 B2 JP 6386700B2 JP 2013105491 A JP2013105491 A JP 2013105491A JP 2013105491 A JP2013105491 A JP 2013105491A JP 6386700 B2 JP6386700 B2 JP 6386700B2
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Japan
Prior art keywords
film
mesopores
substrate
mesostructure
plasma etching
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Expired - Fee Related
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JP2013105491A
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English (en)
Japanese (ja)
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JP2014029476A (ja
JP2014029476A5 (enExample
Inventor
浩克 宮田
浩克 宮田
伸 北村
伸 北村
祐彦 ▲高▼橋
祐彦 ▲高▼橋
一幸 黒田
一幸 黒田
陽将 菅野
陽将 菅野
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Canon Inc
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Canon Inc
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Priority to JP2013105491A priority Critical patent/JP6386700B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Priority to RU2015103481A priority patent/RU2015103481A/ru
Priority to CN201380043698.9A priority patent/CN104583812B/zh
Priority to US14/407,605 priority patent/US10473823B2/en
Priority to EP13813172.7A priority patent/EP2870493A4/en
Priority to PCT/JP2013/068801 priority patent/WO2014007401A1/en
Priority to BR112014032796A priority patent/BR112014032796A2/pt
Priority to KR1020157002255A priority patent/KR20150052834A/ko
Publication of JP2014029476A publication Critical patent/JP2014029476A/ja
Publication of JP2014029476A5 publication Critical patent/JP2014029476A5/ja
Application granted granted Critical
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Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/107—Porous materials, e.g. for reducing the refractive index
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
JP2013105491A 2012-07-04 2013-05-17 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法 Expired - Fee Related JP6386700B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2013105491A JP6386700B2 (ja) 2012-07-04 2013-05-17 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法
CN201380043698.9A CN104583812B (zh) 2012-07-04 2013-07-03 微细结构体、光学构件、防反射膜和微细结构体制造方法
US14/407,605 US10473823B2 (en) 2012-07-04 2013-07-03 Fine structure, optical member, antireflection film, water-repellent film, substrate for mass spectrometry, phase plate, process for producing fine structure, and process for producing antireflection film
EP13813172.7A EP2870493A4 (en) 2012-07-04 2013-07-03 FINE STRUCTURE, OPTICAL ELEMENT, ANTIREFLEX FOIL, WATER REPELLENT FOIL, SUBSTRATE FOR MASS SPECTROMETRY, PHASE PLATE, METHOD FOR PRODUCING A FINE STRUCTURE AND METHOD FOR PRODUCING AN ANTIREFLEX FOIL
RU2015103481A RU2015103481A (ru) 2012-07-04 2013-07-03 Тонкая структура, оптический элемент, просветляющая пленка, водоотталкивающая пленка, подложка для масс-спектрометрии, фазовая пластинка, способ получения тонкой структуры и способ получения просветляющей пленки
PCT/JP2013/068801 WO2014007401A1 (en) 2012-07-04 2013-07-03 Fine structure, optical member, antireflection film, water-repellent film, substrate for mass spectrometry, phase plate, process for producing fine structure, and process for producing antireflection film
BR112014032796A BR112014032796A2 (pt) 2012-07-04 2013-07-03 estrutura fina, membro óptico, película antirreflexo, película repelente a água, substrato para espectrometria de massa, placa de fase, processo para produzir estrutura fina, e processo para produzir película antirreflexo
KR1020157002255A KR20150052834A (ko) 2012-07-04 2013-07-03 미세구조체, 광학 부재, 반사방지막, 발수성 막, 질량 분석용 기판, 위상판, 미세구조체의 제조 방법, 및 반사방지막의 제조 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012150232 2012-07-04
JP2012150232 2012-07-04
JP2013105491A JP6386700B2 (ja) 2012-07-04 2013-05-17 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法

Publications (3)

Publication Number Publication Date
JP2014029476A JP2014029476A (ja) 2014-02-13
JP2014029476A5 JP2014029476A5 (enExample) 2016-06-30
JP6386700B2 true JP6386700B2 (ja) 2018-09-05

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JP2013105491A Expired - Fee Related JP6386700B2 (ja) 2012-07-04 2013-05-17 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法

Country Status (8)

Country Link
US (1) US10473823B2 (enExample)
EP (1) EP2870493A4 (enExample)
JP (1) JP6386700B2 (enExample)
KR (1) KR20150052834A (enExample)
CN (1) CN104583812B (enExample)
BR (1) BR112014032796A2 (enExample)
RU (1) RU2015103481A (enExample)
WO (1) WO2014007401A1 (enExample)

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Publication number Publication date
KR20150052834A (ko) 2015-05-14
JP2014029476A (ja) 2014-02-13
EP2870493A1 (en) 2015-05-13
US20150160377A1 (en) 2015-06-11
WO2014007401A1 (en) 2014-01-09
CN104583812A (zh) 2015-04-29
US10473823B2 (en) 2019-11-12
RU2015103481A (ru) 2016-08-20
BR112014032796A2 (pt) 2017-06-27
EP2870493A4 (en) 2016-07-20
CN104583812B (zh) 2017-05-03

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