JP6382151B2 - 基板熱処理装置、基板熱処理方法、記録媒体及び熱処理状態検知装置 - Google Patents
基板熱処理装置、基板熱処理方法、記録媒体及び熱処理状態検知装置 Download PDFInfo
- Publication number
- JP6382151B2 JP6382151B2 JP2015098385A JP2015098385A JP6382151B2 JP 6382151 B2 JP6382151 B2 JP 6382151B2 JP 2015098385 A JP2015098385 A JP 2015098385A JP 2015098385 A JP2015098385 A JP 2015098385A JP 6382151 B2 JP6382151 B2 JP 6382151B2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- heat treatment
- substrate
- centroid
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0227—Applications
- H05B1/023—Industrial applications
- H05B1/0233—Industrial applications for semiconductors manufacturing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW104131061A TWI610387B (zh) | 2014-09-25 | 2015-09-21 | 基板熱處理裝置、基板熱處理方法、記錄媒體及熱處理狀態檢測裝置 |
US14/861,135 US10049905B2 (en) | 2014-09-25 | 2015-09-22 | Substrate heat treatment apparatus, substrate heat treatment method, storage medium and heat-treatment-condition detecting apparatus |
SG10201507918SA SG10201507918SA (en) | 2014-09-25 | 2015-09-23 | Substrate heat treatment apparatus, substrate heat treatment method, storage medium and heat-treatment-condition detecting apparatus |
KR1020150135284A KR102409752B1 (ko) | 2014-09-25 | 2015-09-24 | 기판 열처리 장치, 기판 열처리 방법, 기록 매체 및 열처리 상태 검지 장치 |
CN201510617497.6A CN105470165B (zh) | 2014-09-25 | 2015-09-24 | 基板热处理装置、基板热处理方法以及热处理状态检测装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014195693 | 2014-09-25 | ||
JP2014195693 | 2014-09-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016066779A JP2016066779A (ja) | 2016-04-28 |
JP6382151B2 true JP6382151B2 (ja) | 2018-08-29 |
Family
ID=55804324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015098385A Active JP6382151B2 (ja) | 2014-09-25 | 2015-05-13 | 基板熱処理装置、基板熱処理方法、記録媒体及び熱処理状態検知装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6382151B2 (ko) |
KR (1) | KR102409752B1 (ko) |
SG (1) | SG10201507918SA (ko) |
TW (1) | TWI610387B (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6683579B2 (ja) * | 2016-09-26 | 2020-04-22 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
US10446423B2 (en) * | 2016-11-19 | 2019-10-15 | Applied Materials, Inc. | Next generation warpage measurement system |
KR102467605B1 (ko) | 2017-06-28 | 2022-11-16 | 도쿄엘렉트론가부시키가이샤 | 열처리 장치, 열처리 장치의 관리 방법 및 기억 매체 |
JP7003759B2 (ja) * | 2017-06-28 | 2022-01-21 | 東京エレクトロン株式会社 | 熱処理装置、熱処理装置の管理方法及び記憶媒体 |
JP6964005B2 (ja) * | 2018-01-09 | 2021-11-10 | 東京エレクトロン株式会社 | 熱処理装置、熱板の冷却方法及びコンピュータ読み取り可能な記録媒体 |
JP6994424B2 (ja) * | 2018-04-17 | 2022-01-14 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、及び記憶媒体 |
JP7003260B2 (ja) * | 2018-06-22 | 2022-01-20 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、及び記憶媒体 |
JP2020035834A (ja) * | 2018-08-28 | 2020-03-05 | キオクシア株式会社 | 加熱処理装置および加熱処理方法 |
CN114518690A (zh) * | 2020-11-19 | 2022-05-20 | 中国科学院微电子研究所 | 晶圆工作台、光刻机及晶圆工作台温度调节方法 |
CN114520172A (zh) * | 2022-02-16 | 2022-05-20 | 北京北方华创微电子装备有限公司 | 晶圆放置状态检测方法、半导体工艺腔室和设备 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01245142A (ja) * | 1988-03-28 | 1989-09-29 | Hitachi Ltd | 予防保全装置 |
US5001423A (en) * | 1990-01-24 | 1991-03-19 | International Business Machines Corporation | Dry interface thermal chuck temperature control system for semiconductor wafer testing |
JP3581303B2 (ja) * | 2000-07-31 | 2004-10-27 | 東京エレクトロン株式会社 | 判別方法及び処理装置 |
JP4059694B2 (ja) * | 2002-03-27 | 2008-03-12 | 株式会社日立国際電気 | 基板処理装置及び半導体装置の製造方法 |
US7427329B2 (en) * | 2002-05-08 | 2008-09-23 | Asm International N.V. | Temperature control for single substrate semiconductor processing reactor |
JP3781014B2 (ja) * | 2003-03-31 | 2006-05-31 | 株式会社Sumco | シリコンウェーハ熱処理治具およびシリコンウェーハ熱処理方法 |
JP4259279B2 (ja) * | 2003-10-28 | 2009-04-30 | パナソニック株式会社 | 電子部品装着方法 |
JP2006120721A (ja) * | 2004-10-19 | 2006-05-11 | Toshiba Corp | 基板処理装置 |
JP4444090B2 (ja) | 2004-12-13 | 2010-03-31 | 東京エレクトロン株式会社 | 熱処理板の温度設定方法,熱処理板の温度設定装置,プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体 |
JP4755498B2 (ja) * | 2006-01-06 | 2011-08-24 | 東京エレクトロン株式会社 | 加熱装置及び加熱方法 |
JP4699283B2 (ja) * | 2006-05-23 | 2011-06-08 | 東京エレクトロン株式会社 | 熱処理板の温度制御方法、プログラム及び熱処理板の温度制御装置 |
JP2008053454A (ja) * | 2006-08-24 | 2008-03-06 | Dainippon Printing Co Ltd | ベーク装置およびベーク方法 |
US20090034582A1 (en) * | 2007-08-02 | 2009-02-05 | Tokyo Electron Limited Tbs Broadcast Center | Apparatus for hot plate substrate monitoring and control |
JP2009123816A (ja) * | 2007-11-13 | 2009-06-04 | Sokudo:Kk | 熱処理装置および熱処理方法 |
JP5538050B2 (ja) * | 2009-05-15 | 2014-07-02 | シャープ株式会社 | 局所加熱装置、及び局所加熱する位置の調整方法 |
JP5299442B2 (ja) * | 2011-01-18 | 2013-09-25 | 東京エレクトロン株式会社 | 基板加熱装置、基板加熱方法及び記憶媒体 |
FR2978870B1 (fr) * | 2011-08-01 | 2016-11-18 | Commissariat Energie Atomique | Dispositif de localisation de points chauds avec des fluxmetres thermiques |
-
2015
- 2015-05-13 JP JP2015098385A patent/JP6382151B2/ja active Active
- 2015-09-21 TW TW104131061A patent/TWI610387B/zh active
- 2015-09-23 SG SG10201507918SA patent/SG10201507918SA/en unknown
- 2015-09-24 KR KR1020150135284A patent/KR102409752B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TWI610387B (zh) | 2018-01-01 |
TW201626487A (zh) | 2016-07-16 |
SG10201507918SA (en) | 2016-04-28 |
JP2016066779A (ja) | 2016-04-28 |
KR102409752B1 (ko) | 2022-06-17 |
KR20160036654A (ko) | 2016-04-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6382151B2 (ja) | 基板熱処理装置、基板熱処理方法、記録媒体及び熱処理状態検知装置 | |
US10049905B2 (en) | Substrate heat treatment apparatus, substrate heat treatment method, storage medium and heat-treatment-condition detecting apparatus | |
JP6307022B2 (ja) | 基板処理装置、基板処理方法及び記録媒体 | |
JP5174098B2 (ja) | 熱処理方法及びその熱処理方法を実行させるためのプログラムを記録した記録媒体並びに熱処理装置 | |
JP5296022B2 (ja) | 熱処理方法及びその熱処理方法を実行させるためのプログラムを記録した記録媒体並びに熱処理装置 | |
JP2008198699A (ja) | 温度制御方法、温度調節器および加熱処理装置 | |
JP6487244B2 (ja) | 熱処理装置および熱処理方法 | |
KR102502024B1 (ko) | 열처리 장치, 열처리 방법 및 기억 매체 | |
JP2024038195A (ja) | 温度測定ユニット、熱処理装置及び温度測定方法 | |
JP7003260B2 (ja) | 基板処理装置、基板処理方法、及び記憶媒体 | |
TWI806953B (zh) | 控制器裝置,熱板的冷卻方法及電腦可讀取的記錄媒體 | |
JP5995892B2 (ja) | 基板を熱処理する方法、熱処理装置及びコンピュータ読み取り可能な記録媒体 | |
JP2020061420A (ja) | 基板処理装置、及び基板処理方法、及び記憶媒体 | |
TW202326927A (zh) | 基板處理裝置 | |
JP6244317B2 (ja) | 基板処理装置 | |
JP5767260B2 (ja) | 基板熱処理装置、基板熱処理方法及び基板熱処理用記録媒体 | |
JP6994424B2 (ja) | 基板処理装置、基板処理方法、及び記憶媒体 | |
JP2001102275A (ja) | 加熱処理システムおよびそれに用いる加熱処理ユニット | |
JP6937906B2 (ja) | 基板処理装置 | |
JP7093693B2 (ja) | 熱処理装置及び基板滑り検出方法 | |
JP2016207981A (ja) | 基板処理装置及び基板処理方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170425 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180222 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180313 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180423 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180703 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180801 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6382151 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |