JP2020061420A - 基板処理装置、及び基板処理方法、及び記憶媒体 - Google Patents
基板処理装置、及び基板処理方法、及び記憶媒体 Download PDFInfo
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Abstract
Description
基板処理システム1は、基板に対し、感光性被膜の形成、当該感光性被膜の露光、及び当該感光性被膜の現像を施すシステムである。処理対象の基板は、例えば半導体のウェハWである。感光性被膜は、例えばレジスト膜である。基板処理システム1は、塗布・現像装置2と露光装置3とを備える。露光装置3は、ウェハW(基板)上に形成されたレジスト膜(感光性被膜)の露光処理を行う。具体的には、液浸露光等の方法によりレジスト膜の露光対象部分にエネルギー線を照射する。塗布・現像装置2は、露光装置3による露光処理の前に、ウェハW(基板)の表面にレジスト膜を形成する処理を行い、露光処理後にレジスト膜の現像処理を行う。
以下、基板処理装置の一例として、塗布・現像装置2の構成を説明する。図1及び図2に示すように、塗布・現像装置2は、キャリアブロック4と、処理ブロック5と、インタフェースブロック6と、制御装置100とを備える。
続いて、搬送装置A3の構成を具体的に説明する。図4に示すように、搬送装置A3は、アーム21と、アーム22と、移動用可動部30(第一可動部)と、回転用可動部40(第三可動部)と、出入用可動部50A(第二可動部)と、出入用可動部50B(第二可動部)と、を備える。
以下、基板処理方法の一例として、搬送装置A3において実行される搬送処理手順を説明する。この搬送処理手順は、少なくとも一つの処理対象のウェハWを搬送する通常搬送と、通常搬送に比較して高い位置決め精度でウェハWを搬送する高精度搬送とを搬送装置A3に行わせることを含む。この搬送処理手順は、必要に応じて通常搬送及び高精度搬送とは別のウォームアップ動作を搬送装置A3に行わせることを更に含む。この搬送処理手順は、搬送装置A3の停止状態の継続時間が予め設定された基準時間を越えている場合に、高精度搬送の開始時の接近に応じてウォームアップ動作が必要と判定することを更に含む。
本実施形態に係る塗布・現像装置2は、少なくとも一つの処理対象のウェハWを搬送する搬送装置A3と、ウェハWを搬送する通常搬送と、通常搬送に比較して高い位置決め精度で基板を搬送する高精度搬送とを搬送装置A3に行わせる搬送制御部112と、必要に応じて通常搬送及び高精度搬送とは別のウォームアップ動作を搬送装置A3に行わせるウォームアップ制御部113と、搬送装置A3の停止状態の継続時間が予め設定された基準時間を越えている場合に、高精度搬送の開始時の接近に応じてウォームアップ動作が必要と判定する要否判定部116と、を備える。
Claims (9)
- 少なくとも一つの処理対象の基板を搬送する搬送装置と、
前記基板を搬送する通常搬送と、前記通常搬送に比較して高い位置決め精度で基板を搬送する高精度搬送とを前記搬送装置に行わせる搬送制御部と、
必要に応じて前記通常搬送及び前記高精度搬送とは別のウォームアップ動作を前記搬送装置に行わせるウォームアップ制御部と、
前記搬送装置の停止状態の継続時間が予め設定された基準時間を越えている場合に、前記高精度搬送の開始時の接近に応じて前記ウォームアップ動作が必要と判定する要否判定部と、を備える基板処理装置。 - 前記要否判定部は、前記継続時間が前記基準時間を越えている場合に、前記高精度搬送の開始時の接近レベルが予め設定された接近条件を満たすのに応じて前記ウォームアップ動作が必要と判定し、前記高精度搬送の開始時の前記接近レベルが前記接近条件を満たすまでは前記ウォームアップ動作が不要と判定する、請求項1記載の基板処理装置。
- 前記搬送装置の動作がリセット条件を満たすのに応じて前記継続時間をリセットするリセット処理部を更に備える、請求項1又は2記載の基板処理装置。
- 前記搬送装置は少なくとも二つの可動部を有し、
前記リセット処理部は、二つの前記可動部の両方の動作が所定時間以内の時間差で前記リセット条件を満たすのに応じて、前記継続時間をリセットする、請求項3記載の基板処理装置。 - 少なくとも前記高精度搬送における前記搬送装置の動作ストロークに基づいて前記リセット条件を設定する条件設定部を更に備える、請求項3又は4記載の基板処理装置。
- 前記基板に処理を行う少なくとも一つの処理モジュールを更に備え、
前記搬送装置は、前記基板を保持するアームと、前記処理モジュール外を通る第一ラインに沿って前記アームを移動させる第一可動部と、第二ラインに沿って前記アームを移動させる第二可動部と、前記第一ラインに対する前記第二ラインの角度を変更する第三可動部とを有し、
前記ウォームアップ制御部は、前記ウォームアップ動作を実行させる際に、前記アームを前記処理モジュールに進入させないように前記第一可動部、前記第二可動部及び前記第三可動部を動作させる、請求項1〜3のいずれか一項記載の基板処理装置。 - 前記ウォームアップ制御部は、前記ウォームアップ動作を実行させる際に、前記第三可動部により前記第二ラインを前記第一ラインに沿わせた状態で、前記第二可動部を動作させる、請求項6記載の基板処理装置。
- 少なくとも一つの処理対象の基板を搬送する通常搬送と、前記通常搬送に比較して高い位置決め精度で前記基板を搬送する高精度搬送とを搬送装置に行わせることと、
必要に応じて前記通常搬送及び前記高精度搬送とは別のウォームアップ動作を前記搬送装置に行わせることと、
前記搬送装置の停止状態の継続時間が予め設定された基準時間を越えている場合に、前記高精度搬送の開始時の接近に応じて前記ウォームアップ動作が必要と判定することと、を含む基板処理方法。 - 請求項8記載の基板処理方法を装置に実行させるためのプログラムを記憶した、コンピュータ読み取り可能な記憶媒体。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018190293A JP7133424B2 (ja) | 2018-10-05 | 2018-10-05 | 基板処理装置、及び基板処理方法、及び記憶媒体 |
CN201910931531.5A CN111009486A (zh) | 2018-10-05 | 2019-09-29 | 基片处理装置、基片处理方法和存储介质 |
KR1020190121668A KR20200039576A (ko) | 2018-10-05 | 2019-10-01 | 기판 처리 장치, 기판 처리 방법 및 기억 매체 |
US16/592,976 US11257701B2 (en) | 2018-10-05 | 2019-10-04 | Substrate processing apparatus, substrate processing method and recording medium |
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JP2006285301A (ja) * | 2005-03-31 | 2006-10-19 | Yaskawa Electric Corp | ロボット制御装置およびロボットの位置決め精度補正方法 |
JP2008235836A (ja) * | 2007-03-23 | 2008-10-02 | Tokyo Electron Ltd | 基板搬送装置、基板搬送モジュール、基板搬送方法及び記憶媒体 |
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US4641071A (en) * | 1985-09-25 | 1987-02-03 | Canon Kabushiki Kaisha | System for controlling drive of a wafer stage |
JP4453666B2 (ja) * | 2001-12-25 | 2010-04-21 | 東京エレクトロン株式会社 | ガス導入部及び処理装置 |
KR101015778B1 (ko) * | 2003-06-03 | 2011-02-22 | 도쿄엘렉트론가부시키가이샤 | 기판 처리장치 및 기판 수수 위치의 조정 방법 |
JP5577730B2 (ja) | 2010-02-15 | 2014-08-27 | Nskテクノロジー株式会社 | 近接露光装置及び近接露光方法 |
JP5734388B2 (ja) * | 2013-10-22 | 2015-06-17 | ファナック株式会社 | 暖機運転を自動的に開始する制御装置 |
JP6654374B2 (ja) * | 2015-08-17 | 2020-02-26 | 株式会社Screenホールディングス | 熱処理方法および熱処理装置 |
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JP2006285301A (ja) * | 2005-03-31 | 2006-10-19 | Yaskawa Electric Corp | ロボット制御装置およびロボットの位置決め精度補正方法 |
JP2008543578A (ja) * | 2005-06-08 | 2008-12-04 | ブルックス オートメーション インコーポレイテッド | 拡張可能な動作制御システム |
JP2008235836A (ja) * | 2007-03-23 | 2008-10-02 | Tokyo Electron Ltd | 基板搬送装置、基板搬送モジュール、基板搬送方法及び記憶媒体 |
JP2009125905A (ja) * | 2007-11-27 | 2009-06-11 | Nakamura Tome Precision Ind Co Ltd | 基板加工機の運転制御方法 |
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